Adjustable fastening device for plasma gas injectors
An embodiment is an apparatus, such as a plasma chamber. The apparatus includes chamber walls and a chamber window defining an enclosed space. A chamber window is disposed between a plasma antenna and a substrate support. A gas delivery source is mechanically coupled to the chamber window. The gas delivery source comprises a gas injector having a passageway, a window at a first end of the passageway, and a nozzle at a second end of the passageway. The nozzle of the gas delivery source is disposed in the enclosed space. A fastening device is mechanically coupled to the gas delivery source. The fastening device is adjustable to adjust a sealing force against the gas injector.
1. A method of semiconductor processing, the method comprising:
transferring a substrate into a plasma chamber;
flowing a gas into the plasma chamber while the substrate is in the plasma chamber, the gas flowing through a gas delivery source mechanically coupled to the plasma chamber, the gas delivery source comprising a gas injector through which the gas flows into the plasma chamber and an adjustable fastening device, the gas injector including an upper terminal end and a lower terminal end and the adjustable fastening device including a gas injector cover over the upper terminal end of the gas injector;
adjusting the adjustable fastening device to adjust a height of the gas injector cover to be in contact with a window between the gas injector cover and the upper terminal end of the gas injector;
applying a sealing force against the upper terminal end of the gas injector, the sealing force provided by the adjustable fastening device; and
maintaining a plasma using the gas in the plasma chamber.
2. The method of claim 1 , wherein adjusting the fastening device comprises adjusting a plurality of fasteners.
3. The method of claim 2 , wherein each fastener of the plurality of fasteners comprises a bolt and a nut.
4. The method of claim 1 , further comprising adjusting the sealing force by adjusting the sealing force applied by the adjustable fastening device.
5. The method of claim 4 , adjusting the sealing force applied by the adjustable fastening device includes adjusting a sealing force applied by the gas injector cover on the window.
6. The method of claim 5 , wherein a seal is present between the window and the upper terminal end of the gas injector.
7. A method of semiconductor processing, the method comprising:
transferring a substrate into a semiconductor processing chamber;
flowing a gas into the semiconductor processing chamber while the substrate is in the semiconductor processing chamber, the gas flowing through a gas delivery source mechanically coupled to the semiconductor processing chamber, the gas delivery source comprising a gas injector through which the gas flows into the semiconductor processing chamber and an adjustable fastening device, the gas injector including an upper terminal end and a lower terminal end and the adjustable fastening device including a gas injector cover over the upper terminal end of the gas injector;
adjusting the adjustable fastening device to adjust a height of the gas injector cover in contact with a window between the gas injector cover and the upper terminal end of the gas injector;
applying a sealing force against the upper terminal end of the gas injector, the sealing force provided by the adjustable fastening device; and
maintaining a plasma using the gas in the semiconductor processing chamber.
8. The method of claim 7 , wherein adjusting the fastening device comprises adjusting a plurality of fasteners.
9. The method of claim 8 , wherein each fastener of the plurality of fasteners comprises a bolt and a nut.
10. The method of claim 7 , further comprising adjusting the sealing force by adjusting the sealing force applied by the adjustable fastening device.
11. The method of claim 10 , wherein adjusting the sealing force applied by the adjustable fastening device includes adjusting a sealing force applied by the gas injector cover on the window.
12. The method of claim 11 , wherein a seal is present between the window and the upper terminal end of the gas injector.
13. A method of semiconductor processing, the method comprising:
transferring a substrate to a semiconductor processing system including a semiconductor processing chamber that includes a gas injector and an adjustable fastening device, the gas injector including an upper terminal end and a lower terminal end and the adjustable fastening device including a gas injector cover over the upper terminal end of the gas injector, the adjustable fastening device including multiple sets of fasteners; and
tuning the adjustable fastening device by adjusting the fasteners so that a sealing force applied by the adjustable fastening device against the upper terminal end of the gas injector is adjusted and a height of the gas injector cover over the upper terminal end of the gas injector is adjusted.
14. The method of claim 13 , wherein the gas injector cover has a bottom surface that is sloped at an angle in a range from about 80 degrees to about 89 degrees relative to a longitudinal axis of the gas injector cover.
15. The method of claim 13 , further comprising maintaining a plasma using the gas in the semiconductor processing chamber.
16. The method of claim 13 , wherein each fastener of the multiple sets of fasteners includes a nut and a bolt and adjusting the fasteners further comprises rotating the nut.
17. The method of claim 13 , wherein each fastener of the multiple sets of fasteners includes a nut and a bolt and adjusting the fasteners further comprises rotating the bolt.
18. The method of claim 1 , wherein the gas injector cover has a bottom surface that is sloped at an angle in a range from 80 degrees to 89 degrees relative to a longitudinal axis of the gas injector cover.
19. The method of claim 7 , wherein the gas injector cover has a bottom surface that is sloped at an angle in a range from 1 degree to 10 degrees relative to horizontal.
20. The method of claim 13 , wherein the gas injector cover has a bottom surface that is sloped at an angle in a range from 1 degree to 10 degrees relative to horizontal.