IP Library Patent Application 17374509
Patent Application
App. No. 17/374,509

NONIONIC POLYETHER SURFACTANTS

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Patent No.
US None
App. No.
17/374,509
Abstract

Non-ionic polyether surfactants with improved resistance to hydrolysis are provided.

Claims (38)

1 . A compound represented by Formula (I):

an isomer, a hydrate, a solvate, or a tautomer thereof,

wherein:

R is a an optionally substituted C6-C70 alkyl or optionally substituted C6-C70 alkenyl;

w is an integer ranging from 0 to 20,

x is an integer ranging from 0 to 20,

y is an integer ranging from 0 to 20, and

z is an integer ranging from 0 to 20.

2 . The compound of claim 1 , wherein R is an unsubstituted C6-C50 alkyl or unsubstituted C6-C50 alkenyl.

3 . The compound of claim 1 , wherein R is an unsubstituted C10-C25 alkyl or unsubstituted C10-C25 alkenyl.

4 . The compound of claim 1 , wherein the sum of w, x, y, and z is 20.

5 . The compound of claim 1 , wherein the compound is represented by Formula (IA):

an isomer, a hydrate, a solvate, or a tautomer thereof.

6 . The compound of claim 1 , wherein R is n-decyl, n-undecyl, n-dodecyl, n-hexadecyl, or n-heptadecyl.

7 . The compound of claim 1 , wherein the compound is:

or an isomer, solvate, hydrate, or a tautomer thereof, wherein x+y+x=20.

8 . The compound of claim 1 , wherein the compound is:

or an isomer, solvate, hydrate, or a tautomer thereof, wherein x+y+x=20.

9 . A method of preparing of a compound of Formula (I):

an isomer, a hydrate, a solvate, or a tautomer thereof,

wherein:

R is a an optionally substituted C6-C70 alkyl or optionally substituted C6-C70 alkenyl;

w is an integer ranging from 0 to 20,

x is an integer ranging from 0 to 20,

y is an integer ranging from 0 to 20, and

z is an integer ranging from 1 to 20,

comprising the steps of:

(a) forming a trimethylsilyl protected derivative of compound of formula (II):

and

(b) contacting the trimethylsilyl derivative of compound of formula (II) with a suitable reducing agent and gallium tribromide, optionally in a suitable solvent.

10 . The method of claim 9 , wherein forming a trimethylsilyl derivative of compound of Formula (II) is done by contacting a compound of Formula (II) with a silylating agent in a suitable solvent.

11 . The method of claim 9 , wherein the silylating agent is hexamethyldisilazane (HMDS).

12 . The method of claim 9 , wherein the reducing agent is 1,1,3,3-tetramethyldisiloxane.

13 . The method of claim 9 , wherein step (b) is performed at a temperature ranging from about 25° C. to about 80° C.

14 . The method of claim 9 , wherein step (b) does not require a solvent.

15 . The method of claim 9 , further comprising contacting the product of step (b) with water.

16 . A non-ionic polyether surfactant prepared by the method of claim 9 .

17 . A surfactant composition comprising a compound of claim 1 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 29, 2023
From: GALL, ALEXANDER A.; BARAZNENOK, IVAN
To: CEPHEID
Reel/Frame 063141/0682 →