High-fluence optic
An irradiation method includes irradiating an environment with light using one or more one ceiling-mounted light sources, where each ceiling-mounted light source has an optical axis oriented vertically downward, and wherein each ceiling-mounted light source emits a light distribution having more angle-integrated intensity in a higher angular range relative to the optical axis of the ceiling-mounted light source than in a lower angular range relative to the optical axis of the ceiling-mounted light source. A ceiling-mounted light source may include a support structure, one or more light emitters disposed on a surface of the support structure, and a reflector with a funnel-shaped reflective surface facing the support structure and expanding with increasing distance from the support structure along the optical axis. The light emitters may be ultraviolet (UV) light emitters whereby the light source is a UV ceiling-mounted light source.
1. An ultraviolet (UV) irradiation system comprising:
a light source having an optical axis, the light source including:
a support structure configured to be mounted on a ceiling with the optical axis of the light source oriented vertically downward;
one or more UV light emitting diodes (LEDs) disposed on a surface of the support structure and configured to emit UV light when electrically energized; and
a reflector secured to the support structure and arranged to form the UV light emitted by the one or more UV LEDs into a light distribution having more angle-integrated intensity in the angular range θ Tr to 90° relative to the optical axis than in the angular range 0° to θ Tr relative to the optical axis, where θ Tr is at least 55°;
wherein the reflector comprises a funnel-shaped reflective surface facing the support structure and having an apex positioned on the optical axis of the light source, the funnel-shaped reflective surface expanding with increasing distance from the support structure along the optical axis.
2. The UV irradiation system of claim 1 wherein θ Tr is at least 65°.
3. The UV irradiation system of claim 1 wherein the light distribution has at least 3 times more angle-integrated intensity in the angular range θ Tr to 90° relative to the optical axis than in the angular range 0° to θ Tr relative to the optical axis.
4. The UV irradiation system of claim 1 wherein the funnel-shaped reflective surface comprises a conoidal reflective surface.
5. The UV irradiation system of claim 4 wherein the conoidal reflective surface is described by a revolution of a fusion of two or more different conic sections about the optical axis.
6. The UV irradiation system of claim 1 wherein the funnel-shaped reflective surface has N facets and has N-fold rotational symmetry about the optical axis.
7. The UV irradiation system of claim 1 wherein the funnel-shaped reflective surface has a curvature comprising a curved section or a fusion of two or more straight or curved sections.
8. The UV irradiation system of claim 1 wherein the light source further comprises one or more arms attaching the reflector comprising the funnel-shaped reflective surface to the support structure.
9. The UV irradiation system of claim 8 wherein the one or more arms includes a least three curved arms connecting with the reflector on a surface other than the funnel-shaped reflective surface.
10. The UV irradiation system of claim 1 comprising a plurality of said light sources mounted on the ceiling.
11. The UV irradiation system of claim 1 wherein:
the light source emits a light distribution I(θ,ϕ) satisfying the inequality:
∫ 0 2π dø∫ θ Tr 90 I (θ,ϕ)sin θ dθ>W H ·(∫ 0 2π dø∫ 0 θ Tr I (θ,ϕ)sin θ d θ)
where angle θ is measured respective to the optical axis and θ=0° corresponds to the optical axis, angle ϕ is the orthogonal angle in spherical coordinates, and W H is a weight parameter; and
wherein W H is greater than or equal to 1 and θ Tr is greater than or equal to 55°.
12. The UV irradiation system of claim 11 wherein θ Tr is at least 65°.
13. The UV irradiation system of claim 11 wherein W H is greater than or equal to 3.
14. The UV irradiation system of claim 1 , further comprising:
at least three arms;
wherein the funnel-shaped reflective surface is connected with the support structure and the at least three arms.
15. An ultraviolet (UV) irradiation system comprising:
a light source having an optical axis, the light source including:
a support structure configured to be mounted on a ceiling with the optical axis of the light source oriented vertically downward;
one or more UV light emitters disposed on a surface of the support structure and configured to emit light when electrically energized; and
a reflector having a funnel-shaped reflective surface facing the support structure and having an apex positioned on the optical axis of the light source, the reflector oriented with the funnel-shaped reflective surface expanding with increasing distance from the support structure along the optical axis, wherein the funnel-shaped reflective surface has a shape described by a revolution of a fusion of two or more different straight or curved sections about the optical axis.
16. The UV irradiation system of claim 15 wherein the fusion of two or more different straight or curved sections about the optical axis includes a fusion of (i) a straight section whose revolution about the optical axis forms a cone, and (ii) a parabolic section whose revolution about the optical axis forms a paraboloid.
17. The UV irradiation system of claim 15 wherein the fusion of two or more different straight or curved sections includes a fusion of (i) a first parabolic section whose revolution about the optical axis forms a first paraboloid, and (ii) a second parabolic section whose revolution about the optical axis forms a second paraboloid.
18. The UV irradiation system of claim 15 further comprising: at least three arms attaching the reflector to the support structure.
19. The UV irradiation system of claim 18 wherein the arms are curved and attach to a side of the reflector opposite from the funnel-shaped reflective surface.
20. The UV irradiation system of claim 15 wherein the funnel-shaped reflective surface is arranged to form the UV light emitted by the one or more UV light emitters into a light distribution having more angle-integrated intensity in the angular range θ Tr to 90° relative to the optical axis than in the angular range 0° to θ Tr relative to the optical axis, where θ Tr is at least 55°.
21. An ultraviolet (UV) irradiation system comprising:
a light source having an optical axis, the light source including:
a support structure configured to be mounted on a ceiling with the optical axis of the light source oriented vertically downward;
two or more UV light emitters disposed on a surface of the support structure and configured to emit UV light when electrically energized; and
a reflector secured to the support structure and arranged to form the UV light emitted by the one or more UV light emitters into a light distribution having more angle-integrated intensity in the angular range θ Tr to 90° relative to the optical axis than in the angular range 0° to θ Tr relative to the optical axis, where θ Tr is at least 55°;
wherein the reflector comprises a funnel-shaped reflective surface facing the support structure and having an apex positioned on the optical axis of the light source and attached to the support structure with the two or more UV light emitters arranged around the apex, the funnel-shaped reflective surface expanding with increasing distance from the support structure along the optical axis.