Combination of strain management layers for light emitting elements
The disclosure describes various aspects of strain management layers for light emitting elements such as light-emitting diodes (LEDs). The present disclosure describes an LED structure formed on a substrate and having a strain management region supported on the substrate, and an active region configured to provide a light emission associated with the LED structure. The strain management region includes a first layer including a superlattice having a plurality of repeated first and second sublayers, and a second layer including a bulk layer. In an embodiment, at least one of the first and second sublayers and the bulk layer includes a composition of In x Al y Ga 1-x-y N. A device having multiple LED structures and a method of making the LED structure are also described.
1. A light-emitting diode (LED) structure formed on a substrate, the LED structure comprising:
a strain management region supported on the substrate; and
an active region configured to provide a light emission associated with the LED structure,
wherein the strain management region includes a plurality of sets of layers,
each set of layers from the plurality of sets of layers including:
a first layer including a superlattice having a plurality of repeated first sublayers and second sublayers, and
a second layer including a bulk layer.
2. The LED structure of claim 1 , wherein the first layer is disposed adjacent to the substrate.
3. The LED structure of claim 1 , wherein the second layer is disposed adjacent to the substrate.
4. The LED structure of claim 1 , wherein at least one of the first sublayers and the second sublayers or the bulk layer includes a composition of In x Al y Ga 1-x-y N.
5. The LED structure of claim 4 , wherein the composition of In x Al y Ga 1-x-y N for the bulk layer is based on a value of x ranging from 0 to 0.15.
6. The LED structure of claim 4 , wherein the composition of In x Al y Ga 1-x-y N for the first sublayers is based on a value of x ranging from 0 to 0.3.
7. The LED structure of claim 4 , wherein the composition of In x Al y Ga 1-x-y N for the second sublayers is based on a value of x ranging from 0 to 0.1.
8. The LED structure of claim 1 , wherein the active region includes at least one quantum well.
9. The LED structure of claim 1 , wherein the light emission associated with the LED structure includes electromagnetic radiation in a visible wavelength range.
10. A light emitting device, comprising:
a semiconductor template;
an array of light emitting structures supported on the semiconductor template, at least one light emitting structure of the array of light emitting structures including:
an active region configured to provide a light emission associated with the at least one light emitting structure; and
a strain management region including:
a first layer including a superlattice having a plurality of repeated first sublayers and second sublayers, and
a second layer including a bulk layer,
wherein at least one of the first sublayers and the second sublayers or the bulk layer of the strain management region of the at least one light emitting structure includes a composition of InAlGaN.
11. The light emitting device of claim 10 , wherein the strain management region of the at least one light emitting structure includes a plurality of sets of alternating first and second layers.
12. A light-emitting diode (LED) structure formed on a substrate, the LED structure comprising:
a strain management region supported on the substrate, the strain management region including a plurality of first layers alternating with a plurality of second layers each including a bulk layer, the plurality of first layers each including a superlattice having a plurality of repeated first sublayers and second sublayers; and
an active region configured to provide a light emission associated with the LED structure.
13. The LED structure of claim 12 , wherein one of the plurality of first layers is disposed adjacent to the substrate.
14. The LED structure of claim 12 , wherein one of the plurality of second layers is disposed adjacent to the substrate.
15. The LED structure of claim 12 , wherein at least one of the bulk layer or the first sublayers and the second sublayers includes a composition of In x Al y Ga 1-x-y N.
16. The LED structure of claim 15 , wherein the composition of In x Al y Ga 1-x-y N for the bulk layer is based on a value of x ranging from 0 to 0.15.
17. The LED structure of claim 15 , wherein the composition of In x Al y Ga 1-x-y N for the first sublayers is based on a value of x ranging from 0 to 0.3.
18. The LED structure of claim 15 , wherein the composition of In x Al y Ga 1-x-y N for the second sublayers is based on a value of x ranging from 0 to 0.1.
19. The LED structure of claim 12 , wherein the active region includes at least one quantum well.
20. The LED structure of claim 12 , wherein the light emission associated with the LED structure includes electromagnetic radiation in a visible wavelength range.