Dynamic electron impact ion source
An ion source can include a magnetic field generator configured to generate a magnetic field in a direction parallel to a direction of the electron beam and coincident with the electron beam. However, this magnetic field can also influence the path of ionized sample constituents as they pass through and exit the ion source. An ion source can include an electric field generator to compensate for this effect. As an example, the electric field generator can be configured to generate an electric field within the ion source chamber, such that an additional force is imparted on the ionized sample constituents, opposite in direction and substantially equal in magnitude to the force imparted on the ionized sample constituents by the magnetic field.
1. A system comprising:
an ion source chamber;
a magnetic field generator configured to generate a magnetic field within the ion source chamber;
a first electric field generator configured to generate a first electric field within the ion source chamber; and
a second electric field generator configured to generate a second electric field within the ion source chamber,
wherein the system is configured, during operation, to:
generate ions within the ion source chamber,
focus and accelerate at least some of the ions from the ion source chamber using the first electric field generator, and
reduce or eliminate an influence of the magnetic field on at least some of the ions accelerated from the ion source using the second electric field generator, and
wherein a strength of the second electrical field is selected based on a strength of the magnetic field.
2. The system of claim 1 , further comprising an electron ionization ion source, wherein the electron ionization source comprises the ion source chamber.
3. The system of claim 1 , wherein the magnetic field generator is configured to generate the magnetic field in a first direction, wherein the second electric field generator configured to generate the second electric field in a second direction, and wherein the first direction is orthogonal to the second direction.
4. The system of claim 3 , wherein the magnetic field generator comprises:
a first magnet, and
a second magnet facing the first magnet in the first direction.
5. The system of claim 3 , wherein the second electric field generator comprises:
a first electrode, and
a second electrode facing the first electrode in the second direction.
6. The system of claim 1 , wherein the second electric field comprises a plurality of electrodes separated from one another by respective gaps.
7. The system of claim 6 , wherein the electrodes and the gaps define at least a portion of a circle in cross-section.
8. The system of claim 6 , wherein the electrodes and the gaps define at least a portion of a polygon, an ellipse, a hyperbola, or a parabola in cross section.
9. The system of claim 6 , wherein the electrodes comprise a first electrode and a second electrode,
wherein a first end of the first electrode is separated from a first end of the second electrode by a first gap, and
wherein a second end of the first electrode is separated from a second end of the second electrode by a second gap.
10. The system of claim 6 , wherein the electrodes comprise a first electrode, a second electrode, a third electrode, and a fourth electrode,
wherein a first end of the first electrode is separated from a first end of the second electrode by a first gap, a second gap, and the third electrode,
and wherein a second end of the first electrode is separated from a second end of the second electrode by a third gap, a fourth gap, and the fourth electrode.
11. The system of claim 3 , wherein the second electric field generator comprises an electrode facing a gap in the second direction.
12. The system of claim 11 , wherein the electrode defines a portion of an arc in cross-section.
13. The system of claim 1 , wherein the strength of the second electric field is selected further based on a velocity of at least some of the ions accelerated from the ion source.
14. The system of claim 1 , wherein the strength of the second electric field is selected further based on a charge of at least some of the ions accelerated from the ion source.
15. The system of claim 1 , wherein the strength of the second electric field is selected further based on a mass of at least some of the ions accelerated from the ion source.
16. The system of claim 1 , wherein the system is configured, during operation, to filter a first subset of the ions having a first mass to charge (m/z) ratio from a second subset of the ions having a first m/z ratio using the second electric field generator, wherein the first m/z ratio is different from the second m/z ratio.
17. The system of claim 1 , further comprising a control module having one or more processors, wherein the control module is configured to:
select the strength of the second electrical field, and
control the second electric field generator to generate the second electric field according to the selected strength.