Vaporization device control systems and methods
Vaporization devices, components, and methods of operating them are provided. In some implementations, the vaporization device for use with a vaporizable material includes a device body, a power source, a microcontroller, a measurement circuit, and a microcontroller. The measurement circuit is configured to measure a resistance of a resistive heater. The microcontroller is configured to determine a baseline resistance based on the measured resistance, the measured resistance being measured after a period of time has passed since power from the power source was last applied to the resistive heater; determine a target resistance of the resistive heater based on the determined baseline resistance; and provide power from the power source to the resistive heater to heat the vaporizable material based at least in part on the target resistance.
1. A vaporization device for use with a vaporizable material, comprising:
a device body;
a power source within the device body;
a microcontroller within the device body; and
a measurement circuit within the device body, wherein the measurement circuit is configured to electrically couple to a resistive heater and measure a resistance of the resistive heaters;
wherein the microcontroller is configured to:
determine a baseline resistance based on the measured resistance, wherein the measured resistance is measured at a time point after a period of time has passed since power from flail the power source was last applied to the resistive heater;
determine a target resistance of the resistive heater based on the determined baseline resistance; and
provide power from the power source to the resistive heater to heat the vaporizable material based at least in part on the target resistance.
2. The vaporization device of claim 1 , further comprising:
a first switch, the first switch configured to supply power from the power source to the resistive heater, wherein the first switch is off when the resistance of the resistive heater is measured.
3. The vaporization device of claim 2 , further comprising:
a second switch, the second switch configured to supply power from the power source to the measurement circuit in response to a power signal received from the microcontroller.
4. The vaporization device of claim 1 , wherein the microcontroller is configured to determine that the measured resistance is the baseline resistance after a change in the measured resistance with time is at a rate that is below a stability threshold.
5. The vaporization device of claim 4 , wherein the stability threshold is a 1% change in resistance per millisecond or less.
6. The vaporization device of claim 1 , wherein the microcontroller is configured to calculate the target resistance for the resistive heater based on a percentage change of the baseline resistance.
7. The vaporization device of claim 1 , wherein the period of time when power is not applied to the resistive heater is 10 seconds or more.
8. The vaporization device of claim 1 , wherein the measurement circuit comprises a Wheatstone bridge, the Wheatstone bridge configured to measure the resistance of the resistive heater.
9. The vaporization device of claim 8 , further comprising:
one or more resistors connected to an output of the microcontroller and connected in parallel with a resistor of the Wheatstone bridge, the one or more resistors configured to tune the Wheatstone bridge.
10. The vaporization device of claim 8 , wherein the measurement circuit comprises an operational amplifier, the operational amplifier configured to receive an input from the Wheatstone bridge and output the measured resistance.
11. The vaporization device of claim 1 , further comprising:
a temperature sensor configured to provide an actual temperature of the resistive heater to the microcontroller.
12. The vaporization device of claim 1 , further comprising:
a memory, the memory configured for storing the baseline resistance of the resistive heater.
13. The vaporization device of claim 12 , wherein the memory is further configured for storing an updated baseline resistance in response to the microcontroller determining the updated baseline resistance.
14. The vaporization device of claim 1 , further comprising:
a pressure sensor, wherein the microcontroller is configured to apply power to the resistive heater when the pressure sensor detects a change in pressure.
15. The vaporization device of claim 14 , wherein the microcontroller is configured to adjust the power applied to the resistive heater based on a difference between a current resistance of the resistive heater and the target resistance of the resistive heater.
16. The vaporization device of claim 14 , wherein the microcontroller is configured to apply power to the resistive heater at an applied power duty cycle.
17. The vaporization device of claim 16 , wherein the applied power duty cycle is based on the difference between a current resistance of the resistive heater and the target resistance of the resistive heater.
18. The vaporization device of claim 17 , wherein the microcontroller is further configured to determine a maximum average power of the resistive heater based on a battery voltage measurement and the current resistance of the resistive heater, wherein a maximum duty cycle corresponds to the maximum average power.
19. The vaporization device of claim 1 , further comprising:
a reservoir configured to hold the vaporizable material; and
a wick in communication with the reservoir and adjacent to the resistive heater.
20. The vaporization device of claim 19 , further comprising:
a separable cartridge that includes the reservoir, the wick, and the resistive heater.
21. The vaporization device of claim 20 , further comprising:
the vaporizable material in the reservoir, wherein the vaporizable material comprises a nicotine formulation.
22. A vaporization device for use with a vaporizable material, comprising:
a device body comprising:
a microcontroller;
a power source;
a measurement circuit comprising a Wheatstone bridge, wherein the measurement circuit is configured to electrically couple to a resistive heater and measure a resistance of the resistive heater;
a pressure sensor;
a first switch, the first switch configured to supply power from the power source to the resistive heater in response to the pressure sensor detecting a change in pressure;
a second switch, the second switch configured to supply power to the measurement circuit in response to a power signal received from the microcontroller;
wherein the microcontroller is configured to:
determine a baseline resistance based on the measured resistance, wherein the measured resistance is measured at a time point after a period of time has passed since power from the power source was last applied to the resistive heater,
determine a target resistance of the resistive heater based on the determined baseline resistance; and
provide power from the power source to the resistive heater to heat the vaporizable material based at least in part on the target resistance; and
a memory configured to store the baseline resistance of the resistive heater.
23. The vaporization device of claim 22 , wherein the memory is further configured to store an updated baseline resistance in response to the microcontroller determining the updated baseline resistance.