Semiconductor device and display device including the semiconductor device
A semiconductor device including an oxide semiconductor film that includes a transistor with excellent electrical characteristics is provided. It is a semiconductor device including a transistor. The transistor includes a gate electrode, a first insulating film, an oxide semiconductor film, a source electrode, a drain electrode, and a second insulating film. The source electrode and the drain electrode each include a first conductive film, a second conductive film over and in contact with the first conductive film, and a third conductive film over and in contact with the second conductive film. The second conductive film contains copper, the first conductive film and the third conductive film include a material that inhibits diffusion of copper, and an end portion of the second conductive film includes a region containing copper and silicon.
1. A semiconductor device comprising:
a glass substrate;
a transistor having a channel-etched structure, the transistor comprising:
a gate electrode over and in contact with the glass substrate;
a first insulating film over and in contact with a side surface of the gate electrode;
a second insulating film over the first insulating film;
an oxide semiconductor film comprising a region which overlaps with the gate electrode with the first insulating film and the second insulating film therebetween;
a source electrode over and electrically connected to the oxide semiconductor film;
a drain electrode over and electrically connected to the oxide semiconductor film; and
a third insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,
a pixel electrode electrically connected to one of the source electrode and the drain electrode;
a first conductive film comprising copper and overlapping with a channel formation region of the oxide semiconductor film, the gate electrode, and the other of the source electrode and the drain electrode; and
a light-transmitting conductive film overlapping with the first conductive film, the channel formation region of the oxide semiconductor film, the gate electrode, and the other of the source electrode and the drain electrode,
wherein the source electrode and the drain electrode each comprise a second conductive film, a third conductive film over and in contact with the second conductive film, and a fourth conductive film over and in contact with the third conductive film,
wherein the third conductive film comprises a first element, the first element being copper,
wherein the second conductive film and the fourth conductive film comprise a same second element,
wherein the first element differs from the second element,
wherein the oxide semiconductor film comprises indium, gallium, and zinc,
wherein an end portion of the second conductive film comprises a region which protrudes farther than a region of an end portion of the third conductive film and an end portion of the fourth conductive film,
wherein the end portion of the second conductive film has a tapered shape, and
wherein a total area of a region of the gate electrode overlapping with the source electrode and a region of the gate electrode overlapping with the drain electrode is larger than an area of a region of the gate electrode overlapping with the channel formation region.
2. The semiconductor device according to claim 1 ,
wherein the oxide semiconductor film comprises a crystal part, and
wherein the crystal part has c-axis alignment.
3. The semiconductor device according to claim 1 ,
wherein the oxide semiconductor film comprises a crystal part, and
wherein the crystal part comprises a nanocrystal.
4. A semiconductor device comprising:
a glass substrate;
a transistor having a channel-etched structure, the transistor comprising:
a gate electrode over and in contact with the glass substrate;
a first insulating film over and in contact with a side surface of the gate electrode;
a second insulating film over the first insulating film;
an oxide semiconductor film comprising a region which overlaps with the gate electrode with the first insulating film and the second insulating film therebetween;
a source electrode over and electrically connected to the oxide semiconductor film;
a drain electrode over and electrically connected to the oxide semiconductor film; and
a third insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,
a pixel electrode electrically connected to one of the source electrode and the drain electrode;
a first conductive film comprising copper and overlapping with a channel formation region of the oxide semiconductor film, the gate electrode, and the other of the source electrode and the drain electrode; and
a light-transmitting conductive film overlapping with the first conductive film, the channel formation region of the oxide semiconductor film, the gate electrode, and the other of the source electrode and the drain electrode,
wherein the source electrode and the drain electrode each comprise a second conductive film, a third conductive film over and in contact with the second conductive film, and a fourth conductive film over and in contact with the third conductive film,
wherein the third conductive film comprises a first element, the first element being copper,
wherein the second conductive film and the fourth conductive film comprise a same second element,
wherein the first element differs from the second element,
wherein the oxide semiconductor film comprises indium, gallium, and zinc,
wherein an end portion of the second conductive film comprises a region which protrudes farther than a region of an end portion of the third conductive film and an end portion of the fourth conductive film,
wherein the end portion of the second conductive film has a tapered shape,
wherein a total area of a region of the gate electrode overlapping with the source electrode and a region of the gate electrode overlapping with the drain electrode is larger than an area of a region of the gate electrode overlapping with the channel formation region, and
wherein an end portion of the gate electrode extends beyond an end portion of the oxide semiconductor film.
5. A semiconductor device comprising:
a glass substrate;
a transistor having a channel-etched structure, the transistor comprising:
a gate electrode over and in contact with the glass substrate;
a first insulating film over and in contact with a side surface of the gate electrode;
a second insulating film over the first insulating film;
an oxide semiconductor film comprising a region which overlaps with the gate electrode with the first insulating film and the second insulating film therebetween;
a source electrode over and electrically connected to the oxide semiconductor film;
a drain electrode over and electrically connected to the oxide semiconductor film; and
a third insulating film over the oxide semiconductor film, the source electrode, and the drain electrode,
a pixel electrode electrically connected to one of the source electrode and the drain electrode;
a first conductive film comprising copper and overlapping with a channel formation region of the oxide semiconductor film, the gate electrode, and the other of the source electrode and the drain electrode; and
a light-transmitting conductive film overlapping with the first conductive film, the channel formation region of the oxide semiconductor film, the gate electrode, and the other of the source electrode and the drain electrode,
wherein the source electrode and the drain electrode each comprise a second conductive film, a third conductive film over and in contact with the second conductive film, and a fourth conductive film over and in contact with the third conductive film,
wherein the third conductive film comprises a first element, the first element being copper,
wherein the second conductive film and the fourth conductive film comprise a same second element,
wherein the first element differs from the second element,
wherein the oxide semiconductor film comprises indium, gallium, and zinc,
wherein an end portion of the second conductive film comprises a region which protrudes farther than a region of an end portion of the third conductive film and an end portion of the fourth conductive film,
wherein the end portion of the second conductive film has a tapered shape,
wherein a total area of a region of the gate electrode overlapping with the source electrode and a region of the gate electrode overlapping with the drain electrode is larger than an area of a region of the gate electrode overlapping with the channel formation region, and
wherein the second conductive film and the fourth conductive film are thinner than the third conductive film.