IP Library Granted Patent US 11,942,490
Granted Patent B2
US 11,942,490 · App. 17/178,791 · Granted Mar 26, 2024

Photon counting radiation detector and radiographic inspection device using the same

Inventors: Kuniyuki Kakushima (Yokohama Kanagawa, JP); Akito Sasaki (Yokohama Kanagawa, JP); Atsuya Sasaki (Yokohama Kanagawa, JP); Hideaki Hirabayashi (Yokohama Kanagawa, JP)
Assignees: KABUSHIKI KAISHA TOSHIBA; TOSHIBA MATERIALS CO., LTD.
H01L27/14607G01T1/241H01L27/14659H01L31/022408H01L31/028H01L31/0296H01L31/0304H01L31/03044H01L31/0312H01L31/032
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Quick Facts
Patent No.
US 11,942,490
App. No.
17/178,791
Granted
Mar 26, 2024
Kind
B2
Abstract

A photon counting radiation detector includes a cell structure including a substrate and an epitaxial layer provided on the substrate, radiation being incident on the epitaxial layer; an inclination θ of the substrate being set in a predetermined range, where t sub is a thickness of the substrate, t epi is a thickness of the epitaxial layer, L is a length of the substrate, and the inclination θ is an inclination of the substrate with respect to an incident direction of the radiation. The epitaxial layer is preferably one type selected from SiC, Ga 2 O 3 , GaAs, GaN, diamond, and CdTe. Such a photon counting radiation detector is preferably a direct converting type.

Claims (65)

1. A photon counting radiation detector, comprising:

a cell structure including

a substrate, and

an epitaxial layer provided on the substrate, radiation being incident on the epitaxial layer;

an inclination θ of the substrate satisfying Formula (1) below, where t sub is a thickness of the substrate, t epi is a thickness of the epitaxial layer, L is a length of the substrate, and the inclination θ is an inclination of the substrate with respect to an incident direction of the radiation and is greater than 0°:

θ

tan

θ

L

±

L

2

-

4

t

sub

(

t

sub

+

t

epi

)

2

(

t

sub

+

t

epi

)

.

(

1

)

2. The photon counting radiation detector according to claim 1 , wherein

the thickness of the substrate is 500 μm or less.

3. The photon counting radiation detector according to claim 1 , wherein

the thickness of the epitaxial layer is 100 μm or less.

4. The photon counting radiation detector according to claim 1 , wherein the epitaxial layer includes one type selected from SiC, Ga 2 O 3 , GaAs, GaN, diamond, and CdTe.

5. The photon counting radiation detector according to claim 1 , wherein

the cell structure further includes an electrode.

6. The photon counting radiation detector according to claim 5 , wherein

the electrode provided in the cell structure includes one or more types selected from the group consisting of carbon, silicon, titanium, platinum, and nickel.

7. The photon counting radiation detector according to claim 1 , further comprising

an array structure including a plurality of the cell structures and a plurality of insulating spacers provided between adjacent pairs of the plurality of cell structures, the plurality of cell structures and the plurality of insulating spacers being alternately arranged side by side in a lateral direction.

8. The photon counting radiation detector according to claim 7 , further comprising

a plurality of the array structures stacked in the incident direction of the radiation.

9. The photon counting radiation detector according to claim 1 , wherein the photon counting radiation detector is a direct converting type.

10. A radiographic inspection device, comprising:

the photon counting radiation detector according to claim 1 .

11. The photon counting radiation detector according to claim 1 , wherein

the thickness of the substrate is 500 μm or less, and

the thickness of the epitaxial layer is 100 μm or less.

12. The photon counting radiation detector according to claim 11 , wherein

the cell structure further includes an electrode.

13. The photon counting radiation detector according to claim 12 , wherein

the electrode provided in the cell structure includes one or more types selected from the group consisting of carbon, silicon, titanium, platinum, and nickel.

Assignments (4)
NUNC PRO TUNC ASSIGNMENT Recorded Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MATERIALS CO. LTD.
Reel/Frame 074940/0511 →
CHANGE OF NAME Recorded Feb 19, 2026
From: TOSHIBA MATERIALS CO. LTD.
To: NITERRA MATERIALS CO., LTD.
Reel/Frame 074941/0803 →
CHANGE OF ADDRESS Recorded Feb 19, 2026
From: KABUSHIKI KAISHA TOSHIBA
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 074941/0846 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2021
From: KAKUSHIMA, KUNIYUKI; SASAKI, AKITO; SASAKI, ATSUYA; HIRABAYASHI, HIDEAKI
To: KABUSHIKI KAISHA TOSHIBA; TOSHIBA MATERIALS CO., LTD.
Reel/Frame 055321/0476 →
Priority Claims (1)
JP 2018-200616 · Oct 25, 2018 · national
Continuity (2)
Continuation PCTJP2019040962 · Oct 17, 2019
Related Publication 20210175268A1 · Jun 10, 2021