Wafer-level 3D integration of high voltage optical transformer
A method of forming a high voltage optical transformer includes forming a via through a transparent carrier wafer, forming a conductive layer within the via, bonding a solid state lighting (SSL) package to a first side of the carrier wafer, and bonding a photovoltaic (PV) wafer to a second side of the carrier wafer opposite to the first side. The photovoltaic wafer may include an active area and a conductive area located outside of the active area that is in electrical contact with the conductive layer. The method further includes forming both an SSL contact with the solid state lighting package and a PV contact with the conductive layer on the same side of the carrier wafer.
1. A method comprising:
forming a via through a transparent carrier wafer;
forming a conductive layer within the via;
bonding a solid state lighting (SSL) package to a first side of the carrier wafer;
bonding a photovoltaic (PV) wafer to a second side of the carrier wafer opposite to the first side, wherein the photovoltaic wafer comprises an active area and a conductive area located outside of the active area, the conductive area being in electrical contact with the conductive layer;
forming an SSL contact over the solid state lighting package on the first side of the carrier wafer; and
forming a PV contact over the conductive layer on the first side of the carrier wafer.
2. The method of claim 1 , wherein forming the via comprises drilling or etching entirely through the carrier wafer.
3. The method of claim 1 , wherein the carrier wafer comprises sapphire or glass.
4. The method of claim 1 , wherein the conductive layer comprises copper.
5. The method of claim 1 , wherein a light emission side of the solid state lighting package faces the carrier wafer.
6. The method of claim 1 , wherein the active area of the photovoltaic wafer faces the carrier wafer.
7. The method of claim 1 , wherein bonding the photovoltaic wafer to the carrier wafer comprises forming a hybrid adhesive and conductive layers between the photovoltaic wafer and the carrier wafer.
8. The method of claim 7 , wherein the hybrid adhesive layer comprises a substantially planar surface.
9. The method of claim 1 , further comprising thinning the solid state lighting package.
10. The method of claim 1 , further comprising thinning the photovoltaic wafer.
11. The method of claim 1 , further comprising forming a reflective layer over the photovoltaic wafer opposite to the conductive area and overlying at least a portion of the active area.
12. The method of claim 1 , wherein a surface of the SSL contact and a surface of the PV contact are substantially co-planar.
13. The method of claim 1 , further comprising applying power to the solid state lighting package, wherein the solid state lighting package and the active area are aligned while applying the power.
14. A method comprising:
forming a via through a transparent carrier wafer;
forming a conductive layer within the via;
bonding a solid state lighting (SSL) package to a first side of the carrier wafer;
bonding a photovoltaic (PV) wafer to a second side of the carrier wafer opposite to the first side, wherein the photovoltaic wafer comprises an active area and a conductive area located outside of the active area in electrical contact with the conductive layer;
forming an SSL contact over the solid state lighting package; and
forming a PV contact over the conductive layer, wherein the SSL contact and the PV contact are substantially-coplanar.
15. The method of claim 14 , further comprising forming a hybrid adhesive layer between the photovoltaic wafer and the carrier wafer prior to bonding the photovoltaic wafer to the second side of the carrier wafer.
16. The method of claim 1 , further comprising removing a portion of the solid state lighting (SSL) package to expose the conductive layer on the first side of the carrier wafer prior to forming the PV contact.