METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURES
A system for use in inspection of patterned structures, including a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
1 . A system for use in inspection of patterned structures, the system comprising:
a data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure; and
a data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
2 . A method for use in inspection of patterned structures, the method comprising:
receiving first type of data indicative of image data on at least a part of the patterned structure;
processing and analyzing data indicative of the image data and determining a geometrical model for at least one feature of a pattern in said structure; and
using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
3 . A method for use in inspection of patterned structures, the method comprising:
receiving image data indicative of one or more images of at least a part of the patterned structure obtained by a scanning tool;
processing and analyzing data indicative of said image data and determining a geometrical model for at least one feature of a pattern in said structure; and
using said geometrical model for determining an optical model for scatterometry based optical measurements on a patterned structure, thereby enabling use of said geometrical model for interpreting scatterometry based measurements applied to the patterned structure progressing on a production line.