IP Library Granted Patent US 12,028,060
Granted Patent B2
US 12,028,060 · App. 17/351,128 · Granted Jul 2, 2024

Switch capacitance cancellation circuit

Inventors: David Kovac (Arlington Heights, IL); Joseph Golat (Crystal Lake, IL)
Assignee: Murata Manufacturing Co., Ltd.
H03K17/6872H01L23/66H03K19/00384H01L2223/6605H01L2223/6672
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Quick Facts
Patent No.
US 12,028,060
App. No.
17/351,128
Granted
Jul 2, 2024
Kind
B2
Abstract

Methods and devices used to cancel non-linear capacitances in high power radio frequency (RF) switches manufactured in bulk complementary metal-oxide-semiconductor (CMOS) processes are disclosed. The methods and devices are also applicable to stacked switches and RF switches fabricated in silicon-on-insulator (SOI) technology.

Claims (54)

1. A method for controlling a capacitance of an N-channel field effect transistor (NFET) when in OFF state over a voltage range, the method comprising:

comparing a nonlinear NFET drain-source capacitance-voltage (C/V) response of the NFET with a voltage variable capacitor C/V response of a set of voltage variable capacitors;

from the set of voltage variable capacitors, selecting a voltage variable capacitor such that a combination of the selected voltage variable capacitors C/V response with the NFET drain-source C/V response results in a combination C/V response including a substantially constant capacitance region along a voltage range; and

coupling the selected voltage variable capacitor across drain and source terminals of the NFET by connecting the first terminal to a drain terminal of the NFET and the second terminal to a source terminal of the NFET,

wherein

a body of the switching NFET is configured to be coupled to a first bias voltage through a first resistor, to provide radio frequency (RF) floating of the body;

an N-well of the switching NFET is configured to be coupled to a second bias voltage through a second resistor, to provide RF floating the N-well, and

a substrate of the switching NFET is configured to be coupled to a reference voltage or ground.

2. The method of claim 1 , further comprising:

operating the NFET in the voltage range.

3. The method of claim 1 , wherein

the voltage range along which the capacitance of the combination C/V response is substantially constant is a function of a size of the voltage variable capacitor to be selected.

4. The method of claim 1 , wherein the voltage range extends from a first voltage to a second voltage, and wherein coupling the selected voltage variable capacitor across the NFET further comprises

biasing the selected variable voltage capacitor with a bias voltage and adjusting the bias voltage based on desired values for the first voltage and the second voltage.

5. The method of claim 4 , wherein the coupling of the selected voltage variable capacitor across drain and source terminals of the NFET further comprises coupling the voltage variable capacitor in series with a first capacitor and a second capacitor, the voltage variable capacitor being between the first capacitor and the second capacitor.

6. The method of claim 5 , wherein the biasing the selected voltage variable capacitor with the bias voltage comprises biasing one of a first end or a second end of the selected voltage variable capacitor with a first biasing voltage (V 1 ) and biasing the other of the first end or second end of the selected voltage variable capacitor with a second biasing voltage (V 2 ), thus biasing the selected voltage variable capacitor independently of the NFET.

7. The method of claim 1 , wherein the voltage variable capacitor is a PMOS device capacitor.

8. The method of claim 1 , wherein the NFET comprises a stacked arrangement of NFETs and wherein the series arrangement of the selected voltage variable capacitor comprises plural series arrangements of selected voltage variable capacitors and additional capacitors, each series arrangement coupled across drain and source of a corresponding NFET of the stacked arrangement by connecting a first terminal of said each series arrangement to a drain terminal of the corresponding NFET and a second terminal of said each series arrangement to a source terminal of the corresponding NFET.

9. The method of claim 1 , wherein the NFET comprises a stacked arrangement of NFETs and wherein the selected voltage variable capacitor is coupled across a drain of a topmost NFET of the stacked arrangement and a source of a bottommost NFET of the stacked arrangement by connecting a first terminal of the voltage variable capacitor to a drain terminal of the topmost NFET and a second terminal of the voltage variable capacitor to a source terminal of the bottommost NFET.

10. A bulk-CMOS process for manufacturing a N-channel field effect transistor (NFET), the process comprising:

manufacturing an NFET and

controlling linearity of the NFET according to the method of claim 1 .

11. A switching arrangement, comprising:

a switching N-channel field effect transistor (NFET), the switching NFET having a nonlinear NFET drain-source capacitance-voltage (C/V) response; and

a series arrangement of a voltage variable capacitor and a first DC blocking capacitor with a first terminal coupled to a drain terminal of the switching NFET and a second terminal connected to a source terminal of the switching NFET, the voltage variable capacitor having a voltage variable capacitor C/V response,

wherein

a combination C/V response of the switching NFET and the voltage variable capacitor includes a substantially constant capacitance region across a selected voltage range, and

a body of the switching NFET is configured to be coupled to a first bias voltage through a first resistor, to provide radio frequency (RF) floating of the body;

an N-well of the switching NFET is configured to be coupled to a second bias voltage through a second resistor, to provide RF floating the N-well, and

a substrate of the switching NFET is configured to be coupled to a reference voltage or ground.

12. The switching arrangement of claim 11 , fabricated in a bulk complementary metal-oxide-semiconductor (CMOS) process.

13. The switching arrangement of claim 11 , fabricated in a silicon-on-insulator (SOI) process.

14. The switching arrangement of claim 11 , further comprising a voltage variable capacitor biasing arrangement to adjust location of the selected voltage range according to a biasing voltage of the voltage variable capacitor biasing arrangement.

15. The switching arrangement of claim 14 , wherein the voltage variable capacitor is coupled to a first bias voltage through a first bias resistor.

16. The switching arrangement of claim 15 , wherein one of the first terminal or the second terminal is coupled

to the drain terminal of the NFET through a second capacitor, the voltage variable capacitor being disposed between the first capacitor and the second capacitor, and

to a second bias voltage through a second bias resistor, the first bias voltage and the second bias voltage being coupled to separate ends of the voltage variable capacitor.

17. The switching arrangement of claim 13 , wherein a substrate of the switching NFET is a grounded substrate.

18. The switching arrangement of claim 11 , wherein the switching NFET comprises two or more NFETs configured in a stack.

19. A switching arrangement comprising:

a plurality of switching N-channel field effect transistors (NFETs) arranged in a stacked configuration, each switching NFET having a nonlinear NFET drain-source capacitance-voltage (C/V) response;

a series arrangement of a voltage variable capacitor and a first capacitor with a first terminal connected to a drain terminal of a first switching NFET of the plurality of switching NFETs, and a second terminal connected to a source terminal of a second switching NFET of the plurality of switching NFETs, the voltage variable capacitor having a voltage variable capacitor C/V response, and

wherein

a combination of a C/V response existing across the drain terminal of the first switching NFET and the source terminal of the second NFET, with the voltage variable capacitor C/V response includes a substantially constant capacitance region across a selected voltage range;

a body of a switching NFET of the plurality of switching NFETs is configured to be coupled to a first bias voltage through a first resistor, to provide radio frequency (RF) floating of the body;

an N-well of the switching NFET of the plurality of switching NFETs is configured to be coupled to a second bias voltage through a second resistor, to provide RF floating the N-well, and

a substrate of the switching NFET of the plurality of switching NFETs is configured to be coupled to a reference voltage or ground.

20. The switching arrangement of claim 19 , further comprising a voltage variable capacitor biasing arrangement to adjust location of the selected voltage range according to a biasing voltage of the voltage variable capacitor biasing arrangement.

21. The switching arrangement of claim 20 , wherein the voltage variable capacitor is coupled

to a first bias voltage through a first bias resistor.

22. The switching arrangement of claim 21 , wherein one of the first terminal or the second terminal is coupled

to the drain terminal of the NFET through a second capacitor, the voltage variable capacitor being disposed between the first capacitor and the second capacitor, and

to a second bias voltage through a second bias resistor, the first bias voltage and the second bias voltage being coupled to separate ends of the voltage variable capacitor.

23. The switching arrangement of claim 19 , wherein the switching NFET comprises two or more NFETs configured in a stack.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 13, 2024
From: PSEMI CORPORATION
To: MURATA MANUFACTURING CO., LTD.
Reel/Frame 066753/0987 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 17, 2021
From: KOVAC, DAVID; GOLAT, JOSEPH
To: PSEMI CORPORATION
Reel/Frame 057206/0382 →
Continuity (1)
Related Publication 20220407512A1 · Dec 22, 2022
Cited By (1)
US 12,519,469