RF generator device and substrate processing apparatus

1. A radio frequency (RF) generator device for supplying RF powers of different frequencies to multiple antennas disposed in a chamber, the RF generator device comprising:

a plurality of RF generators configured to supply the RF powers of the different frequencies to the multiple antennas; and

a plurality of RF controllers configured to control the RF generators, respectively,

wherein each of the RF controllers includes:

a fast Fourier transformer; and

a filter,

wherein the fast Fourier transformer performs fast Fourier transform on a signal introduced as a reflected wave to decompose the signal into frequency components, and

the filter removes waves having frequency components that are not outputted from the corresponding RF generator.

2. The RF generator device of claim 1 , wherein a difference frequency between the frequencies of the RF powers supplied to the antennas is within a range where interference is removable by the filter.

3. The RF generator device of claim 1 , further comprising:

a plurality of matching units disposed between the antennas and the RF generators.

4. A radio frequency (RF) generator device comprising:

a first RF generator device connected to a first antenna and a second antenna disposed in a chamber,

wherein the first RF generator device includes:

a first RF generator configured to supply RF power having a first frequency to the first antenna;

a second RF generator configured to supply RF power having a second frequency to the second antenna;

a first RF controller configured to control the first RF generator; and

a second RF controller configured to control the second RF generator,

wherein the first RF controller includes:

a first fast Fourier transformer; and

a first filter,

wherein the second RF controller includes: a second fast Fourier transformer; and a second filter, wherein the first and the second fast Fourier transformers perform fast Fourier transform on a signal introduced as a reflected wave to decompose the signal into frequency components, and

the first filter and the second filter remove waves having frequency components that are not outputted from the corresponding RF generator between the first RF generator and the second RF generator.

5. The RF generator device of claim 4 , wherein the second RF controller compares the first frequency with a frequency calculated from a predetermined matching algorithm to determine the second frequency used for impedance matching.

6. The RF generator device of claim 5 , wherein a difference frequency between the first frequency and the second frequency is within a range where interference is removable by the filter.

7. The RF generator device of claim 6 , wherein the difference frequency is 10 kHz.

8. The RF generator device of claim 5 , further comprising:

a second RF generator device connected to a third antenna and a fourth antenna disposed in the chamber,

wherein the second RF generator device includes:

a third RF generator configured to supply RF power having a third frequency to the third antenna;

a fourth RF generator configured to supply RF power having a fourth frequency to the fourth antenna;

a third RF controller configured to control the third RF generator; and

a fourth RF controller configured to control the fourth RF generator,

wherein the third RF controller includes:

a third fast Fourier transformer; and

a third filter,

wherein the fourth RF controller includes: a fourth fast Fourier transformer; and a fourth filter, wherein the third and the fourth fast Fourier transformers perform fast Fourier transform on the signal introduced as a reflected wave to decompose the signal into frequency components, and

the third filter and the fourth filter remove waves having frequency components that are not outputted from the corresponding RF generator between the third RF generator and the fourth RF generator.

9. The RF generator device of claim 8 , wherein the third RF controller compares the first frequency and the second frequency with a frequency calculated from a predetermined matching algorithm to determine the third frequency used for impedance matching, and

the fourth RF controller compares the third frequency with a frequency calculated from a predetermined matching algorithm to determine the fourth frequency used for impedance matching.

10. The RF generator device of claim 9 , wherein a difference frequency between the third frequency and the fourth frequency is within a range where interference is removable by the filter.