Ion beam target assemblies for neutron generation
Provided herein are systems, devices, articles of manufacture, and methods for generating neutrons employing a high energy ion beam target (HEIB target) and a target backing configured to be in contact with the bottom surface of the HEIB target (e.g., to generate an ion beam target assembly). In certain embodiments, the HEIB target has a thickness that is less than the penetration depth of protons or deuterons in the high energy ion beam that strikes the target. In certain embodiments, the target backing comprises a high hydrogen diffusion metal (e.g., palladium), has open spaces dispersed throughout for reduced proton diffusion distances, and has a shape and thickness such that all, or virtually all, of the protons or deuterons that pass through the HEIB target are stopped. Also provided herein are systems, devices, and methods for changing targets in an ion beam accelerator system.
1. A system comprising:
a) a high energy ion beam target (HEIB target) comprising a metal and having a top surface and a bottom surface,
wherein said metal is selected from the group consisting of: beryllium, uranium, lithium, tungsten, and tantalum,
wherein said HEIB target generates neutrons when exposed to a high energy ion beam of protons and/or deuterons, and
wherein said HEIB target has a thickness between said top and bottom surfaces that is less than the penetration depth of protons or deuterons in said high energy ion beam; and
b) a target backing comprising a high hydrogen diffusion metal (HHDM),
wherein said target backing has gas or vacuum filled open spaces dispersed throughout such that the proton or deuteron diffusion distance is reduced throughout said target backing compared to if said target backing was a solid piece without said open spaces,
wherein said target backing is configured to be positioned in contact with said bottom surface of said HEIB target, and
wherein said target backing has a shape and thickness such that all, or virtually all, of said protons and/or deuterons in said high energy ion beam that pass through said HEIB target are stopped by said target backing when it is positioned in contact with said HEIB target.
2. The system of claim 1 , wherein said open spaces are selected from: pores, grooves, holes, corrugations, channels, open cells, honeycomb cells, irregular openings, or any combination thereof.
3. The system of claim 1 , wherein said target backing is attached to, or configured to be attached to, said bottom surface of said HEIB target by brazing, welding, soldering, diffusion, or bonding.
4. The system of claim 1 , further comprising: c) a fluid-cooled substrate fluidly separated from the gas or vacuum filled open spaces.
5. The system of claim 4 , wherein said target backing is attached to, or configured to be attached to, said fluid-cooled substrate.
6. The system of claim 1 , wherein said HEIB target comprises: i) a first layer comprising said metal, and ii) a second layer comprising a metal different than used in said first layer selected from the group consisting of: beryllium, uranium, lithium, tungsten, and tantalum.
7. The system of claim 4 , wherein said fluid-cooled substrate comprises copper and/or aluminum.
8. The system of claim 1 , wherein said HEIB target has a thickness between 2 mm and 25 mm, and a diameter between 25 mm and 150 mm.
9. The system of claim 1 , wherein said thickness of said target backing is between 2 mm and 10 mm.
10. An article of manufacture comprising: a) an ion beam target assembly, wherein said ion target beam assembly comprises:
i) a high energy ion beam target (HEIB target) comprising metal and having a top surface and a bottom surface,
wherein said metal is selected from the group consisting of: beryllium, uranium, lithium, tungsten, and tantalum,
wherein said HEIB target generates neutrons when exposed to a high energy ion beam of protons and/or deuterons, and
wherein said HEIB target has a thickness between said top and bottom surfaces that is less than the penetration depth of protons or deuterons in said high energy ion beam; and
ii) a target backing comprising a high hydrogen diffusion metal (HHDM),
wherein said target backing has gas or vacuum filled open spaces dispersed throughout such that the proton or deuteron diffusion distance is reduced throughout said target backing compared to if said target backing was a solid piece without said open spaces,
wherein said target backing is attached to said bottom surface of said HEIB target, and
wherein said target backing has a shape and thickness such that all, or virtually all, of said protons or deuterons in said high energy ion beam that pass through said HEIB target are stopped by said target backing.
11. The system of claim 10 , wherein said open spaces are selected from: pores, grooves, holes, corrugations, channels, open cells, honeycomb cells, irregular openings, or any combination thereof.
12. The system of claim 10 , wherein said target backing is attached to said bottom surface of said HEIB target by brazing, soldering, welding, or diffusion bonding.
13. The system of claim 10 , further comprising: b) a fluid-cooled substrate fluidly separated from the gas or vacuum filled open spaces.
14. The system of claim 13 , wherein said fluid-cooled substrate comprises copper and/or aluminum.
15. The system of claim 10 , wherein said HEIB target comprises: i) a first layer comprising said metal, and ii) a second layer comprising a metal different than used in said first layer selected from the group consisting of: beryllium, uranium, lithium, tungsten, and tantalum.
16. The system of claim 10 , wherein said HEIB target has a thickness between 2 mm and 25 mm, and a diameter between 25 mm and 150 mm.
17. The system of claim 10 , wherein said thickness of said target backing is between 2 mm and 10 mm.
18. The system of claim 10 , wherein target backing comprises a core of solid vanadium that is coated with a thin film of palladium.
19. The system of claim 10 , wherein at least 95% of said HEIB target is said metal.