Display device including two types of transistors
A display device includes: a substrate including a display region and a peripheral region, wherein the peripheral region is adjacent to the display region; a first transistor disposed on the peripheral region, wherein the first transistor includes a first semiconductor layer and the first semiconductor layer is a silicon semiconductor layer; and a second transistor disposed on the display region, wherein the second transistor includes a second semiconductor layer and the second semiconductor layer is an oxide semiconductor layer, wherein the first transistor is electrically connected to the second transistor.
1. A display device, comprising:
a substrate comprising a display region and a peripheral region, wherein the peripheral region is adjacent to the display region;
a first transistor disposed on the peripheral region, wherein the first transistor comprises a first semiconductor layer and the first semiconductor layer is a silicon semiconductor layer; and
a second transistor disposed on the display region, wherein the second transistor comprises a second semiconductor layer, a gate electrode disposed above the second semiconductor layer, and a drain electrode electrically connected to the second semiconductor layer, and the second semiconductor layer is an oxide semiconductor layer,
wherein the first transistor is electrically connected to the gate electrode of the second transistor and is electrically insulated from the drain electrode of the second transistor.
2. The display device of claim 1 , wherein the first transistor further comprises a drain electrode electrically connected to the first semiconductor layer, and the drain electrode of the first transistor is electrically connected to the gate electrode of the second transistor.
3. The display device of claim 1 , further comprising a first insulating layer disposed under the first semiconductor layer, wherein the first insulating layer comprises silicon oxide.
4. The display device of claim 3 , further comprising a first buffer layer disposed between the substrate and the first insulating layer, wherein the first buffer layer comprises silicon oxide.
5. The display device of claim 4 , further comprising a second buffer layer disposed between the first insulating layer and the first buffer layer, wherein the second buffer layer comprises silicon nitride.
6. The display device of claim 3 , wherein a thickness of the first insulating layer is greater than or equal to 200 nm and less than or equal to 500 nm.