IP Library Granted Patent US 11,476,206
Granted Patent B2
US 11,476,206 · App. 17/174,847 · Granted Oct 18, 2022

Semiconductor device and method of manufacturing same

Inventor: Takahiro Kato (Tokyo, JP)
Assignee: ABLIC INC.
H01L23/562H01L21/56H01L23/3107H01L23/49541
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Quick Facts
Patent No.
US 11,476,206
App. No.
17/174,847
Granted
Oct 18, 2022
Kind
B2
Abstract

A semiconductor element is mounted on a die pad, and electrode pads arranged along the outer circumference of an upper surface of the semiconductor element are electrically connected to leads by wires, respectively. The semiconductor element has an element region having a high sensitivity with respect to stress, and an element region having a relatively low sensitivity with respect to stress. A low-stress resin film is provided on the element region having a high sensitivity with respect to stress. The semiconductor element, the low-stress resin film, the die pad, and the leads are covered with an encapsulating resin.

Claims (30)

1. A semiconductor device, comprising:

a semiconductor element;

a die pad on which the semiconductor element is placed;

a lead arranged so as to be spaced apart from the die pad;

at least one of wires or bump electrodes extending between the lead and an element surface of the semiconductor element;

a low-stress resin film provided on the element surface of the semiconductor element and not covering the at least one of the wires or bump electrodes; and

an encapsulating resin for covering the semiconductor element, the low-stress resin film, the die pad, and the lead,

wherein the low-stress resin film has a Young's modulus which is smaller than a Young's modulus of the encapsulating resin, and has a first concave curved surface in a surface of the low-stress resin film opposite to a surface thereof in contact with the semiconductor element.

2. The semiconductor device according to claim 1 , wherein, in plan view, the low-stress resin film has a polygonal peripheral portion in which all interior angles are obtuse angles.

3. The semiconductor device according to claim 2 , wherein the element surface of the semiconductor element is parallel to an upper surface of the encapsulating resin.

4. The semiconductor device according to claim 2 , wherein the encapsulating resin has a second concave curved surface in an upper surface thereof.

5. The semiconductor device according to claim 1 , wherein, in plan view, the low-stress resin film has one of a circular peripheral portion and an elliptical peripheral portion.

6. The semiconductor device according to claim 5 , wherein the element surface of the semiconductor element is parallel to an upper surface of the encapsulating resin.

7. The semiconductor device according to claim 5 , wherein the encapsulating resin has a second concave curved surface in an upper surface thereof.

8. The semiconductor device according to claim 1 , wherein the element surface of the semiconductor element is parallel to an upper surface of the encapsulating resin.

9. The semiconductor device according to claim 1 , wherein the encapsulating resin has a second concave curved surface in an upper surface thereof.

10. A method of manufacturing a semiconductor device including:

a semiconductor element;

a die pad on which the semiconductor element is placed;

a lead arranged so as to be spaced apart from the die pad;

at least one of wires or bump electrodes extending between the lead and an element surface of the semiconductor element;

a low-stress resin film provided on the element surface of the semiconductor element and not covering the at least one of the wires or bump electrodes; and

an encapsulating resin for covering the semiconductor element, the low-stress resin film, the die pad, and the lead,

the method comprising:

preparing the die pad and the lead arranged so as to be spaced apart from the die pad;

mounting the semiconductor element on the die pad;

connecting the semiconductor element to the lead using the at least one of the wires or bump electrodes;

forming, on the element surface of the semiconductor element, the low-stress resin film in which a first back surface is a planar surface and a first main surface opposite to the first back surface is a first concave curved surface, wherein the low-stress resin film does not cover an area of the element surface of the semiconductor element where the at least one of the wires or bump electrodes connect to the semiconductor element;

forming the encapsulating resin to cover the semiconductor element, the low-stress resin film, the die pad, and the lead.

11. The method of manufacturing a semiconductor device according to claim 10 , wherein the forming, on the element surface of the semiconductor element, the low-stress resin film is performed by a method of bonding a film-shaped low-stress resin film.

Assignments (2)
CHANGE OF ADDRESS Recorded Jun 8, 2023
From: ABLIC INC.
To: ABLIC INC.
Reel/Frame 064021/0575 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 12, 2021
From: KATO, TAKAHIRO
To: ABLIC INC.
Reel/Frame 055246/0936 →
Priority Claims (1)
JP JP2020-027648 · Feb 21, 2020 · national
Continuity (1)
Related Publication 20210265283A1 · Aug 26, 2021