IP Library Patent Application 17387541
Patent Application
App. No. 17/387,541

MULTIPLE BEAM LASER TREATMENT DEVICE

Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US None
App. No.
17/387,541
Abstract

Embodiments of the invention include a treatment device and corresponding treatment method for laser wound healing, the device and method making use of the simultaneous action of multiple laser types and laser wavelengths which are applied at human tissue. The treatment device generally includes a laser system and a hand-piece which is coupled to the laser system. The hand-piece is designed so that one or multiple laser beams are applied at relatively small spot and at a relatively high power level, and are surrounded by a relatively large spot of another laser beam with a relatively low power level. In a preferred implementation, the hand-piece is adapted to facilitate the emission of first and second laser beams together with a third laser beam which is delivered at a different spatial profile in comparison to the first and second laser beams.

Claims (69)

1 - 35 . (canceled)

36 . A laser system comprising:

a main body,

a central waveguide,

a one or more peripheral waveguides, and

a laser beam generating system;

wherein the main body comprises the central waveguide and the one or more peripheral waveguides;

wherein the one or more peripheral waveguides are positioned to at least partially encircle the central waveguide.

37 . The laser system of claim 36 ,

wherein the one or more peripheral waveguides are positioned in the main body between an outer edge of the central waveguide and an outer surface of the main body.

38 . The laser system of claim 36 ,

wherein the central waveguide is configured to apply one or multiple laser beams.

39 . The laser system of claim 36 ,

wherein the central waveguide is configured to apply a central laser;

wherein the one or more peripheral waveguides are configured to apply a peripheral laser; and

wherein the peripheral laser is configured to be is delivered at a different spatial profile in comparison to the central laser.

40 . The laser system of claim 36 ,

wherein the central waveguide is configured to apply a central laser;

wherein the one or more peripheral waveguides are configured to apply a peripheral laser;

wherein the central laser is configured to be applied as a central emission pattern;

wherein the peripheral laser is configured to be applied as a peripheral emission pattern; and

wherein the peripheral laser surrounds the central laser.

41 . The laser system of claim 36 ,

wherein the central waveguide is configured to deliver a first laser beam from a first laser source;

wherein the one or more peripheral waveguides are configured to deliver a different laser beam from a different laser source.

42 . The laser system of claim 36 ,

further comprising a delivery system;

wherein the delivery system is configured to deliver water and air to a target tissue area concurrently with laser energy.

43 . The laser system of claim 36 ,

wherein the central waveguide is concentrically positioned with the one or more peripheral waveguides.

44 . The laser system of claim 36 ,

wherein the central waveguide is configured to apply a central emission pattern.

wherein the one or more peripheral waveguides are configured to apply a peripheral emission pattern; and

wherein the peripheral waveguide surrounds the central waveguide.

45 . A laser system comprising:

a handpiece,

a central waveguide,

a plurality of peripheral waveguides, and

a laser beam generating system;

wherein at least a portion of the central waveguide is integrated into the handpiece;

wherein the plurality of peripheral waveguides are at least partially integrated into the handpiece;

wherein the plurality of peripheral waveguides are positioned to at least partially encircle the central waveguide.

46 . The laser system of claim 45 ,

wherein the plurality of peripheral waveguides are positioned in the handpiece between an outer edge of the central waveguide and an outer surface of the handpiece.

47 . The laser system of claim 45 ,

wherein the central waveguide is configured to apply one or multiple laser beams.

48 . The laser system of claim 45 ,

wherein the central waveguide is configured to apply a central region emission pattern;

wherein the plurality of peripheral waveguides are configured to apply a peripheral region emission pattern; and

wherein the central region emission pattern is at least partially encircled by the peripheral region emission pattern.

49 . The laser system of claim 45 ,

wherein the central waveguide is configured to apply a central region emission pattern;

wherein the plurality of peripheral waveguides are configured to apply a peripheral region emission pattern;

wherein the central region emission pattern comprises a first diameter.

wherein the peripheral region emission pattern comprises a second diameter; and

wherein the second diameter is larger than the first diameter.

50 . The laser system of claim 45 ,

wherein the central waveguide is configured to deliver a first laser beam from a first laser source;

wherein the plurality of peripheral waveguides are configured to deliver a different laser beam from a different laser source.

51 . The laser system of claim 45 ,

wherein the handpiece further comprises a delivery system; and

wherein the delivery system is configured to deliver water and air to a target tissue area concurrently with laser energy.

52 . The laser system of claim 45 ,

wherein the central waveguide is concentrically positioned with the plurality of peripheral waveguides.

53 . The laser system of claim 45 ,

wherein the central waveguide is configured to apply a central emission pattern comprising a first diameter from a central laser source.

wherein the plurality of peripheral waveguides are configured to apply a peripheral emission pattern comprising a second diameter from a peripheral laser source; and

wherein the second diameter is larger than the first diameter; and

wherein the central laser source and the peripheral laser source are configured to be applied together.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 6, 2023
From: BOUTOUSSOV, DMITRI; NETCHITAILO, VLADIMIR; CARINO, AMADO
To: BIOLASE, INC.
Reel/Frame 063238/0830 →