Corrosion inhibitor for various acids

1. A composition for use with a chrome-friendly modified acid composition for use in downhole oil industry activities, wherein the composition consists of:

10% to 80% by weight of a thiourea derivative;

5% to 75% by weight of a first amphoteric surfactant selected from the group consisting of: a sultaine surfactant, a betaine surfactant, and combinations thereof;

5% to 75% by weight of a second amphoteric surfactant; and

10% to 80% by weight of a solvent selected from the group consisting of: water, methanol, ethanol, isopropanol, and combinations thereof,

wherein the composition is a liquid corrosion inhibitor composition.

2. The composition according to claim 1 , wherein the thiourea derivative is 1,3 diethyl-2-thiourea.

3. The liquid corrosion inhibitor composition according to claim 1 , wherein the first amphoteric surfactant is selected from the group consisting of: an amido betaine surfactant; an amido sultaine surfactant; and combinations thereof.

4. The composition according to claim 3 , wherein the first amphoteric surfactant is an amido betaine comprising a hydrophobic tail from C8 to C16.

5. The composition according to claim 4 , wherein the first amphoteric surfactant is cocamidopropyl betaine.

6. The composition according to claim 1 , wherein the second amphoteric surfactant is beta-Alanine, N-(2-carboxyethyl)-N-dodecyl-, sodium salt (1:1).

7. The composition according to claim 1 , wherein the solvent is a combination selected from the group consisting of: isopropanol-water; isopropanol-methanol; methanol-ethanol; ethanol-water; and methanol-water.

8. The composition according to claim 1 , wherein the thiourea derivative is present in a concentration ranging from 15% to 50% of the weight of the composition.

9. The composition according to claim 8 , wherein the thiourea derivative is present in a concentration ranging from 20% to 40% of the weight of the composition.

10. The composition according to claim 1 , wherein the first amphoteric surfactant is present in a concentration ranging from 5% to 30% of the weight of the composition.

11. The composition according to claim 1 , wherein the second amphoteric surfactant is present in a concentration ranging from 5% to 30% of the weight of the composition.

12. The composition according to claim 1 , wherein the solvent is present in a concentration ranging from 20% to 80% of the weight of the composition.

13. The composition according to claim 12 , wherein the solvent is present in a concentration ranging from 30% to 70% of the weight of the composition.

14. A modified acid composition having a pH of no more than about 1 and consisting of the composition according to claim 1 and an acid composition, said acid composition is selected from the group consisting of: HCl; HCl-urea in a molar ratio ranging from 0.1:1.0; phosphoric acid; urea-phosphoric acid in a molar ratio of not less than 0.1:1; and a phosphoric acid derivative.

15. The modified acid composition of claim 14 , wherein the phosphoric acid derivative is selected from the group consisting of: polyphosphoric acid, orthophosphoric acid (H 3 PO 4 ), pyrophosphoric acid (H 4 P 2 O 7 ), tripolyphosphoric acid (H 5 P 3 O 10 ), tetrapolyphosphoric acid (H 6 P 4 O 13 ), trimetaphosphoric acid (H 3 P 3 O 9 ), and phosphoric anhydride (P 4 O 10 ).

16. A modified acid composition having a pH of no more than about 1 and comprising an acid selected from the group consisting of: HCl-urea in a molar ratio ranging from 0.1:1.0, phosphoric acid-urea in a molar ratio of not less than 0.1:1, and a phosphoric acid derivative; and a composition consisting of:

10% to 80% by weight of a thiourea derivative;

5% to 75% by weight of a betaine surfactant;

5% to 75% by weight of an amphoteric surfactant; and

10% to 80% by weight of a solvent.

17. A composition for use with a chrome-friendly modified acid composition for use in downhole oil industry activities, said composition consisting of:

1,3 diethyl-2-thiourea, present in a concentration ranging from 10% to 80% of the weight of the composition;

a first amphoteric surfactant selected from the group consisting of: a sultaine surfactant, a betaine surfactant, and combinations thereof, present in a concentration ranging from 5% to 75% of the weight of the composition;

a second amphoteric surfactant, present in a concentration ranging from 5% to 75% of the weight of the composition; and

a solvent, present in a concentration ranging from 10% to 80% of the weight of the composition,

wherein the composition is a composition.