Thin-film devices and fabrication
Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
1. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation, and
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein the ablated region is formed by scanning a laser spot over a surface of the optical device in the ablation region, and
wherein during scanning of the laser spot an area of the laser spot overlaps by (i) between about 5% and about 100%, (ii) between about 10% and about 90%, or (iii) between about 10% and about 80%.
2. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation,
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein the ablated region is formed by scanning a laser spot over a surface of the optical device in the ablation region, and
wherein during scanning of the laser spot there is no overlap of an area of the laser spot.
3. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation,
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein the ablated region is formed by scanning a laser spot over a surface of the optical device in the ablation region, and
wherein the laser spot is applied in a pattern with or without overlap of adjacent laser spots.
4. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation, and
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated, and
wherein at least a portion of the underlying layer of the coating remains in (a) the ablated region or (b) one area of the ablated region and in another area the underlying layer of the coating is removed.
5. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation,
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated, and
wherein the at least one conductor layer comprises a transparent conducting oxide layer proximate the substantially transparent substrate.
6. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation, and
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein the ablated region is located at a peripheral edge of the substantially transparent substrate or located in a bus bar pad expose area.
7. The optical device of claim 6 , wherein one of the materials layers of the coating is an electrochromic material layer.
8. An optical device, comprising:
a coating fabricated on a substantially transparent substrate, wherein the coating comprises one or more material layers including at least one conductor layer; and
an ablated region of the coating, the ablated region exposing an underlying layer of the coating;
wherein the ablated region is formed via laser ablation, and
wherein the laser ablation comprises delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated, and
wherein at least one of the one or more material layers of the coating is an electrochromic material layer.
9. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein (b) includes scanning a laser spot over a surface of the optical device in the ablation region, and
wherein during scanning an area of the laser spot overlaps by (i) between about 5% and about 100%, (ii) between about 10% and about 90%, or (iii) between about 10% and about 80%.
10. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer of the coating,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein (b) includes scanning a laser spot over a surface of the optical device in the ablation region, and
wherein during scanning of the laser spot there is no overlap of an area of the laser spot.
11. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer of the coating,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein (b) includes scanning a laser spot over a surface of the optical device in the ablation region, and
wherein the laser spot is applied in a pattern with or without overlap of adjacent laser spots.
12. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer of the coating,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein (b) includes scanning a laser spot over a surface of the optical device in the ablation region, and
wherein an area of the laser spot is circular in shape.
13. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer of the coating,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated, and
wherein at least a portion of the underlying layer of the coating remains
(i) in the ablated region after the removal of the one or more material layers in (b) or
(ii) in one area of the ablated region and the underlying layer of the coating is removed in another area of the ablated region.
14. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer of the coating,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated,
wherein one layer of the coating is an electrochromic material layer.
15. A method of fabricating an optical device comprising a coating having one or more material layers including at least one conductor layer, the method comprising:
(a) receiving a substantially transparent substrate having the optical device fabricated thereon; and
(b) using laser ablation to remove the one or more material layers of the coating of the optical device in an ablation region to expose an underlying layer of the coating,
wherein using laser ablation includes delivering laser radiation from the same side of the substantially transparent substrate as that upon which the optical device is fabricated or delivering laser radiation from a side of the substantially transparent substrate opposite a side upon which the optical device is fabricated, and
wherein using laser ablation comprises using a laser with a pulse duration of one of between about 100 femtoseconds and about 100 nanoseconds, between about 1 picosecond and about 50 nanoseconds, and between about 20 picoseconds and about 30 nanoseconds.