Semiconductor device having a redistribution layer
A semiconductor device and manufacturing method thereof. Various aspects of the disclosure may, for example, comprise forming a back end of line layer on a dummy substrate, completing at least a first portion of an assembly, and removing the dummy substrate.
1. A semiconductor device comprising:
a first redistribution layer comprising a first dielectric and a first conductive layer;
a semiconductor die mounted to and electrically connected to an upper side of the first redistribution layer, where the semiconductor die comprises a die bonding pad on a lower die side of the semiconductor die and over the upper side of the first redistribution layer, and where the die bonding pad electrically connects the semiconductor die to the first conductive layer of the first redistribution layer;
a lower encapsulant that covers a lower side of the first dielectric;
a conductive pillar on the first redistribution layer, where a lower end of the conductive pillar is electrically connected to the first conductive layer of the first redistribution layer, and the lower end of the conductive pillar is vertically lower than the die bonding pad;
an upper encapsulant that encapsulates the upper side of the first redistribution layer, the conductive pillar, and the semiconductor die, where the upper encapsulant comprises an upper encapsulant side facing away from the first redistribution layer and a lower encapsulant side facing toward the first redistribution layer;
a second conductive layer on the upper encapsulant side, where the second conductive layer is electrically connected to the first conductive layer of the first redistribution layer through the conductive pillar; and
a material underfilling directly vertically between the semiconductor die and the first redistribution layer,
wherein:
a first lateral side of the lower encapsulant is coplanar with a first lateral side of the upper encapsulant; and
a first lateral side of the first redistribution layer is coplanar with the first lateral side of the upper encapsulant.
2. The semiconductor device of claim 1 , comprising a plurality of metallic balls comprising solder and coupled to a lower side of the first redistribution layer.
3. The semiconductor device of claim 1 , wherein the material comprises the upper encapsulant.
4. The semiconductor device of claim 1 , wherein an uppermost end surface of the conductive pillar is coplanar with the upper encapsulant side.
5. The semiconductor device of claim 1 , wherein at least a portion of the first conductive layer is laterally surrounded by the first dielectric.
6. The semiconductor device of claim 1 , wherein the conductive pillar comprises a plating that is plated directly on the first conductive layer.
7. The semiconductor device of claim 1 , wherein a metal of the conductive pillar extends vertically upward from the first conductive layer, through a center of the conductive pillar, to a position that is at least as high as an upper side of the semiconductor die.
8. A semiconductor device comprising:
a first redistribution layer comprising a first dielectric and a first conductive layer;
a semiconductor die mounted to and electrically connected to an upper side of the first redistribution layer, where the semiconductor die comprises a pad on a lower side of the semiconductor die and electrically connected to the upper side of the first redistribution layer, and where the lower side of the semiconductor die faces the upper side of the first redistribution layer;
a lower encapsulant that covers a lower side of the first dielectric;
a metallic ball comprising solder and coupled to a lower side of the first redistribution layer, where the metallic ball is partially embedded within the lower encapsulant, such that a portion of the metallic ball extends downward lower than a lower side of the lower encapsulant;
a conductive pillar on the upper side of the first redistribution layer, where the conductive pillar is taller from the first redistribution layer than the semiconductor die;
an upper encapsulant that encapsulates the upper side of the first redistribution layer, the conductive pillar, and the semiconductor die, where the upper encapsulant comprises an upper encapsulant side facing away from the first redistribution layer and a lower encapsulant side facing toward the first redistribution layer; and
a second redistribution layer on the upper encapsulant side, where the second redistribution layer comprises a second conductive layer that is electrically connected to the first conductive layer of the first redistribution layer through the conductive pillar,
wherein:
a first lateral side of the lower encapsulant is coplanar with a first lateral side of the upper encapsulant; and
a first lateral side of the first redistribution layer is coplanar with the first lateral side of the upper encapsulant.
9. The semiconductor device of claim 8 , comprising an underfill material directly vertically between the semiconductor die and the first redistribution layer.
10. The semiconductor device of claim 8 , wherein greater than 50% of the metallic ball is laterally surrounded by the lower encapsulant.
11. The semiconductor device of claim 8 , wherein the metallic ball is positioned in an aperture of the lower encapsulant, and a maximum width of the aperture is at least as large as a maximum width of the metallic ball.
12. The semiconductor device of claim 8 , wherein the second redistribution layer comprises a second dielectric.
13. The semiconductor device of claim 9 , wherein the underfill material is different from the upper encapsulant.
14. The semiconductor device of claim 8 , wherein an uppermost end surface of the conductive pillar is coplanar with the upper encapsulant side.