Active gas generation apparatus
View Patent ↗In an active gas generation apparatus of the present invention, an auxiliary conductive film provided on a first electrode dielectric film is provided to overlap part of an active gas flow path in plan view, and the auxiliary conductive film is set to the ground potential. An active gas auxiliary member provided on a second electrode dielectric film is provided to fill part of the active gas flow path between a discharge space and a gas ejection hole in a dielectric space between the first and second electrode dielectric films in order to limit to an active gas flow gap.
1. An active gas generation apparatus that generates an active gas obtained by activating a raw material gas supplied to a discharge space, the active gas generation apparatus comprising:
a first electrode component; and
a second electrode component provided below said first electrode component, wherein
said first electrode component has a first electrode dielectric film and a first metal electrode formed on an upper surface of said first electrode dielectric film, said second electrode component having a second electrode dielectric film and a second metal electrode formed on a lower surface of said second electrode dielectric film, an AC voltage being applied between said first and second metal electrodes, and a dielectric space in which said first and second electrode dielectric films face each other including, as said discharge space, an area where said first and second metal electrodes overlap each other in plan view,
said second electrode dielectric film has a gas ejection hole for ejecting said active gas outside, and a path from said discharge space to said gas ejection hole is defined as an active gas flow path,
said first electrode component further has an auxiliary conductive film formed, independently of said first metal electrode, on the upper surface of said first electrode dielectric film,
said auxiliary conductive film is provided to overlap part of said active gas flow path in plan view, and said auxiliary conductive film is set to a ground potential, and
said active gas generation apparatus further comprises an active gas auxiliary member provided to fill part of said active gas flow path between said discharge space and said gas ejection hole in said dielectric space.
2. The active gas generation apparatus according to claim 1 , wherein
in said dielectric space, a path through which said raw material gas reaches said discharge space is defined as a raw material gas flow path, and
said active gas generation apparatus further comprises a raw material gas auxiliary member provided to fill part of said raw material gas flow path in said dielectric space.
3. The active gas generation apparatus according to claim 1 , wherein said raw material gas is a gas containing at least one of hydrogen, nitrogen, oxygen, fluorine, and chlorine gas.