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Patent Application
App. No. 17/060,442

FILM-FORMING MATERIAL

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Patent No.
US None
App. No.
17/060,442
Abstract

A film-forming material of the present invention contains an oxyfluoride of yttrium represented by YO X F Y (X and Y are numbers satisfying 0<X and X<Y) and YF 3 , wherein a ratio I 2 /I 1 of a peak height I 2 of the (020) plane of YF 3 to a peak height I 1 of the main peak of YO X F Y as analyzed by XRD is from 0.005 to 100. It is preferable that a ratio I 4 /I 1 of a peak height I 4 of the main peak of Y 2 O 3 to the peak height I 1 of the main peak of YO X F Y as analyzed by XRD is 0.01 or less.

Claims (14)

1 . A film-forming material comprising:

an yttrium oxyfluoride represented by YO 0.8 F 1.4 and YF 3 ,

wherein a ratio I 2 /I 1 of a peak height I 2 of the (020) plane of the YF 3 to a height I 1 of a main peak of the YO 0.8 F 1.4 as analyzed by XRD is from 0.01 to 3,

and the film-forming material is obtained by firing a granulated product which is obtained by granulating a powder containing YO 0.8 F 1.4 and YF 3 , and the average particle size D50 of the film-forming material is 0.1 μm to 9 μm.

2 . The film-forming material according to claim 1 , wherein an oxygen content in the film-forming material is from 0.5 to 11.0 mass %.

3 . The film-forming material according to claim 1 , wherein a ratio I 3 /I 1 of a peak height I 3 of a main peak of YOF to the peak height I 1 of the main peak of the YO 0.8 F 1.4 as analyzed by XRD is 0.5 or less.

4 . The film-forming material according to claim 1 , wherein a ratio I 4 /I 1 of a peak height I 4 of a main peak of Y 2 O 3 to the peak height I 1 of the main peak of the YO 0.8 F 1.4 as analyzed by XRD is 0.01 or less.

5 . The film-forming material according to claim 1 , wherein the film-forming material is in granular form.

6 . The film-forming material according to claim 1 , wherein the film-forming material is used for a thermal spraying method.

7 . The film-forming material according to claim 1 , wherein the film-forming material is used for an aerosol deposition method.

8 . The film-forming material according to claim 1 , wherein the film-forming material is used for an ion plating method.

9 . A method for producing a film, which comprises a step of thermal spraying the film-forming material according to claim 1 .

10 . A method for producing a film, which comprises a step of aerosol depositing the film-forming material according to claim 1 .

11 . A method for producing a film, which comprises a step of ion plating the film-forming material according to claim 1 .