Method of manufacturing a multilayer optical element

1. A method for manufacturing a multilayer optical element, the method comprising:

providing a substrate;

applying a first optical layer by:

applying a first layer comprising a dielectric first material having a first refractive index;

structuring the first layer by sectionally removing the first material; and

filling first interspaces with a dielectric second material having a second refractive index different from the first refractive index so that the second material has at least the same height as the first material; and

applying at least a second optical layer by:

applying a second layer comprising the first material;

structuring the second layer by sectionally removing the first material so that the first optical layer is exposed in second interspaces between second areas with the first material; and

filling the second interspaces with the second material so that the second material has at least the same height as the first material.

2. The method according claim 1 , wherein the first and/or second material is applied by sputtering, evaporation or chemical vapor deposition.

3. The method according to claim 1 , wherein structuring comprises etching.

4. The method according to claim 3 , wherein etching comprises a dry chemical etching process or a wet chemical etching process.

5. The method according to claim 3 , wherein etching comprises etching into a respective underlying layer.

6. The method according to claim 1 , wherein the substrate has substantially the same refractive index as the first or second material.

7. The method according to claim 1 , wherein the second refractive index is greater than the first refractive index or vice versa.

8. The method according to claim 1 , wherein each of the substrate, the first material and the second material comprises an inorganic material.

9. The method according to claim 1 , wherein the substrate comprises glass.

10. The method according to claim 1 , wherein the first material comprises silicon nitride and the second material comprises silicon dioxide.

11. The method according to claim 1 , wherein the first material comprises silicon dioxide and the second material comprises silicon nitride.

12. The method according to claim 1 , wherein the second material is applied during manufacturing of the first and/or second optical layer at such a height that the second material protrudes beyond the first material and covers the first material.

13. The method according to claim 12 , wherein a part of the second material protruding beyond the first material forms an intermediate layer which is free from the first material.

14. The method according to claim 12 , wherein a part of a portion of the second material protruding beyond the first material is removed after applying the second material.

15. The method according to claim 14 , wherein removing the first material comprises removing the first material by thin grinding.

16. The method according to claim 1 , further comprising applying at least a third optical layer by:

applying a third layer comprising the first material;

structuring the third layer by sectionally removing the first material so that the second optical layer is exposed in third interspaces between third areas with the first material; and

filling the third interspaces with the second material so that the second material has at least the same height as the first material.

17. The method according to claim 1 , further comprising forming a compound of a plurality of multilayer optical elements by singulation.

18. The method according to claim 1 , wherein the substrate is at least partially removed after applying the optical layers.

19. The method according to claim 18 , wherein removing comprises removing by thin grinding.