Gas laser apparatus, laser beam emitting method of gas laser apparatus, and electronic device manufacturing method
A gas laser apparatus includes a chamber; a window provided in the chamber; an optical path tube connected to the chamber; a gas supply port that supplies a purge gas into the optical path tube; an exhaust port that exhausts a gas in the optical path tube; and a control unit, the exhaust port including a main exhaust port provided in the optical path tube, and an auxiliary exhaust port provided in the optical path tube upstream of a flow of the gas in the optical path tube with respect to positions of the window and the main exhaust port, the control unit causing the gas to be exhausted through the main exhaust port before a laser beam is emitted from the chamber and causing the gas to be exhausted through the auxiliary exhaust port in at least a partial period when the laser beam is emitted.
1. A gas laser apparatus comprising:
a chamber filled with a laser gas;
a window provided in the chamber and allowing a laser beam to pass therethrough;
an optical path tube connected to the chamber to surround a position of the window in the chamber;
a gas supply port configured to supply a purge gas into the optical path tube;
an exhaust port configured to exhaust a gas in the optical path tube; and
a control unit,
the exhaust port including a main exhaust port provided in the optical path tube such that the gas flows on a surface of the window, and an auxiliary exhaust port provided in the optical path tube upstream of a flow of the gas in the optical path tube with respect to the position of the window and a position of the main exhaust port,
the control unit causing the gas to be exhausted through the main exhaust port before the laser beam is emitted from the chamber and causing the gas to be exhausted through the auxiliary exhaust port in at least a partial period when the laser beam is emitted from the chamber,
the control unit causes the gas to be exhausted through the auxiliary exhaust port when the exhaust of the gas through the main exhaust port is started and an oxygen concentration in the optical path tube reaches a predetermined first concentration or lower,
further comprising a casing that houses the chamber and the optical path tube and into which the gas from the exhaust port is released,
wherein the control unit causes the gas to be exhausted through the auxiliary exhaust port when an oxygen concentration in the casing reaches a predetermined second concentration or lower, and
the second concentration is the oxygen concentration in the casing when the oxygen concentration in the optical path tube is the predetermined first concentration or lower.
2. A gas laser apparatus comprising:
a chamber filled with a laser gas;
a window provided in the chamber and allowing a laser beam to pass therethrough;
an optical path tube connected to the chamber to surround a position of the window in the chamber;
a gas supply port configured to supply a purge gas into the optical path tube;
an exhaust port configured to exhaust a gas in the optical path tube; and
a control unit,
the exhaust port including a main exhaust port provided in the optical path tube such that the gas flows on a surface of the window, and an auxiliary exhaust port provided in the optical path tube upstream of a flow of the gas in the optical path tube with respect to the position of the window and a position of the main exhaust port,
the control unit causing the gas to be exhausted through the main exhaust port while supplying the purge gas before the laser beam is emitted from the chamber and causing the gas to be exhausted while supplying the purge gas only through the auxiliary exhaust port in at least a partial period when the laser beam is emitted from the chamber.
3. The gas laser apparatus according to claim 2 , wherein the main exhaust port is provided adjacent to the window.
4. The gas laser apparatus according to claim 2 , wherein the control unit stops the exhaust of the gas through the main exhaust port when the gas is exhausted through the auxiliary exhaust port.
5. The gas laser apparatus according to claim 2 , wherein the control unit causes the gas to be exhausted through the auxiliary exhaust port after a predetermined first period from start of the exhaust of the gas through the main exhaust port.
6. The gas laser apparatus according to claim 2 , wherein the control unit causes the laser beam to be emitted from the chamber after the exhaust of the gas through the auxiliary exhaust port is started.
7. The gas laser apparatus according to claim 6 , wherein the control unit causes the laser beam to be emitted from the chamber after a predetermined second period from start of the exhaust of the gas through the auxiliary exhaust port.
8. The gas laser apparatus according to claim 2 , wherein the position of the window in the chamber protrudes into the optical path tube with a gap from an inner wall of the optical path tube, and
the main exhaust port is provided in a position including a plane extending along the window and perpendicular to a traveling direction of the laser beam in the optical path tube, or a position closer to the chamber than the plane in the optical path tube.
9. The gas laser apparatus according to claim 2 , wherein an optical element that the laser beam enters is arranged upstream of the flow of the gas with respect to the auxiliary exhaust port.
10. The gas laser apparatus according to claim 2 , further comprising:
a main exhaust valve provided downstream of the main exhaust port, and
an auxiliary exhaust valve provided downstream of the auxiliary exhaust port.