IP Library Patent Application 17324848
Patent Application
App. No. 17/324,848

PASSIVE AND ACTIVE CALIBRATION METHODS FOR A RESISTIVE HEATER

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Quick Facts
Patent No.
US None
App. No.
17/324,848
Abstract

A method of calibrating a heater includes powering the heater to a first temperature setpoint. The heater includes a resistive heating element that has a varying temperature coefficient of resistance. The method further includes concurrently obtaining a plurality of resistance measurements of the resistive heating element and a plurality of reference temperature measurements of a reference member as the heater cools from a first temperature setpoint to a second temperature setpoint that is lower than the first temperature setpoint, and generating a resistance-temperature calibration table that correlates the plurality of resistance measurements with the plurality of reference temperature measurements.

Claims (33)

1 . A method of calibrating a heater, the method comprising:

powering a heater in an isothermal environment to a first temperature setpoint, wherein the heater comprises a resistive heating element having a temperature coefficient of resistance;

concurrently obtaining a plurality of resistance measurements of the resistive heating element and a plurality of reference temperature measurements of a reference member as the heater passively cools from a first temperature setpoint to a second temperature setpoint; and

generating a resistance-temperature calibration table that correlates the plurality of resistance measurements with the plurality of reference temperature measurements.

2 . The method of claim 1 further comprising turning-off power to the heater when the heater is at the first temperature setpoint to passively cool the heater.

3 . The method of claim 1 , wherein the reference member is an exterior surface of the heater.

4 . The method of claim 3 , wherein the plurality of reference temperature measurements of the surface of the heater are obtained with an infrared camera.

5 . The method of claim 1 , wherein the plurality of reference temperature measurements are obtained with a thermocouple wafer and the reference member is the thermocouple wafer.

6 . The method of claim 1 , wherein to obtain a resistance measurement from among the plurality of resistance measurements, the method further comprises measuring at least one of an electric current and a voltage concurrently with the plurality of reference temperatures, and determining the resistance measurement based on the measured at least one electric current and the voltage.

7 . A method of calibrating a heater, the method comprising:

powering the heater in a designated environment to a first temperature setpoint, wherein the heater comprises a resistive heating element having a varying temperature coefficient of resistance;

concurrently obtaining a plurality of resistance measurements of the resistive heating element and a plurality of reference temperature measurements of a reference member as the heater passively cools from a first temperature setpoint to a second temperature setpoint that is lower than the first temperature setpoint; and

generating a resistance-temperature calibration table that correlates the plurality of resistance measurements with the plurality of reference temperature measurements.

8 . The method of claim 7 , wherein the designated environment is an isothermal environment.

9 . The method of claim 7 , wherein the designated environment is an operating environment in which the heater is operable to heat a workpiece.

10 . The method of claim 7 further comprising turning-off power to the heater when the heater is at the first temperature setpoint to passively cool the heater.

11 . The method of claim 7 , wherein the reference member is an exterior surface of the heater.

12 . The method of claim 11 , wherein the plurality of reference temperature measurements of the exterior surface of the heater are obtained with an infrared camera.

13 . The method of claim 7 , wherein the plurality of reference temperature measurements are obtained with a thermocouple wafer and the reference member is the thermocouple wafer.

14 . The method of claim 7 , wherein to obtain a resistance measurement from among the plurality of resistance measurements, the method further comprises measuring at least one of an electric current and a voltage concurrently with the plurality of reference temperatures, and determining the resistance measurement based on the measured at least one electric current and the voltage.

15 . A control system for controlling a heater having a resistive heating element, the control system comprising:

a power converter configured to provide an output voltage that is adjustable to the heater;

a controller configured to determine the output voltage to be applied to the heater, the controller comprises:

a memory configured to store a plurality of control programs for controlling the heater, wherein the plurality of control programs includes a calibration process; and

a processor configured to execute the plurality of control programs, wherein with the heater is in a designated environment, the calibration process includes instructions to:

turn-on power to the heater to heat the heater to a first temperature setpoint;

concurrently obtain a plurality of resistance measurements of the resistive heating element and a plurality of reference temperature measurements of a reference member as the heater passively cools from the first temperature setpoint to a second temperature setpoint; and

generate a resistance-temperature calibration table that correlates the plurality of resistance measurements with the plurality of reference temperature measurements.

16 . The control system of claim 15 , wherein the calibration process further includes instructions to turn-off power to the heater when the heater is at the first temperature setpoint to passively cool the heater.

17 . The control system of claim 15 , wherein the reference member is an exterior surface of the heater.

18 . The control system of claim 15 , wherein the second temperature setpoint is lower than the first temperature setpoint.

19 . The control system of claim 15 , wherein the designated environment is an isothermal environment.

20 . The control system of claim 15 , wherein to obtain a resistance measurement from among the plurality of resistance measurements, the calibration process further includes instructions to measure at least one of an electric current and a voltage concurrently with the plurality of reference temperature measurements, and determine the resistance measurement based on the at least one electric current and the voltage.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 19, 2021
From: BREITLOW, STANTON H.; PHILLIPS, BRITTANY; PTASIENSKI, KEVIN
To: WATLOW ELECTRIC MANUFACTURING COMPANY
Reel/Frame 056293/0495 →