Skin status monitor and method thereof for electrosurgical apparatuses
A skin status monitoring apparatus that includes one or more sensors for sensing the applied energy density to an operative site in real time based on one or more monitored variables is provided. Based on the sensed applied energy density, the applied power level of the cold plasma beam may be adjusted, such that, the applied energy density to the operative site remains within the beneficial range that achieves the desired physiological effect to the operative site. The skin status monitoring apparatus of the present disclosure may be coupled to a distal end of an electrosurgical device capable of generating cold plasma.
1. An electrosurgical apparatus comprising:
an applicator including a distal tip, the applicator configured for generating plasma and ejecting the generated plasma from the distal tip;
a standoff device including an applicator receiving portion, at least one post, and a base, the at least one post coupling the applicator receiving portion to the base and the applicator receiving portion configured to receive a distal portion of the applicator such that the distal tip of the applicator is disposed through an aperture of the applicator receiving portion at a predetermined fixed distance from a tissue surface when the base contacts the tissue surface, wherein the base includes at least one sensor for monitoring at least one variable of the tissue surface, the at least one sensor configured to contact the tissue surface when the base contacts the tissue surface; and
at least one controller configured to determine the energy density applied to the tissue surface by the plasma from the monitored at least one variable of the tissue surface by the at least one sensor and adjust an applied power level of the plasma based on the determined energy density.
2. The electrosurgical apparatus of claim 1 , wherein the base is configured in a ring shape having an aperture and the distal tip is oriented such that plasma is applied through the aperture of the base to the tissue surface.
3. The electrosurgical apparatus of claim 2 , wherein the base includes an outer circumference defining the aperture of the base and the at least one post is coupled to the outer circumference.
4. The electrosurgical apparatus of claim 1 , wherein the at least one controller is configured to adjust the applied power level of the plasma, such that, the applied energy density to the tissue surface remains within a predetermined beneficial range that achieves a desired physiological effect.
5. The electrosurgical apparatus of claim 1 , wherein the at least one controller is further configured to determine at least one of a direction or a speed of movement of the distal tip of the applicator relative to the tissue surface from the monitored at least one variable by at least two sensors.
6. The electrosurgical apparatus of claim 1 , wherein the at least one sensor is an annular sensor.
7. The electrosurgical apparatus of claim 1 , wherein the at least one sensor includes an array of sensors.
8. The electrosurgical apparatus of claim 7 , further comprising a circuit configured to serialize measurement data received from the array of sensors and output the measurement data via a single wire to the at least one controller.
9. The electrosurgical apparatus of claim 1 , wherein the at least one sensor is a temperature sensor and the at least one variable is the temperature of the tissue surface.
10. The electrosurgical apparatus of claim 1 , wherein the at least one sensor includes at least first and second contact electrodes.
11. The electrosurgical apparatus of claim 10 , further comprising a circuit configured to apply a probe signal to the first and second contact electrodes and measure the voltage and current of the first and second contact electrodes, the at least one controller configured to determine tissue impedance based on the voltage and current measurements of the first and second contact electrodes and the at least one variable is the determined tissue impedance.
12. The electrosurgical apparatus of claim 10 , further comprising a circuit configured to apply a probe signal to the first and second contact electrodes and measure the voltage and current of the first and second contact electrodes, the at least one controller configured to determine the phase shift between the voltage and current of the first and second contact electrodes and the at least one variable is the determined phase shift.
13. The electrosurgical apparatus of claim 1 , wherein the at least one sensor includes at least first and second acoustical transducers and the electrosurgical apparatus further comprises a circuit configured to apply an electrical oscillation to the first acoustical transducer, such that an acoustical emission is emitted from the first acoustical transducer into the tissue surface and received by the second acoustical transducer, the circuit further configured to determine an acoustical impedance of the tissue surface based on a distance between the first and second acoustical transducers and a time-of-flight for the acoustical emission emitted between the first and second acoustical transducers and the at least one variable is the determined acoustical impedance.
14. The electrosurgical apparatus of claim 1 , wherein the at least one sensor includes at least first and second acoustical transducers and the electrosurgical apparatus further comprises a circuit configured to apply an electrical oscillation to the first acoustical transducer, such that an acoustical emission is emitted from the first acoustical transducer into the tissue surface and received by the second acoustical transducer, the circuit further configured to determine an acoustical absorption of the tissue surface based on an amplitude of the acoustical signal received by the second acoustical transducer and the at least one variable is the determined acoustical absorption.
15. The electrosurgical apparatus of claim 1 , wherein the at least one sensor determines electrical impedance of the plasma and the at least one variable is the determined electrical impedance.
16. The electrosurgical apparatus of claim 1 , further comprising a circuit for determining a change in phase shift between the voltage and current of the plasma and/or the tissue surface, the at least one variable is the determined change in phase shift.
17. An electrosurgical apparatus comprising:
an applicator including a distal tip, the applicator configured for generating plasma and ejecting the generated plasma from the distal tip;
a standoff device including an applicator receiving portion, at least one post, and a base, the at least one post coupling the applicator receiving portion to the base and the applicator receiving portion configured to receive a distal portion of the applicator such that the distal tip of the applicator is disposed through an aperture of the applicator receiving portion at a predetermined fixed distance from a tissue surface when the base contacts the tissue surface;
at least one two sensors disposed apart from each other on the base for monitoring at least one variable of the tissue surface, the at least two sensors configured to contact the tissue surface when the base contacts the tissue surface; and
at least one controller configured to determine the energy density applied to the tissue surface at each sensor from the monitored at least one variable of a respective sensor and to determine at least one of a direction and/or a speed of movement of the distal tip of the applicator relative to the tissue surface from the monitored at least one variable of both of the at least two sensors.
18. The electrosurgical apparatus of claim 17 , wherein the at least two sensors are temperature sensors and the at least one variable is the temperature of the tissue surface.
19. The electrosurgical apparatus of claim 17 , wherein the at least two sensors include at least first and second contact electrodes and the at least one variable is tissue impedance.
20. The electrosurgical apparatus of claim 19 , further comprising a circuit configured to apply a probe signal to the first and second contact electrodes and measure the voltage and current of the first and second contact electrodes, the at least one controller configured to determine the tissue impedance based on the voltage and current measurements of the first and second contact electrodes.
21. The electrosurgical apparatus of claim 17 , wherein the at least two sensors includes at least first and second acoustical transducers and the at least one variable is acoustical impedance.
22. The electrosurgical apparatus of claim 21 , further comprising a circuit configured to apply an electrical oscillation to the first acoustical transducer, such that an acoustical emission is emitted from the first acoustical transducer into the tissue surface and received by the second acoustical transducer, the circuit further configured to determine the acoustical impedance of the tissue surface based on a distance between the first and second acoustical transducers and a time-of-flight for the acoustical emission emitted between the first and second acoustical transducers.