Processes for producing trifluoroiodomethane and trifluoroacetyl iodide
The present disclosure provides a process for producing trifluoroiodomethane, the process comprising providing a reactant stream comprising hydrogen iodide and at least one trifluoroacetyl halide selected from the group consisting of trifluoroacetyl chloride, trifluoroacetyl fluoride, trifluoroacetyl bromide, and combinations thereof, reacting the reactant stream in the presence of a first catalyst at a first reaction temperature from about 25° C. to about 400° C. to produce an intermediate product stream comprising trifluoroacetyl iodide, and reacting the intermediate product stream in the presence of a second catalyst at a second reaction temperature from about 200° C. to about 600° C. to produce a final product stream comprising the trifluoroiodomethane.
1. A composition comprising:
at least 99 wt. % of trifluoroiodomethane;
less than 500 ppm hexafluoroethane;
less than 500 ppm trifluoromethane;
less than 100 ppm carbon monoxide;
less than 1 ppm hydrogen chloride; and
from 1 ppm to 500 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride.
2. The composition of claim 1 comprising:
at least 99.5 wt. % of trifluoroiodomethane;
less than 250 ppm hexafluoroethane;
less than 250 ppm trifluoromethane;
less than 50 ppm carbon monoxide;
less than 0.5 ppm hydrogen chloride; and
from 1 ppm to 250 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride.
3. The composition of claim 1 comprising:
at least 99.7 wt. % of trifluoroiodomethane;
less than 100 ppm hexafluoroethane;
less than 100 ppm trifluoromethane;
less than 20 ppm carbon monoxide;
less than 0.2 ppm hydrogen chloride; and
from 1 ppm to 100 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride.
4. The composition of claim 1 comprising:
at least 99.9 wt. % of trifluoroiodomethane;
less than 100 ppm hexafluoroethane;
less than 100 ppm trifluoromethane;
less than 20 ppm carbon monoxide;
less than 0.2 ppm hydrogen chloride; and
from 1 ppm to 100 ppm in total of compounds selected from the group consisting of trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetaldehyde, and trifluoroacetyl chloride.
5. A composition comprising:
at least 98 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 20,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
6. The composition of claim 5 consisting essentially of:
at least 98 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 20,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
7. The composition of claim 5 comprising:
at least 99 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 10,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
8. The composition of claim 7 consisting essentially of:
at least 99 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 10,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
9. The composition of claim 5 comprising:
at least 99.5 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 5,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
10. The composition of claim 9 consisting essentially of:
at least 99.5 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 5,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
11. The composition of claim 5 comprising:
at least 99.7 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 3,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.
12. The composition of claim 11 consisting essentially of:
at least 99.7 wt. % of trifluoroacetyl iodide, and
from about 1 ppm to about 3,000 ppm in total of compounds selected from the group consisting of chlorotrifluoroethane, trifluoroacetyl chloride, iodotrifluoromethane, trifluoroacetyl fluoride, hexafluoropropanone, trifluoroacetic acid and chlorotrifluoromethane.