Light emitting diode devices
Described are light emitting diode (LED) devices comprising a mesa with semiconductor layers, the semiconductor layers including an N-type layer, an active layer, and a P-type layer. The mesa has a top surface and at least one side wall, the at least one side wall defining a trench having a bottom surface. A passivation layer is on the at least one side wall and on the top surface of the mesa, the passivation layer comprises one or more a low-refractive index material and distributed Bragg reflector (DBR). A p-type contact is on the top surface of the mesa, and an n-type contact on the bottom surface of the trench.
1. A light emitting diode (LED) device comprising:
a mesa comprising semiconductor layers, the semiconductor layers including an N-type layer, an active layer, and a P-type layer, the mesa having a top surface and at least one side wall, the at least one side wall defining a trench having a bottom surface;
a passivation layer on the at least one side wall and on the top surface of the mesa and not on the bottom surface of the trench, the passivation layer comprising a low-refractive index material, the low-refractive index material having a refractive index of about 1 and selected from the group consisting of, porous silicon nitride (SiN), porous titanium oxide (TiO x ), porous aluminum oxide (AlO x ), porous hafnium oxide (HfO x ), porous niobium oxide (NbO x ), porous aluminum indium gallium nitride (AlInGaN), and porous aluminum indium gallium phosphide (AlInGaP);
an electrical passivation layer between the passivation layer and the mesa, the electrical passivation layer comprising one or more of silicon nitride (SiN), titanium oxide (TiO 2 ), niobium oxide (NbO 2 ), aluminum oxide (Al 2 O 3 ), hafnium oxide (HfO 2 ), aluminum nitride (AlN), silicon dioxide (SiO 2 ), and hafnium-doped silicon dioxide (HfSiO 2 );
a p-type contact on the top surface of the mesa; and
an n-type contact on the bottom surface of the trench.
2. The LED device of claim 1 , wherein the passivation layer has a thickness of at least 2 nm.
3. The LED device of claim 1 , wherein the semiconductor layers are epitaxial semiconductor layers having a thickness at least 1 micron.
4. A method of manufacturing a light emitting diode (LED) device comprising:
depositing a plurality of semiconductor layers including an N-type layer, an active layer, and a P-type layer on a substrate;
etching a portion of the semiconductor layers to form at least one trench and at least one mesa defining a pixel, the at least one mesa comprising the semiconductor layers, a top surface and at least one side wall, the at least one trench having a bottom surface;
depositing a passivation layer on the at least one side wall and on the top surface of the at least one mesa and not on the bottom surface of the trench, the passivation layer comprising a low-refractive index material, the low-refractive index material having a refractive index of about 1 and selected from the group consisting of, porous silicon nitride (SiN), porous titanium oxide (TiO x ), porous aluminum oxide (AlO x ), porous hafnium oxide (HfO x ), porous niobium oxide (NbO x ), porous aluminum indium gallium nitride (AlInGaN), and porous aluminum indium gallium phosphide (AlInGaP);
depositing an electrical passivation layer between the passivation layer and the at least one mesa, the electrical passivation layer comprising one or more of silicon nitride (SiN), titanium oxide (TiO 2 ), niobium oxide (NbO 2 ), aluminum oxide (Al 2 O 3 ), hafnium oxide (HfO 2 ), aluminum nitride (AlN), silicon dioxide (SiO 2 ), and hafnium-doped silicon dioxide (HfSiO 2 );
forming a p-type contact on the top surface of the at least one mesa; and
forming an n-type contact in the at least one trench.
5. The method of claim 4 , wherein the passivation layer has a thickness of at least 2 nm.
6. A light emitting diode (LED) device comprising:
a mesa comprising semiconductor layers, the semiconductor layers including an N-type layer, an active layer, and a P-type layer, the mesa having a height less than or equal to its width, the mesa having a top surface and at least one side wall, the at least one side wall defining a trench having a bottom surface;
a first passivation layer on the at least one side wall and on the top surface of the mesa and not on the bottom surface of the trench, the first passivation layer comprising one or more of a silicon nitride (SiN), titanium oxide (TiO 2 ), niobium oxide (NbO 2 ), aluminum oxide (Al 2 O 3 ), hafnium oxide (HfO 2 ), aluminum nitride (AlN), silicon dioxide (SiO 2 ), and hafnium-doped silicon dioxide (HfSiO 2 );
a second passivation layer on the first passivation layer, the second passivation layer comprising a low-refractive index material having a refractive index in of about 1, wherein the low-refractive index material comprises a material selected from the group consisting of, porous silicon nitride (SiN), porous titanium oxide (TiO x ), porous aluminum oxide (AlO x ), porous hafnium oxide (HfO x ), porous niobium oxide (NbO x ), porous aluminum indium gallium nitride (AlInGaN), and porous aluminum indium gallium phosphide (AlInGaP);
a p-type contact on the top surface of the mesa; and
an n-type contact on the bottom surface of the trench.