IP Library Granted Patent US 12,594,166
Granted Patent B2
US 12,594,166 · App. 17/344,518 · Granted Apr 7, 2026

Method for manufacturing a low-profile intercranial device and the low-profile intercranial device manufactured thereby

Inventors: Chad R. Gordon (Cockeysville, MD); Jesse Christopher (Hunt Valley, MD)
Assignee: Longeviti Neuro Solutions, Inc.
A61F2/2875
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,594,166
App. No.
17/344,518
Granted
Apr 7, 2026
Kind
B2
Abstract

A low-profile intercranial device including a low-profile static cranial implant and a functional neurosurgical implant. The low-profile static cranial implant and the functional neurosurgical implant are virtually designed and interdigitated prior to physical assembly of the low-profile intercranial device.

Claims (24)

1 . A cranial device, comprising:

a cranial implant shaped and dimensioned for placement at least partially within a resected portion of a patient's skull during performance of a cranioplasty, wherein the cranial implant is clear and allows for ultrasound transmission through the cranial implant for transmission of vital imaging with minimal distortion and wireless signal communication; and

the cranial implant including an outer first surface, an inner second surface, and a peripheral edge extending between the outer first surface and the inner second surface, the cranial implant further including a cavity formed in the cranial implant, the cavity being shaped and dimensioned to receive a functional neurosurgical implant;

the cranial implant comprises a base cranial implant member and a cover cranial implant member, the base cranial implant member including an outer convex first surface, an inner second surface, and a peripheral edge extending between the outer convex first surface and the inner second surface, the base cranial implant member including a recess formed in the outer convex first surface thereof, the recess having side walls and a bottom, the recess being shaped and dimensioned to receive the functional neurosurgical implant; and the cover cranial implant member fits over the recess along the outer convex first surface of the base cranial implant member and is shaped and dimensioned for selective placement over the recess to define the cavity in which the functional neurosurgical implant may be positioned, the cover cranial implant member including an outer convex first surface, an inner second surface, and a peripheral edge shaped and dimensioned for engagement with the outer convex first surface of the base member along an entirety of a periphery of the recess of the base member such that the outer first surface of the cranial implant consists essentially of the outer convex first surface of the cover cranial implant member and that portion of the outer convex first surface of the base cranial implant member not covered by the cover cranial implant member, wherein the inner second surface of the cover cranial implant member and the outer first surface of the base cranial implant member along the center recess define the cavity configured to conform to requirements of the functional neurosurgical implant, and that portion of the outer convex first surface of the base cranial implant member not covered by the cover cranial implant member extends to the peripheral edge of the base cranial implant member exhibiting a shape conforming to the resected portion of the skull; and

a functional neurosurgical implant positioned in the cavity.

2 . The cranial device according to claim 1 , wherein the cranial implant is made of clear polymethyl methacrylate (PMMA).

3 . The cranial device according to claim 2 , wherein the cranial implant allows for wireless optical links between the functional neurosurgical implant and remote devices or for power transmission and/or receipt between the functional neurosurgical implant and devices outside of the cranial implant.

4 . The cranial device according to claim 2 , wherein the cranial implant allows for radio-frequency (RF) transmission through the cranial implant.

5 . The cranial device according to claim 1 , wherein the cranial implant is a custom cranial implant.

6 . A cranial device, comprising:

a cranial implant shaped and dimensioned for placement at least partially within a resected portion of a patient's skull during performance of a cranioplasty, the cranial implant allowing for transmission of ultrasound waves therethrough;

the cranial implant including an outer first surface, an inner second surface, and a peripheral edge extending between the outer first surface and the inner second surface, the cranial implant further including a cavity formed in the cranial implant, the cavity being shaped and dimensioned to receive a functional neurosurgical implant providing for ultrasound functionality; and

the cranial implant comprises a base cranial implant member and a cover cranial implant member, the base cranial implant member including an outer convex first surface, an inner second surface, and a peripheral edge extending between the outer convex first surface and the inner second surface, the base cranial implant member including a recess formed in the outer convex first surface thereof, the recess having side walls and a bottom, the recess being shaped and dimensioned to receive the functional neurosurgical implant; and the cover cranial implant member fits over the recess along the outer convex first surface of the base cranial implant member and is shaped and dimensioned for selective placement over the recess to define the cavity in which the functional neurosurgical implant may be positioned, the cover cranial implant member including an outer convex first surface, an inner second surface, and an entirety of a peripheral edge shaped and dimensioned for engagement with the outer convex first surface of the base member along a periphery of the recess of the base member such that the outer first surface of the cranial implant consists essentially of the outer convex first surface of the cover cranial implant member and that portion of the outer convex first surface of the base cranial implant member not covered by the cover cranial implant member, wherein the inner second surface of the cover cranial implant member and the outer first surface of the base cranial implant member along the center recess define the cavity configured to conform to requirements of the functional neurosurgical implant, and that portion of the outer convex first surface of the base cranial implant member not covered by the cover cranial implant member extends to the peripheral edge of the base cranial implant member exhibiting a shape conforming to the resected portion of the skull; and

a functional neurosurgical implant with ultrasound functionality positioned in the cavity.

7 . The cranial device according to claim 6 , wherein the cranial implant is a custom cranial implant.

8 . The cranial device according to claim 6 , wherein the cranial implant is made of clear polymethyl methacrylate (PMMA).

9 . The cranial device according to claim 6 , wherein the cover cranial implant member is removably securable to the base cranial implant member.

10 . A cranial device, comprising:

a radiolucent cranial implant shaped and dimensioned for placement at least partially within a resected portion of a patient's skull;

the cranial implant including an outer first surface, an inner second surface, and a peripheral edge extending between the outer first surface and the inner second surface, the cranial implant further including a cavity formed in the cranial implant, the cavity being shaped and dimensioned to receive a functional neurosurgical implant; and

the cranial implant comprises a base cranial implant member and a cover cranial implant member, the base cranial implant member including an outer convex first surface, an inner second surface, and a peripheral edge extending between the outer convex first surface and the inner second surface, the base cranial implant member including a recess formed in the outer convex first surface thereof, the recess having side walls and a bottom, the recess being shaped and dimensioned to receive the functional neurosurgical implant; and the cover cranial implant member fits over the recess along the outer convex first surface of the base cranial implant member and is shaped and dimensioned for selective placement over the recess to define the cavity in which the functional neurosurgical implant may be positioned, the cover cranial implant member including an outer convex first surface, an inner second surface, and an entirety of a peripheral edge shaped and dimensioned for engagement with the outer convex first surface of the base member along a periphery of the recess of the base member, such that the outer first surface of the cranial implant consists essentially of the outer convex first surface of the cover cranial implant member and that portion of the outer convex first surface of the base cranial implant member not covered by the cover cranial implant member, wherein the inner second surface of the cover cranial implant member and the outer first surface of the base cranial implant member along the center recess define the cavity configured to conform to requirements of the functional neurosurgical implant, and that portion of the outer convex first surface of the base cranial implant member not covered by the cover cranial implant member extends to the peripheral edge of the base cranial implant member exhibiting a shape conforming to the resected portion of the skull; and

a functional neurosurgical implant with radio-frequency (RF) functionality positioned in the cavity.

11 . The cranial device according to claim 10 , wherein the cranial implant is a custom cranial implant.

12 . The cranial device according to claim 10 , wherein the cranial implant is made of clear polymethyl methacrylate (PMMA).

Assignments (2)
CHANGE OF NAME Recorded Jun 11, 2025
From: LONGEVITI NEURO SOLUTIONS LLC
To: LONGEVITI NEURO SOLUTIONS, INC.
Reel/Frame 071383/0020 →
PATENT SECURITY AGREEMENT Recorded May 12, 2025
From: LONGEVITI NEURO SOLUTIONS, INC.
To: SCOF BLOCKER AIV, L.P.
Reel/Frame 071280/0062 →
Continuity (4)
Continuation 17127049 · Dec 18, 2020
Continuation 15669268 · Aug 4, 2017
Provisional Application 62381242 · Aug 30, 2016
Related Publication 20210298905A1 · Sep 30, 2021
References Cited (179)
US 4206762A · Cosman · 1980 [cited by applicant]
US 4281666A · Cosman · 1981 [cited by applicant]
US 4436684A · White · 1984 [cited by applicant]
US 4660568A · Cosman · 1987 [cited by applicant]
US 4805634A · Ullrich et al. · 1989 [cited by applicant]
US 5218975A · Prostkoff · 1993 [cited by applicant]
US 5503164A · Friedman · 1996 [cited by applicant]
US 5741215A · D'Urso · 1998 [cited by applicant]
US 6006124A · Fischell et al. · 1999 [cited by applicant]
US 6016449A · Fischell et al. · 2000 [cited by applicant]
US 6061593A · Fischell et al. · 2000 [cited by applicant]
US 6176879B1 · Reischl et al. · 2001 [cited by applicant]
US 6248126B1 · Lesser et al. · 2001 [cited by applicant]
US 6354299B1 · Fischell et al. · 2002 [cited by applicant]
US 6366813B1 · DiLorenzo · 2002 [cited by applicant]
US 6427086B1 · Fischell et al. · 2002 [cited by applicant]
US 6485464B1 · Christensen et al. · 2002 [cited by applicant]
US 6560486B1 · Osorio et al. · 2003 [cited by applicant]
US 6618623B1 · Pless · 2003 [cited by applicant]
US 6726678B1 · Nelson et al. · 2004 [cited by applicant]
US 6819956B2 · DiLorenzo · 2004 [cited by applicant]
US 6882881B1 · Lesser et al. · 2005 [cited by applicant]
US 6931284B2 · Engmark et al. · 2005 [cited by applicant]
US 6932842B1 · Itschko et al. · 2005 [cited by applicant]
US 7050877B2 · Iseki et al. · 2006 [cited by applicant]
US 7113841B2 · Abe et al. · 2006 [cited by applicant]
US 7158833B2 · Pless et al. · 2007 [cited by applicant]
US 7209787B2 · DiLorenzo · 2007 [cited by applicant]
US 7212864B2 · Wahlstrand et al. · 2007 [cited by applicant]
US 7231254B2 · DiLorenzo · 2007 [cited by applicant]
US 7242982B2 · Singhal et al. · 2007 [cited by applicant]
US 7242984B2 · DiLorenzo · 2007 [cited by applicant]
US 7263401B2 · Scott et al. · 2007 [cited by applicant]
US 7277758B2 · DiLorenzo · 2007 [cited by applicant]
US 7324851B1 · DiLorenzo · 2008 [cited by applicant]
US 7346391B1 · Osorio et al. · 2008 [cited by applicant]
US 7346397B2 · Money et al. · 2008 [cited by applicant]
US 7392089B2 · Wahlstrand et al. · 2008 [cited by applicant]
US 7529586B2 · Wahlstrand et al. · 2009 [cited by applicant]
US 7565199B2 · Sheffield et al. · 2009 [cited by applicant]
US 7596399B2 · Singhal et al. · 2009 [cited by applicant]
US 7596408B2 · Singhal et al. · 2009 [cited by applicant]
US 7647097B2 · Flaherty et al. · 2010 [cited by applicant]
US 7657316B2 · Jaax et al. · 2010 [cited by applicant]
US 7684866B2 · Fowler et al. · 2010 [cited by applicant]
US 7747305B2 · Dean et al. · 2010 [cited by applicant]
US 7747318B2 · John et al. · 2010 [cited by applicant]
US 7844345B2 · Boling et al. · 2010 [cited by applicant]
US 7848817B2 · Janzig et al. · 2010 [cited by applicant]
US 7887501B2 · Riordan et al. · 2011 [cited by applicant]
US 7894905B2 · Pless et al. · 2011 [cited by applicant]
US 7918887B2 · Roche · 2011 [cited by applicant]
US 7935858B2 · Praetzal · 2011 [cited by applicant]
US 8086336B2 · Christensen · 2011 [cited by applicant]
US 8116875B2 · Osypka et al. · 2012 [cited by applicant]
US 8182540B2 · Lin et al. · 2012 [cited by applicant]
US 8202090B2 · Shachar · 2012 [cited by applicant]
US 8235903B2 · Abraham · 2012 [cited by applicant]
US 8306607B1 · Levi et al. · 2012 [cited by applicant]
US 8397732B2 · Singhal et al. · 2013 [cited by applicant]
US 8454701B2 · Devauchelle et al. · 2013 [cited by applicant]
US 8457744B2 · Janzig et al. · 2013 [cited by applicant]
US 8591562B2 · D'Ambrosio et al. · 2013 [cited by applicant]
US 8706285B2 · Narainasamy et al. · 2014 [cited by applicant]
US 8761889B2 · Wingeier et al. · 2014 [cited by applicant]
US 8781557B2 · Pean et al. · 2014 [cited by applicant]
US 8938290B2 · Wingeier et al. · 2015 [cited by applicant]
US D723162S · Brogan et al. · 2015 [cited by applicant]
US 8956418B2 · Wasielewski et al. · 2015 [cited by applicant]
US 8965513B2 · Wingeier et al. · 2015 [cited by applicant]
US 9014810B2 · Sauter-Starace et al. · 2015 [cited by applicant]
US 9044195B2 · Manwaring · 2015 [cited by examiner]
US 9084901B2 · Wahlstrand · 2015 [cited by applicant]
US 9101341B2 · Fitzgerald et al. · 2015 [cited by applicant]
US 9149564B2 · Jin et al. · 2015 [cited by applicant]
US 9162072B2 · Singhal et al. · 2015 [cited by applicant]
US 9167976B2 · Wingeier et al. · 2015 [cited by applicant]
US 9167977B2 · Wingeier et al. · 2015 [cited by applicant]
US 9167978B2 · Wingeier et al. · 2015 [cited by applicant]
US 9179850B2 · Wingeier et al. · 2015 [cited by applicant]
US 9216084B2 · Gordon et al. · 2015 [cited by applicant]
US 9289143B2 · Wingeier et al. · 2016 [cited by applicant]
US 9375564B2 · Wingeier et al. · 2016 [cited by applicant]
US 9387320B2 · Wingeier et al. · 2016 [cited by applicant]
US 9393432B2 · Wahlstrand et al. · 2016 [cited by applicant]
US 9421363B2 · Krahl et al. · 2016 [cited by applicant]
US 9421371B2 · Pless et al. · 2016 [cited by applicant]
US 9440064B2 · Wingeier et al. · 2016 [cited by applicant]
US 9462958B2 · Osorio et al. · 2016 [cited by applicant]
US 9474611B2 · Restrepo et al. · 2016 [cited by applicant]
US 9522081B2 · D'Ambrosio et al. · 2016 [cited by applicant]
US 9573322B2 · Wasielewski · 2017 [cited by applicant]
US 9592124B2 · Joganic · 2017 [cited by applicant]
US 9592377B2 · Greenberg et al. · 2017 [cited by applicant]
US 9993337B1 · Brogan · 2018 [cited by examiner]
US 10588710B2 · Van Venrooij et al. · 2020 [cited by applicant]
US 20020002390A1 · Fischell et al. · 2002 [cited by applicant]
US 20020169485A1 · Pless et al. · 2002 [cited by applicant]
US 20030125786A1 · Gliner et al. · 2003 [cited by applicant]
US 20040034368A1 · Pless · 2004 [cited by examiner]
US 20040172090A1 · Janzig et al. · 2004 [cited by applicant]
US 20040176816A1 · Singhal et al. · 2004 [cited by applicant]
US 20040176818A1 · Wahlstrand et al. · 2004 [cited by applicant]
US 20040267234A1 · Heart et al. · 2004 [cited by applicant]
US 20050003268A1 · Scott et al. · 2005 [cited by applicant]
US 20050004620A1 · Singhal et al. · 2005 [cited by applicant]
US 20050004637A1 · Singhal et al. · 2005 [cited by applicant]
US 20050043835A1 · Christensen · 2005 [cited by applicant]
US 20050203366A1 · Donoghue et al. · 2005 [cited by applicant]
US 20050245984A1 · Singhal et al. · 2005 [cited by applicant]
US 20070129652A1 · Nita · 2007 [cited by examiner]
US 20070179558A1 · Gliner et al. · 2007 [cited by applicant]
US 20070225773A1 · Shen et al. · 2007 [cited by applicant]
US 20090112278A1 · Wingeier et al. · 2009 [cited by applicant]
US 20090281623A1 · Kast et al. · 2009 [cited by applicant]
US 20100145162A1 · Devauchelle · 2010 [cited by examiner]
US 20100292963A1 · Schroeder · 2010 [cited by applicant]
US 20110066072A1 · Kawoos et al. · 2011 [cited by applicant]
US 20110213382A1 · Decre et al. · 2011 [cited by applicant]
US 20120063655A1 · Dean et al. · 2012 [cited by applicant]
US 20120259428A1 · Brogan et al. · 2012 [cited by applicant]
US 20130204316A1 · Carpentier et al. · 2013 [cited by applicant]
US 20130247644A1 · Swoboda et al. · 2013 [cited by applicant]
US 20130282011A1 · Brogan et al. · 2013 [cited by applicant]
US 20140249454A1 · Carpentier · 2014 [cited by applicant]
US 20140309744A1 · Batty et al. · 2014 [cited by applicant]
US 20140330123A1 · Manwaring · 2014 [cited by examiner]
US 20140343350A1 · Martinson et al. · 2014 [cited by applicant]
US 20140350635A1 · Strother et al. · 2014 [cited by applicant]
US 20140378783A1 · Ledet et al. · 2014 [cited by applicant]
US 20150038948A1 · Ludvig et al. · 2015 [cited by applicant]
US 20150051455A1 · Wasielewski et al. · 2015 [cited by applicant]
US 20150105858A1 · Papay et al. · 2015 [cited by applicant]
US 20150157862A1 · Greenberg et al. · 2015 [cited by applicant]
US 20150231594A1 · Aguilar-Mendoza et al. · 2015 [cited by applicant]
US 20150289980A1 · Hirata · 2015 [cited by examiner]
US 20150328004A1 · Mafhouz · 2015 [cited by applicant]
US 20150351915A1 · DeFelice et al. · 2015 [cited by applicant]
US 20160007874A1 · Ma et al. · 2016 [cited by applicant]
US 20160045723A1 · Bornzin et al. · 2016 [cited by applicant]
US 20160083573A1 · Berdin et al. · 2016 [cited by applicant]
US 20160184100A1 · Jorganic · 2016 [cited by applicant]
US 20160185046A1 · Littlefield · 2016 [cited by applicant]
US 20160193048A1 · Prada · 2016 [cited by examiner]
US 20160263277A1 · Kim et al. · 2016 [cited by applicant]
US 20160296312A1 · Kuhn et al. · 2016 [cited by applicant]
US 20160346091A1 · Bin Abdul Rahman et al. · 2016 [cited by applicant]
US 20170027629A1 · Ackerman · 2017 [cited by examiner]
US 20170049351A1 · Esteller · 2017 [cited by applicant]
US 20170049398A1 · Hirata et al. · 2017 [cited by applicant]
US 20170156596A1 · Aguilar-Mendoza et al. · 2017 [cited by applicant]
US 20170368330A1 · Silay et al. · 2017 [cited by applicant]
US 20180185674A1 · Bauer et al. · 2018 [cited by applicant]
US 20190030374A1 · Carpentier · 2019 [cited by examiner]
US 20200030099A1 · Sampath et al. · 2020 [cited by applicant]
CN 103598883A · 2014 [cited by applicant]
JP 2008194426A · 2008 [cited by applicant]
KR 1020120088928A · 2012 [cited by applicant]
WO 2004093725A2 · 2004 [cited by applicant]
WO 2011036148A1 · 2011 [cited by applicant]
WO 2012047759A1 · 2012 [cited by applicant]
WO WO2012063377A1 · 2012 [cited by examiner]
WO 2012147114A1 · 2012 [cited by applicant]
WO 2015081025A1 · 2015 [cited by applicant]
WO 2015081027A1 · 2015 [cited by applicant]
WO 2015081140A1 · 2015 [cited by applicant]
WO 2015081177A1 · 2015 [cited by applicant]
WO 2015081225A1 · 2015 [cited by applicant]
WO 2015081232A1 · 2015 [cited by applicant]
WO 2015081247A1 · 2015 [cited by applicant]
WO 2015157554A1 · 2015 [cited by applicant]
WO 2016086049A1 · 2016 [cited by applicant]
WO 2016086054A1 · 2016 [cited by applicant]
WO 2017039762A1 · 2017 [cited by applicant]
WO 2017046300A1 · 2017 [cited by applicant]
WO 2018076075A1 · 2018 [cited by applicant]
Ledesma et al., Responsive Neurostimulation System (RNS) in setting of cranioplasty and history of multiple craniotomies, Interdisciplinary Neurosurgery, vol. 5, Sep. 2016, pp. 29-31. [cited by applicant]
Wei et al., Implant Site Infection and Bone Flap Osteomyelitis Associated with NeuroPace Responsive Neurotimulation System. World Neurosurg. Apr. 2016; 88:687.e1-6. [cited by applicant]
Sing, Mansher et al, “Countersinking” of reservoir in an irradiated patients can decrease tension on scalp closure, Surgical Neurology International, 2015; 6(Suppl 11): SS34-S. [cited by applicant]