Method for forming an aluminum nitride layer
A method for forming an aluminum nitride layer ( 310, 320 ) comprises the provision of a substrate ( 100 ) and the forming of a patterned metal nitride layer ( 110 ). A bottom electrode metal layer ( 210 ) is formed on the exposed portions ( 101 ) of the substrate. An aluminum nitride layer portion ( 320 ) grown above the exposed portion ( 101 ) of the substrate ( 100 ) exhibits piezoelectric properties. An aluminum nitride layer portion ( 310 ) grown above the patterned metal nitride layer ( 110 ) exhibits no piezoelectric properties ( 310 ). Both aluminum nitride layer portions ( 320, 310 ) are grown simultaneously.
1. A method for forming an aluminum nitride layer, comprising the steps of:
forming a metal nitride layer on a substrate;
patterning the metal nitride layer to form a residual metal nitride layer and to expose a portion of the substrate;
forming a metal layer on the exposed portion of the substrate; and
forming an aluminum nitride on the metal layer and above the residual metal nitride layer, wherein the aluminum nitride formed on the metal layer possesses a piezoelectric property and the aluminum nitride formed on the residual metal nitride layer possesses no piezoelectric property.
2. The method according to claim 1 , wherein the forming of the aluminum nitride comprises simultaneously depositing the aluminum nitride in an area of the exposed portion of the substrate and in an area of the residual metal nitride layer.
3. The method according to claim 1 , further comprising forming the metal layer on the residual metal nitride layer and on the exposed portion of the substrate; and forming the aluminum nitride on the metal layer.
4. The method according to claim 1 , wherein the patterning of the metal nitride layer comprises a photolithography process comprising one or more of coating the metal nitride layer with a photoresist layer, exposing the photoresist layer with a pattern of radiation, developing the exposed photoresist layer, removing portions of the developed or the undeveloped photoresist layer to expose portions of the metal nitride layer, etching the exposed portions of the metal nitride layer and stripping the residual photoresist layer.
5. The method according to claim 1 , wherein the forming of the aluminum nitride comprises depositing the aluminum nitride:
in an area of the exposed portion of the substrate, wherein the aluminum nitride in the area of the exposed portion of the substrate possesses at least one of crystalline properties or C-axis orientation; and
in an area of the residual metal nitride layer, wherein the aluminum nitride in the area of the residual metal nitride layer possesses amorphous or non-crystalline properties.
6. The method according to claim 1 , wherein the forming of the metal nitride layer comprises forming of a titanium nitride layer.
7. The method according to claim 1 , wherein the forming of the metal layer comprises one of:
forming of a sandwich of aluminum and tungsten;
forming of a sandwich of aluminum, copper alloy and tungsten; or
forming of a composition of one or more of molybdenum, ruthenium, iridium and platinum.
8. The method according to claim 1 , wherein the substrate comprises a workpiece having a top layer of a dielectric material.
9. The method according to claim 8 , wherein the workpiece has a top layer of silicon dioxide.
10. The method according to claim 8 , wherein the workpiece includes a bragg mirror arrangement, and wherein the bragg mirror arrangement comprises the top layer of silicon dioxide.
11. The method according to claim 1 , further comprising removing oxygen from the metal layer prior to forming of the aluminum nitride.