IP Library Granted Patent US 11,938,090
Granted Patent B2
US 11,938,090 · App. 17/088,155 · Granted Mar 26, 2024

Substrate having a marking element, container comprising such a substrate and method for producing a substrate having a marking element

Inventors: Oliver Sohr (Mainz, DE); Stephan Corvers (Oestrich-Winkel, DE); Christoph Brüning (Kiedrich, DE)
Assignee: SCHOTT Pharma AG & Co. KGaA
A61J1/18A61J1/03A61J1/05C03C15/00C03C23/0025A61J2205/50B23K26/362
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Quick Facts
Patent No.
US 11,938,090
App. No.
17/088,155
Granted
Mar 26, 2024
Kind
B2
Abstract

A substrate includes a first surface area; and a second surface area with a second roughness value. In a height profile of the substrate along a cutting line crossing the first surface area and the second surface area, a height of the substrate along a first section of the height profile is larger than the height of the substrate along a second section of the height profile. In the height profile an absolute value of a height difference between a point of maximum height or an averaged height, respectively, of the second section and a point of minimal height or an averaged height, respectively, of the first section defines a depth value. A ratio of the depth value and the second roughness value is between 2 and 35. A marking element extends across the first surface area and the second surface area.

Claims (33)

1. A substrate, comprising:

a first surface area, the substrate having a first roughness value for a surface roughness of the first surface area;

a second surface area, the substrate having a second roughness value for a surface roughness of the second surface area, wherein in a height profile of the substrate along a cutting line crossing at least in part the first surface area and the second surface area, a height of the substrate along a first section of the height profile corresponding to the first surface area is larger than the height of the substrate along a second section of the height profile corresponding to the second surface area, the cutting line defining a line along which the height of a cross-section of the substrate is measured to define the height profile, wherein in the height profile an absolute value of a height difference between a point of maximum height or an averaged height, respectively, of the second section and a point of minimal height or an averaged height, respectively, of the first section defines a depth value, wherein a ratio of the depth value and the second roughness value is between 2 and 35; and

a marking element extending across the first surface area and the second surface area and comprising a cavity graved into the substrate, the first surface area and the second surface area together constituting the marking element, wherein across or beneath the first surface area the substrate has a first ratio value for a ratio of concentrations of two materials present in the first surface area or in a distinct depth in the substrate beneath thereof and wherein across or beneath the second surface area the substrate has a second ratio value for a ratio of concentrations of two materials present in the second surface area or in a distinct depth in the substrate beneath thereof, wherein the two materials comprise Si and B, a concentration of B is greater in the second surface area than in the first surface area.

2. The substrate of claim 1 , wherein the ratio of the depth value and the second roughness value is at least one of between 2 and 20, between 2 and 15, between 3 and 10, between 4 and 15, or between 5 and 10.

3. The substrate of claim 1 , wherein first roughness value and the second roughness value are a mean surface roughness or a root mean squared surface roughness, respectively, across at least one part of the respective surface area.

4. The substrate of claim 1 , wherein the first roughness value is less than a factor of 10, 20, 30, 40, 50, 60, 70, 80, 90 or 100 lower than the second roughness value and at least one of:

the first roughness value is between 0.5 and 20 nm; or

the second roughness value is between 5 and 1000 nm.

5. The substrate of claim 1 , wherein a height value is defined by a maximum height of the first section and at least one of:

a ratio between the height value and the depth value is between 100 and 2000; or

the maximum height of the first section is between 0.1 and 20 mm.

6. The substrate of claim 1 , wherein at least one of:

the distinct depth of each surface area is a depth of up to 2 μm beneath the respective surface area; or

the ratio of the concentrations of the two materials is at least one of obtained or obtainable by a ToF-SIMS measurement at a location of the respective surface area.

7. The substrate of claim 1 , wherein the substrate comprises a glass, the glass comprising at least one of aluminosilicate glass or borosilicate glass.

8. The substrate of claim 7 , wherein the substrate further comprises at least one polymer, the at least one polymer comprising at least one of cycloolefin-copolymer (COC) or cyclic olefin polymer (COP).

9. The substrate of claim 1 , wherein the marking element comprises a cavity in the form of at least one of a dot-like element or a line-like element graved into the substrate; wherein at least one of:

(i) the marking element is in the form of a matrix code;

(ii) the first surface area at least in part does not overlap with a surface of the cavity and the second surface area is at least one part of or corresponds to the surface of the cavity;

(iii) the first surface area is at least one part of the surface corresponding to an area of the marking element representing a bit in the marking element which is set to ZERO; or

(iv) the second surface area is at least one part of the surface corresponding to an area of the marking element representing a bit in the marking element which is set to ONE.

10. The substrate of claim 9 , wherein at least one of:

the depth value is between 0.1 μm and 4 μm; or

a maximal depth or an average depth of the cavity is between: 0.1 μm and 5 μm.

11. The substrate of claim 1 , wherein the first surface area and the second surface area are at least one of directly adjacent to or connected with each other.

12. The substrate of claim 1 , wherein the ratio of the depth value and the second roughness value is between 3 and 35.

13. A container, comprising:

a substrate comprising:

a first surface area, the substrate having a first roughness value for a surface roughness of the first surface area;

a second surface area, the substrate having a second roughness value for a surface roughness of the second surface area, wherein in a height profile of the substrate along a cutting line crossing at least in part the first surface area and the second surface area, a height of the substrate along a first section of the height profile corresponding to the first surface area is larger than the height of the substrate along a second section of the height profile corresponding to the second surface area, the cutting line defining a line along which the height of a cross-section of the substrate is measured to define the height profile, wherein in the height profile an absolute value of a height difference between a point of maximum height or an averaged height, respectively, of the second section and a point of minimal height or an averaged height, respectively, of the first section defines a depth value, wherein a ratio of the depth value and the second roughness value is between 2 and 35; and

a marking element extending across the first surface area and the second surface area and comprising a cavity graved into the substrate, the first surface area and the second surface area together constituting the marking element, wherein across or beneath the first surface area the substrate has a first ratio value for a ratio of concentrations of two materials present in the first surface area or in a distinct depth in the substrate beneath thereof and wherein across or beneath the second surface area the substrate has a second ratio value for a ratio of concentrations of two materials present in the second surface area or in a distinct depth in the substrate beneath thereof, wherein the two materials comprise Si and B, a concentration of B is greater in the second surface area than in the first surface area.

14. The container of claim 13 , wherein the ratio of the depth value and the second roughness value is between 3 and 35.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 21, 2022
From: SCHOTT AG
To: SCHOTT PHARMA AG & CO. KGAA
Reel/Frame 061972/0280 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2021
From: SOHR, OLIVER; CORVERS, STEPHAN, DR.; BRÜNING, CHRISTOPH, DR.
To: SCHOTT AG
Reel/Frame 055373/0262 →
Priority Claims (1)
EP 19207008 · Nov 4, 2019 · regional
Continuity (1)
Related Publication 20210128410A1 · May 6, 2021