Reducing or eliminating liquid de-gassing

1. An apparatus to reduce de-gassing from a liquid precursor during dispensing under vacuum, the apparatus comprising:

a liquid-flow controller configured to be coupled to a liquid-supply vessel containing the liquid precursor;

at least one valve hydraulically coupled downstream of and to the liquid-flow controller by a liquid line, the at least one valve configured to be opened and closed to maintain a minimum pressure that is sufficiently high enough to reduce de-gassing of the liquid precursor throughout the liquid line;

an atomizer hydraulically coupled downstream of and to the at least one valve, the atomizer configured to produce droplets of the liquid precursor and further to be coupled on a downstream side to a vacuum source; and

a carrier gas line to convey a push gas to transport vapor produced by a heat exchanger from the droplets of the liquid precursor into a deposition chamber to be coupled between the atomizer and the vacuum source.

2. The apparatus of claim 1 , wherein the heat exchanger is hydraulically coupled downstream of the atomizer to vaporize the droplets of the liquid precursor, thereby forming the vapor.

3. The apparatus of claim 1 , wherein the deposition chamber is configured to form films from the droplets of the liquid precursor onto a substrate in the deposition chamber.

4. The apparatus of claim 1 , liquid-flow controller coupled hydraulically between the liquid-supply vessel and the at least one valve, the liquid-flow controller configured to receive liquid from the liquid-supply vessel and control an amount of liquid from the liquid-supply vessel that is allowed to pass onto the at least one valve.

5. The apparatus of claim 4 , wherein the liquid-flow controller is a mass-flow controller.

6. The apparatus of claim 4 , control system coupled to

the liquid-flow controller and the at least one valve, the control system being configured to:

provide a flow set-point signal to the liquid-flow controller and receive a flow-feedback signal from the liquid-flow controller; and

open and close the at least one valve to decrease and increase a pressure level, respectively, within the liquid line.

7. The apparatus of claim 6 , wherein the control system includes at least one controller selected from controllers including a programmable logic controller (PLC), a proportional-integral-derivative (PID) controller, a distributed control system (DCS), and a system-logic controller (SLC).

8. The apparatus of claim 1 , second valve hydraulically coupled between the at least one valve and the atomizer, the second valve to decrease and increase a pressure level within the liquid line.

9. The apparatus of claim 8 , wherein the at least one valve and the second valve are configured to alternately be opened and closed to reduce the de-gassing of the liquid precursor in the liquid line.

10. The apparatus of claim 1 , wherein the at least one valve comprises a three-way valve to function as a purge-control valve for the atomizer, wherein a drain line coupled to the at least one valve is configured to purge liquids from the apparatus.

11. An apparatus to reduce de-gassing from a liquid precursor, the apparatus comprising:

a first valve hydraulically coupled downstream of and to a liquid-flow controller by a liquid line, the liquid-flow controller coupled to a liquid supply vessel containing the liquid precursor, the first valve configured to maintain a pressure that is sufficiently high enough to reduce de-gassing of the liquid precursor throughout the liquid line;

an atomizer hydraulically coupled downstream of and to the first valve, the atomizer configured to produce droplets of the liquid precursor and further to be coupled on a downstream side to a vacuum source; and

a second valve hydraulically coupled between the first valve and the atomizer, the second valve to decrease and increase a pressure level within the liquid line, the first valve and the second valve being configured to alternately be opened and closed to reduce the de-gassing of the liquid precursor in the liquid line.

12. The apparatus of claim 11 , heat exchanger hydraulically coupled downstream of the atomizer to vaporize the droplets of the liquid precursor.

13. The apparatus of claim 12 , deposition chamber coupled between the atomizer and the vacuum source, the deposition chamber configured to form films from the droplets of the liquid precursor onto a substrate in the deposition chamber.

14. The apparatus of claim 11 , control system coupled to the first valve, the control system being configured to open and close the first valve to decrease and increase a pressure level, respectively, within the liquid line.

15. An apparatus to reduce de-gassing from a liquid precursor, the apparatus comprising:

a first valve and a second valve hydraulically coupled to each other in series and further hydraulically coupled downstream of and to a liquid-flow controller by a liquid line, the liquid-flow controller coupled to a liquid supply vessel containing the liquid precursor, the first valve and the second valve configured to maintain a pressure that is sufficiently high enough to reduce de-gassing of the liquid precursor throughout the liquid line, the first valve and the second valve further being configured to alternately be opened and closed to reduce the de-gassing of the liquid precursor in the liquid line; and

an atomizer hydraulically coupled downstream of and to the first valve, the atomizer configured to produce droplets of the liquid precursor and further to be coupled on a downstream side to a vacuum source.

16. The apparatus of claim 15 , heat exchanger hydraulically coupled downstream of the atomizer to vaporize the droplets of the liquid precursor.

17. The apparatus of claim 15 , control system coupled to the first valve and to the second valve, the control system being configured to open and close the first valve and the second to decrease and increase a pressure level, respectively, within the liquid line.