IP Library Granted Patent US 11,711,963
Granted Patent B2
US 11,711,963 · App. 17/138,915 · Granted Jul 25, 2023

Display panel, mask, method for manufacturing display panel, and display device

Inventors: Liyuan Liu (Shanghai, CN); Zhiyong Xiong (Shanghai, CN); Di Zhu (Shanghai, CN); Yawei Zhong (Shanghai, CN)
Assignees: WUHAN TIANMA MICROELECTRONICS CO., LTD.; WUHAN TIANMA MICROELECTRONICS CO., LTD. SHANGHAI BRANCH
H10K71/00C23C14/042H10K59/122H10K71/166H10K59/1201H10K59/131H10K71/851
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Quick Facts
Patent No.
US 11,711,963
App. No.
17/138,915
Granted
Jul 25, 2023
Kind
B2
Abstract

The present invention provides a mask, a display panel, a method for manufacturing a display panel, and a display device. The display panel has a hollow region and a display region surrounding the hollow region. The display panel includes a plurality of organic light-emitting devices arranged only in the display region. Each of the plurality of organic light-emitting devices includes an anode layer, a cathode layer, a light-emitting layer and a functional layer. The functional layer includes a plurality of uneven portions.

Claims (11)

1. A mask, comprising an aperture portion and a shielding portion, wherein the shieling portion extends from an edge of the mask into the mask, wherein the mask comprises a first mask and a second mask, and the first mask and the second mask each comprise an aperture portion and a shielding portion; and wherein during usage, an orthographic projection of the shielding portion of the first mask along a direction perpendicular to a plane of the first mask at least partially overlaps with an orthographic projection of the second mask along a direction perpendicular to a plane of the second mask.

2. The mask according to claim 1 , wherein

the first mask and the second mask each comprise an aperture portion and at least one shielding portion, and the at least one shielding portion comprises a first shielding portion and a second shielding portion connected to the first shielding portion, the first shielding portion of the first mask has a same shape and a same area as the first shielding portion of the second mask; the second shielding portion of the first mask extends from an edge of the first mask into the first mask, and the second shielding portion of the second mask extends from an edge of the second mask into the second mask; the second shielding portion of the first mask has a same shape and a same area as the aperture portion of the second mask, and the aperture portion of the first mask has a same shape and a same area as the second shielding portion of the second mask.

3. The mask according to claim 2 , wherein the first mask, the second mask, the first shielding portion of the first mask, and the first shielding portion of the second mask are all shaped as center symmetrical patterns; and

a symmetry center of the first shielding portion of the first mask coincides with a symmetry center of the first mask, and a symmetry center of the first shielding portion of the second mask coincides with a symmetry center of the second mask.

4. The mask according to claim 2 , wherein the first mask, the second mask, the first shielding portion of the first mask, and the first shielding portion of the second mask are all shaped as circles or equilaterals;

a geometric center of the first shielding portion of the first mask coincides with a geometric center of the first mask, and a geometric center of the first shielding portion of the second mask coincides with a geometric center of the second mask;

the second shielding portion of the first mask comprises at least two second shielding sub-portions, and the aperture portion of the first mask comprises at least two aperture sub-portions; a number of the at least two aperture sub-portions is equal to a number of the at least two second shielding sub-portions, the at least two second shielding sub-portions and the at least two aperture sub-portions are alternately arranged, and each of at least two second shielding sub-portions of the first mask extends from the edge of the first mask into the first mask.

5. The mask according to claim 2 , wherein the first mask, the second mask, the first shielding portion of the first mask, and the first shielding portion of the second mask are all shaped as axisymmetric patterns; and

a symmetry axis of the first shielding portion of the first mask coincides with a symmetry axis of the first mask, and a symmetry axis of the first shielding portion of the second mask coincides with a symmetry axis of the second mask.

6. The mask according to claim 1 , wherein the second mask has a same shape and a same area as the shielding portion of the first mask, the shielding portion of the first mask has an area larger than that of the shielding portion of the second mask, the shielding portion of the first mask extends from an edge of the first mask into the first mask, and the shielding portion of the second mask extends from an edge of the second mask into the second mask.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 4, 2022
From: SHANGHAI TIANMA AM-OLED CO.,LTD.
To: WUHAN TIANMA MICRO-ELECTRONICS CO., LTD.; WUHAN TIANMA MICROELECTRONICS CO., LTD. SHANGHAI BRANCH
Reel/Frame 059498/0307 →
Priority Claims (1)
CN 201810996167.6 · Aug 29, 2018 · national
Continuity (2)
Division 16266068 · Feb 3, 2019
Related Publication 20210119188A1 · Apr 22, 2021