Clean isolation valve for reduced dead volume
Gas distribution apparatus, processing chambers and methods using a dead volume-free valve are described. The valve has a first inlet line with upstream and downstream ends and a second inlet line with a downstream end that connects to the first inlet line. A sealing surface at the downstream end of the second inlet line separates the first inlet line from the second inlet line preventing fluid communication between the first inlet line and the second inlet line.
1. A gas distribution apparatus comprising:
a valve having a first inlet line having an upstream end and a downstream end defining a length of the first inlet line;
a second inlet line having an upstream end and a downstream end defining a length of the second inlet line, the downstream end of the second inlet line connecting with the first inlet line along the length of the first inlet line;
a sealing surface at the downstream end of the second inlet line, the sealing surface configured to separate the first inlet line and the second inlet line to prevent fluid communication between the first inlet line and the second inlet line; and
a spacer around a gas distribution plate, the spacer within an opening in a top of the processing chamber.
2. The gas distribution apparatus of claim 1 , wherein the sealing surface allows movement of a fluid through the second inlet line to enter the first inlet line and prevent fluid from the first inlet line from entering the downstream end of the second inlet line.
3. The gas distribution apparatus of claim 1 , wherein there is no dead volume in the valve.
4. The gas distribution apparatus of claim 1 , further comprising a gas distribution plate in fluid communication with the second end of the first inlet line.
5. The gas distribution apparatus of claim 4 , wherein the gas distribution plate comprises a showerhead.
6. The gas distribution apparatus of claim 5 further comprising a remote plasma source between the downstream end of the first inlet line and the gas distribution plate.
7. The gas distribution apparatus of claim 6 , further comprising a gas manifold between the downstream end of the first inlet line and the remote plasma source.
8. The gas distribution apparatus of claim 1 , wherein the sealing surface moves to an open position when gas flowing through the second inlet line exceeds a predetermined pressure.
9. The gas distribution apparatus of claim 8 , wherein the sealing surface moves to a closed position when there is no gas flow in the second inlet line or a pressure in the second line is below a predetermined threshold.
10. A processing chamber comprising:
a gas distribution apparatus having a valve, the valve comprising:
a first inlet line having an upstream end and a downstream end defining a length of the first inlet line;
a second inlet line having an upstream end and a downstream end defining a length of the second inlet line, the downstream end of the second inlet line connecting with the first inlet line along the length of the first inlet line; and
a sealing surface at the downstream end of the second inlet line, the sealing surface configured to separate the first inlet line and the second inlet line to prevent fluid communication between the first inlet line and the second inlet line;
a gas distribution plate in fluid communication with the second end of the first inlet line, the gas distribution plate having a front surface with a plurality of apertures therethrough to allow a flow of gas to pass through the gas distribution plate;
a spacer around the gas distribution plate, the spacer within an opening in a top of the processing chamber; and
a substrate support inside the processing chamber, the substrate support having a support surface spaced a distance from the front surface of the gas distribution plate.
11. The processing chamber of claim 10 , wherein the sealing surface of the valve allows movement of a fluid through the second inlet line to enter the first inlet line and prevent fluid from the first inlet line from entering the downstream end of the second inlet line.
12. The processing chamber of claim 10 , wherein there is no dead volume in the valve.
13. The processing chamber of claim 10 , wherein the gas distribution plate comprises a showerhead.
14. The processing chamber of claim 10 , further comprising a remote plasma source between the downstream end of the first inlet line and the gas distribution plate.
15. The processing chamber of claim 14 , further comprising a gas manifold between the downstream end of the first inlet line and the remote plasma source.
16. The processing chamber of claim 10 , wherein the sealing surface moves to an open position when gas flowing through the second inlet line exceeds a predetermined pressure.
17. The processing chamber of claim 16 , wherein the sealing surface moves to a closed position when there is no gas flow in the second inlet line or a pressure in the second line is below a predetermined threshold.