3D NAND—high aspect ratio strings and channels
Aspects of the disclosure relate to forming a completed stack of layers. Forming the completed stack of layers may include forming a first stack of layers on a first substrate and forming a second stack of layers on a second substrate. The first stack of layers may be bonded to the second stack of layers. The first or second substrate may be removed. Prior to bonding the first stack of layers and the second stack of layer, one or more holes may be etched in the first stack of layers. After removing the second substrate, one or more holes may be etched in the second stack of layers, wherein each of the one or more holes in the second stack of layers extend into a corresponding hole in the one or more holes in the first stack of layers.
1. A method of forming a memory cell stack in 3D NAND memory, the method comprising:
forming a stack of layers on a first substrate;
etching a first set of holes in the stack of layers, such that one or more holes in the first set of holes penetrate partially into the stack of layers from a side of the stack opposite the first substrate;
bonding a second substrate on the side of the stack opposite the first substrate;
removing the first substrate; and
etching a second set of holes in the stack of layers from a side of the stack opposite the second substrate, wherein at least one of the one or more holes in the second set of holes penetrates into the stack of layers, and aligns with at least one of the one or more holes in the first set of holes to form at least one extended hole.
2. The method of claim 1 , wherein the second substrate is a logic layer.
3. The method of claim 1 , wherein the bonding is non-adhesive direct bonding.
4. The method of claim 1 , further including at least partially filling the at least one extended hole with a conductive material.
5. The method of claim 1 , further including processing the at least one extended hole, wherein the processing includes forming memory cells.
6. The method of claim 1 , further comprising bonding the stack of layers to a logic layer and/or a third substrate; and
removing the second substrate.
7. The method of claim 1 , further including at least partially filling the at least one extended hole with a dielectric.
8. The method of claim 1 , wherein prior to removing the first substrate:
filling, at least partially, at least one of the holes in the first set of holes with a conductive material.
9. The method of claim 1 , wherein prior to removing the first substrate:
processing at least one of the holes in the first set of holes, wherein the processing includes forming memory cells.
10. The method of claim 1 , wherein prior to removing the first substrate:
filling, at least partially, at least one of the holes in the first set of holes with a dielectric.