Chalcogenide sputtering target and method of making the same
In one embodiment, a physical vapor deposition device includes a phase change material sputtering target includes a primary matrix and at least one additional phase. The primary matrix includes at least one element from Group VI of the periodic table excluding oxygen and one or more elements from Group IV or Group V of the periodic table. The additional phase is substantially homogenously dispersed in the primary matrix.
1. A method of forming a phase change material sputtering target, the method comprising:
forming a primary alloy including at least one element from Group VI of the periodic table excluding oxygen and at least one element from Group IV or Group V of the periodic table;
reducing the primary alloy to form an primary alloy powder;
forming a second alloy including at least one element from Group VI of the periodic table excluding oxygen and at least one element from Group IV or Group V of the periodic table;
reducing the second alloy to form a second alloy powder;
forming a powder mixture by blending the primary alloy powder, the second alloy powder and optionally one or more additional powder components; and
hot pressing the powder mixture to form a sputtering target.
2. The method of claim 1 wherein the additional powder component is an alloy powder.
3. The method of claim 1 wherein the additional powder component is an elemental powder.
4. The method of claim 1 wherein the second alloy has a higher hardness than the primary alloy.
5. A method of forming a phase change material sputtering target, the method comprising:
forming a primary alloy including at least one element from Group VI of the periodic table excluding oxygen and at least one element from Group IV or Group V of the periodic table, wherein forming the primary alloy comprises:
forming a molten binary alloy;
reducing the temperature of the molten binary alloy; and
adding a third component to the molten binary alloy to form a ternary alloy;
reducing the primary alloy to form an alloy powder;
forming a powder mixture by blending the alloy powder with an additional powder component; and
hot pressing the powder mixture to form a sputtering target.
6. The method of claim 5 wherein the powder mixture is hot pressed at the glass transition temperature of the primary alloy.
7. The method of claim 5 wherein the additional powder component has a mean size of less than about 40 μm.
8. A method of forming a phase change material sputtering target, the method comprising:
forming a primary alloy including at least one element from Group VI of the periodic table excluding oxygen and at least one element from Group IV or Group V of the periodic table;
reducing the primary alloy to form a primary alloy powder;
forming a second alloy including at least one element from Group VI of the periodic table excluding oxygen and at least one element from Group IV or Group V of the periodic table;
reducing the second alloy to form a second alloy powder;
forming a powder mixture by blending the primary alloy powder the second alloy powder and optionally one or more additional powder components; and
hot pressing the powder mixture at the glass transition temperature of the primary alloy to form a sputtering target.
9. The method of claim 8 wherein the one or more additional powder components is an alloy powder.
10. The method of claim 9 wherein the additional powder component is an elemental powder.
11. The method of claim 8 wherein the second alloy has a higher hardness than the primary alloy.
12. The method of claim 8 wherein forming the primary alloy comprises forming a molten binary alloy;
reducing the temperature of the molten binary alloy; and
adding a third component to the molten binary alloy to form a ternary alloy.
13. The method of claim 8 wherein the one or more additional powder components has a mean size of less than about 40 μm.
14. The method of claim 1 wherein the one or more additional powder components has a mean size of less than about 40 μm.
15. The method of claim 1 wherein the second alloy has a higher hardness than the primary alloy.
16. The method of claim 1 wherein the at least one element from Group VI of the periodic table excluding oxygen in the primary alloy includes selenium (Se) or tellurium (Te).
17. The method of claim 1 wherein the at least one element from Group IV or Group V of the periodic table in the primary alloy includes germanium (Ge) or arsenic (As).
18. The method of claim 5 wherein the at least one element from Group VI of the periodic table excluding oxygen in the primary alloy includes selenium (Se) or tellurium (Te).
19. The method of claim 5 wherein the at least one element from Group IV or Group V of the periodic table includes germanium (Ge) or arsenic (As).
20. The method of claim 8 wherein the at least one element from Group VI of the periodic table excluding oxygen in the primary alloy includes selenium (Se) or tellurium (Te).