Magnetic tunneling junctions with a magnetic barrier
Advanced magnetic tunneling junctions (MTJs) that dramatically reduce power consumption (switching energy, ESw) while maintaining a reasonably high tunneling magnetoresistance (on/off ratio, TMR) and strong thermal stability at room temperature are described herein. The MTJs include a magnetic insulator, such as an antiferromagnetic material, as the tunnel barrier. A more energy efficient switching in the MTJs is achieved by exchange bias switching (EB) due to the magnetoelectric effect (ME) or by magnon assisted switching.
1. A magnetic tunneling junction (MTJ) comprising:
a. a first ferromagnetic layer;
b. a second ferromagnetic layer; and
c. an antiferromagnetic layer at room temperature, disposed between the first and second ferromagnetic layers, wherein the antiferromagnetic layer is a tunnel barrier that provides tunneling magnetoresistance (TMR), wherein the antiferromagnetic layer comprises a magnetoelectric material that provides a switching of exchange bias (EB) and has a thickness of 1 nm to 3.5 nm, wherein the MTJ exhibits a perpendicular magnetization direction.
2. The MTJ of claim 1 , wherein a direction of EB to the first or second ferromagnetic layer is switched by an electric field applied across the antiferromagnetic layer, thereby manipulating the magnetization of the first and second ferromagnetic layers and generating a net magnetization, wherein under a magnetic field, an order parameter of the ferromagnetic layers is switched by the applied electric field, leading to a reversal of uncompensated surface magnetization, which subsequently switches the EB direction.
3. The MTJ of claim 1 , wherein the first and second ferromagnetic layers are CoFeB, and the antiferromagnetic layer is epitaxial Cr 2 O 3 .
4. The MTJ of claim 1 , wherein the first and second ferromagnetic layers each have a thickness of 1 nm or greater.
5. The MTJ of claim 1 , wherein the antiferromagnetic layer is doped with a material to enhance an antiferromagnetic (AF) ordering temperature, wherein the doping material is B or Al.