System and method for fabricating polarization holograms

1. A system, comprising:

a polarization volume hologram (“PVH”) mask configured to forwardly diffract an input beam as a first set of two collimated circularly polarized beams having a same handedness, wherein the two collimated circularly polarized beams in the first set output from the PVH mask have a zero diffraction angle and a non-zero diffraction angle respectively, and have non-parallel propagation directions; and

a polarization conversion element configured to convert the first set of two collimated circularly polarized beams into a second set of two collimated circularly polarized beams having opposite handednesses and having the non-parallel propagation directions,

wherein when the two collimated circularly polarized beams in the second set are output from the polarization conversion element, the two collimated circularly polarized beams in the second set interfere with one another to generate a polarization interference pattern.

2. The system of claim 1 , wherein the PVH mask includes a transmissive PVH grating.

3. The system of claim 1 , wherein the two collimated circularly polarized beams in the first set include a 0 th order diffracted beam and a 1 st order diffracted beam.

4. The system of claim 1 , wherein the two collimated circularly polarized beams in the first set have a substantially same light intensity.

5. The system of claim 1 , wherein the two collimated circularly polarized beams in the first set have planar wavefronts.

6. The system of claim 5 , wherein propagation directions of the two collimated circularly polarized beams in the first set are symmetric or asymmetric with respect to the normal of the surface of the PVH mask.

7. The system of claim 1 , wherein the polarization conversion element includes an oblique compensation plate (“O-plate”).

8. The system of claim 7 , wherein

the first set of two collimated circularly polarized beams includes a first polarized beam having a first incidence angle relative to the O-plate, and a second polarized beam having a second incidence angle relative to the O-plate,

the O-plate is configured to provide a half-wave retardance to the first polarized beam having the first incidence angle, and a zero or full-wave retardance to the second polarized beam having the second incidence angle, and

the first incidence angle is within a predetermined angle range, and the second incidence angle is outside of the predetermined angle range.

9. The system of claim 1 , further comprising:

a light deflecting element configured to direct the input beam toward the PVH mask; and

a movable stage configured to support the light deflecting element, and adjust at least one of an orientation or a position of the light deflecting element to change an incidence angle of the input beam incident onto the PVH mask.

10. The system of claim 1 , further comprising:

a movable stage configured to support the PVH mask, the polarization conversion element, and a recoding medium layer,

wherein the movable stage is movable to adjust at least one of a position or an orientation of the recoding medium layer.

11. The system of claim 1 , wherein the PVH mask and the polarization conversion element are stacked together and are in direct contact.

12. A method, comprising:

directing an input beam to a polarization volume hologram (“PVH”) mask;

forwardly diffracting, by the PVH mask, the input beam as a first set of two collimated circularly polarized beams having a same handedness, wherein the two collimated circularly polarized beams in the first set output from the PVH mask have a zero diffraction angle and a non-zero diffraction angle, respectively, and have non-parallel propagation directions; and

converting, by a polarization conversion element, the first set of two collimated circularly polarized beams into a second set of two collimated circularly polarized beams having opposite handednesses, wherein when the two collimated circularly polarized beams in the second set are output from the polarization conversion element, the two collimated circularly polarized beams in the second set interfere with one another to generate a polarization interference pattern.

13. The method of claim 12 , further comprising:

directing the second set of two collimated circularly polarized beams having opposite handednesses to a same surface of a recording medium layer; and

exposing at least one portion of the recording medium layer to the polarization interference pattern to record the polarization interference pattern in the at least one portion,

wherein the polarization interference pattern recorded in the at least one portion of the recording medium layer defines an orientation pattern of an optic axis in the at least one portion of the recording medium layer.

14. The method of claim 13 ,

wherein the PVH mask is a first PVH mask, the polarization interference pattern is a first polarization interference pattern, and the first polarization interference pattern is recorded in a first portion of the recording medium layer, and

wherein the method further comprises:

replacing the first PVH mask with a second PVH mask;

forwardly diffracting, by the second PVH mask, the input beam as a third set of two collimated circularly polarized beams;

converting, by the polarization conversion element, the third set of two collimated circularly polarized beams into a fourth set of two collimated circularly polarized beams having opposite handednesses, the two collimated circularly polarized beams in the fourth set interfering with one another to generate a second polarization interference pattern; and

recording the second polarization interference pattern in a second portion of the recording medium layer.

15. The method of claim 13 ,

wherein the polarization interference pattern is a first polarization interference pattern, and the first polarization interference pattern is recorded in a first portion of the recording medium layer, and

wherein the method further comprises:

adjusting at least one of a wavelength of the input beam, an incidence angle of the input beam with respect to the PVH mask, or a relative position or a relative orientation between the recording medium layer and the input beam;

forwardly diffracting, by the PVH mask, the input beam as a third set of two polarized beams;

converting, by the polarization conversion element, the third set of two collimated circularly polarized beams into a fourth set of two collimated circularly polarized beams having the opposite handednesses, the two collimated circularly polarized beams in the fourth set interfering with one another to generate a second polarization interference pattern; and

recording the second polarization interference pattern in a second portion of the recording medium layer.

16. The method of claim 13 , wherein

the recording medium layer includes a surface photo-alignment material, and

the method further comprises forming a birefringent medium layer on the recording medium layer after the polarization interference pattern is recorded in the recording medium.

17. The method of claim 13 , wherein the recording medium layer includes a bulk photo-alignment material.

18. The method of claim 12 , wherein the two collimated circularly polarized beams in the first set include a 0 th order diffracted beam, and a 1 st order diffracted beam.

19. The method of claim 12 , wherein the PVH mask includes a transmissive PVH grating.