Apparatus for generating a virtual image with interference light suppression

1. A device for generating a virtual image comprising:

at least one light source for producing light with a specified wavelength;

a display element for producing an image;

an optical waveguide for expanding an exit pupil into which light coming from the display element is coupled;

a first aperture mask that is arranged above an upper boundary surface of the optical waveguide where the first mask defines a first plurality of holes and non-transparent regions;

at least two optical waveguides are arranged one above the other in a stack;

at least one second aperture mask, wherein the first aperture mask and the at least one second aperture mask are each arranged on one of the at least two optical waveguides; and

wherein the holes in the first or the at least one second aperture mask of an optical waveguide arranged further up in the stack have larger diameters than the holes in the others of the first or the at least one second aperture mask of an optical waveguide arranged further down in the stack.

2. The device as claimed in claim 1 , wherein a reflective layer is arranged between the upper boundary surface and the first aperture mask.

3. The device as claimed in claim 2 , wherein the reflective layer defines a second plurality of holes, the positions of which correspond to the positions of first plurality of holes in the first aperture mask.

4. The device as claimed in claim 1 , wherein one of an air gap and a layer made of a material whose refractive index lies in the region of the refractive index of air is arranged between the upper boundary surface and the first aperture mask.

5. The device as claimed in claim 1 , wherein a third aperture mask is arranged below a lower boundary surface of at least one of the optical waveguides.

6. A vehicle with a device for generating a virtual image comprising:

at least one light source for producing light with a specified wavelength;

a display element for producing an image;

an optical waveguide for expanding an exit pupil into which light coming from the display element is coupled;

a first aperture mask that is arranged above an upper boundary surface of the optical waveguide where the first mask defines a first plurality of holes and non-transparent regions;

at least two optical waveguides are arranged one above the other in a stack;

at least one second aperture mask, wherein the first aperture mask and the at least one second aperture mask are each arranged on one of the at least two optical waveguides; and

wherein the holes in the first or the at least one second aperture mask of the optical waveguide arranged further up in the stack have larger diameters than the holes in the others of the first or the at least one second aperture mask of the optical waveguide arranged further down in the stack.

7. The vehicle as claimed in claim 6 , wherein a reflective layer is arranged between the upper boundary surface and the first aperture mask.

8. The vehicle as claimed in claim 7 , wherein the reflective layer defines a second plurality of holes, the positions of which correspond to the positions of first plurality of holes in the first aperture mask.

9. The vehicle as claimed in claim 6 , wherein one of an air gap and a layer made of a material whose refractive index lies in the region of the refractive index of air is arranged between the upper boundary surface and the first aperture mask.

10. The vehicle as claimed in claim 6 , wherein a third aperture mask is arranged below a lower boundary surface of at least one of the optical waveguides.

11. A method for producing an optical waveguide for a device comprising:

applying a photoresist that is exposed using a wavelength intended for the corresponding optical waveguide onto one of the optical waveguide and a reflective layer applied to the optical waveguide;

introducing the optical waveguide into the optical construction of the device;

exposing the applied photoresist with the light source of the device for the intended wavelength;

removing the unexposed parts of the photoresist;

optionally applying a reflective layer outside the exposed regions of the photoresist;

applying non-transparent regions outside the exposed regions of the photoresist;

removing the exposed parts of the photoresist;

arranging at least two of the optical waveguides one above the other in a stack;

providing at least one first aperture mask and at least one second aperture mask, and

arranging the first aperture mask and the at least one second aperture mask on one of the at least two optical waveguides such that the optical waveguide arranged further up in the stack have larger diameters than the holes in the others of the first or the at least one second aperture mask of the optical waveguide arranged further down in the stack.