Film bulk acoustic resonator fabrication method

1. A method of fabricating filters, comprising:

bonding a back surface of a piezoelectric plate to a surface of a substrate;

performing thickness measurements of a thickness of the piezoelectric plate at a plurality of positions on the piezoelectric plate;

removing excess material from a front surface of the piezoelectric plate in accordance with the thickness measurements to improve a thickness uniformity of the piezoelectric plate, such that a thickness at any point on the piezoelectric plate is essentially equal to a predetermined first thickness;

selectively thinning portions of the piezoelectric plate from the first thickness to a second thickness less than the first thickness;

after removing the excess material, forming a conductor pattern on the piezoelectric plate, the conductor pattern including a plurality of ladder filter circuits, each ladder filter circuit comprising at least one shunt resonator and at least one series resonator, each of the shunt and series resonators comprising an interdigital transducer (IDT); and

forming cavities in the substrate such that portions of the piezoelectric plate form a plurality of diaphragms spanning respective cavities,

wherein, after the cavities are formed, interleaved fingers of each IDT are on a respective one of the plurality of diaphragms, such that interleaved fingers of IDTs of the at least one shunt resonator are disposed on respective diaphragms having the first thickness, and interleaved fingers of IDTs of the at least one series resonator are disposed on respective diaphragms having the second thickness.

2. The method of claim 1 , wherein the front surface of the piezoelectric plate is attached to a sacrificial substrate during the bonding, the method further comprising:

removing the sacrificial substrate to expose the front surface of the piezoelectric plate after the bonding.

3. The method of claim 2 , further comprising:

polishing the front surface of the piezoelectric plate after removing the sacrificial substrate and before performing thickness measurements.

4. The method of claim 1 , wherein performing thickness measurements further comprises:

measuring a respective thickness at each of the plurality of positions using an optical interferometer and/or an optical reflectometer.

5. The method of claim 1 , wherein removing excess material is performed with a scanning ion mill.

6. The method of claim 1 , further comprising:

after removing the excess material and before forming the conductor pattern, post processing the piezoelectric plate to repair surface damage.

7. The method of claim 1 , wherein the piezoelectric plate and all of the IDTs are configured such that a respective radio frequency signal applied to each IDT excites a respective shear primary acoustic mode within the respective diaphragm.

8. The method of claim 1 wherein selectively thinning is performed with an ion mill.

9. The method of claim 1 , wherein selectively thinning is performed with a masked dry etching process.

10. The method of claim 7 , wherein the piezoelectric plate is one of lithium niobate and lithium tantalate.

11. The method of claim 1 , wherein the removing of the excess material further comprises:

interpolating the thickness measurements to generate a thickness map; and

removing excess material in accordance with the thickness map.