IP Library Granted Patent US 11,682,565
Granted Patent B2
US 11,682,565 · App. 17/393,468 · Granted Jun 20, 2023

Fluid control system

Inventors: Philip Ryan Barros (Pleasanton, CA); Greg Patrick Mulligan (Milpitas, CA); Chris Melcer (Santa Cruz, CA)
H01L21/67017H01J37/32449H01L21/6715H01L21/67161H01L21/67739
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Quick Facts
Patent No.
US 11,682,565
App. No.
17/393,468
Granted
Jun 20, 2023
Kind
B2
Abstract

An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber. Pressure of the fluid mixture can also be directly controlled. A concentration sensor capable of measuring concentration of all of the constituent components in a fluid mixture is used to provide signals used to vary the flow rate of constituent gases under a closed loop feedback system. The signal output of one or more pressure sensors can also be used to provide a signal used to vary the flow rate of constituent gases under a closed loop feedback system. By directly controlling these two extremely important process variables, embodiments of the present invention provide a significant advantage in measurement accuracy over the prior art, enable real-time process control, reduce system level response time, and allow for a system with a significant footprint reduction.

Claims (35)

1. A method of controlling the concentration of one or more gases within a gas mixture, the method comprising:

providing a plurality of gases, each gas provided by a gas source;

causing the plurality of gases to flow along a flow path so that the plurality of gases are combined into a gas mixture and delivered to a process chamber, the flow path extending from the gas sources to the process chamber and fluidly coupled to a side stream, the side stream fluidly coupled to a vacuum source;

providing a concentration sensor fluidly coupled to the side stream, the concentration sensor disposed between the vacuum source and the flow path;

determining a concentration of a first gas within the gas mixture using the concentration sensor; and

adjusting an adjustable control valve within the flow path to control the flow of a second gas of the plurality of gases in accordance with the determined concentration of the first gas within the gas mixture.

2. The method of claim 1 wherein the first and second gases are the same.

3. The method of claim 1 wherein the first and second gases are different.

4. The method of claim 1 wherein the step of adjusting further comprises adjusting a plurality of adjustable control valves within the flow path to control the flow of more than one gas of the plurality of gases.

5. The method of claim 1 wherein the step of determining comprises determining concentrations of a plurality of gases within the gas mixture using the sensor.

6. The method of claim 1 wherein the step of causing comprises using calculated setpoints to deliver the gas mixture to the process chamber at a first flow rate, the first flow rate being higher than a second flow rate used during system operation.

7. The method of claim 1 wherein the step of causing comprises using calculated setpoints to deliver the gas mixture to the process chamber at a first flow rate that is more than 50% of a maximum flow rate for the adjustable control valve.

8. The method of claim 1 wherein a first valve is fluidly coupled to the side stream and disposed between the concentration sensor and the flow path.

9. The method of claim 1 wherein the side stream further comprises a bypass line.

10. The method of claim 9 wherein a second valve is fluidly coupled to the bypass line.

11. The method of claim 9 wherein the bypass line is fluidly coupled to a vacuum source.

12. A method of controlling the concentration of one or more gases within a gas mixture, the method comprising:

providing a plurality of gases, each gas provided by a gas source;

causing the plurality of gases to flow along a flow path so that the plurality of gases are combined into a gas mixture and delivered to a process chamber, the flow path extending from the gas sources to the process chamber and fluidly coupled to a side stream, the side stream located between the gas sources and the process chamber;

providing a concentration sensor fluidly coupled to the side stream, the concentration sensor disposed within the side stream;

determining a concentration of a first gas within the gas mixture using the concentration sensor; and

adjusting an adjustable control valve within the flow path to control the flow of a second gas of the plurality of gases in accordance with the determined concentration of the first gas within the gas mixture.

13. The method of claim 12 wherein the step of adjusting further comprises adjusting a plurality of adjustable control valves within the flow path to control the flow of more than one gas of the plurality of gases.

14. The method of claim 12 wherein the step of determining comprises determining concentrations of a plurality of gases within the gas mixture using the sensor.

15. The method of claim 12 wherein the step of causing comprises using calculated setpoints to deliver the gas mixture to the process chamber at a first flow rate, the first flow rate being higher than a second flow rate used during system operation.

16. The method of claim 12 wherein a first valve is fluidly coupled to the side stream and disposed between the concentration sensor and the flow path.

17. The method of claim 12 wherein the side stream further comprises a bypass line.

18. The method of claim 17 wherein a second valve is fluidly coupled to the bypass line.

19. The method of claim 17 wherein the bypass line is fluidly coupled to a vacuum source.

20. A method of controlling the concentration of one or more gases within a gas mixture, the method comprising:

providing a plurality of gases, each gas provided by a gas source;

causing the plurality of gases to flow along a flow path so that the plurality of gases are combined into a gas mixture and delivered to a process chamber, the flow path extending from the gas sources to the process chamber and fluidly coupled to a side stream;

providing a concentration sensor fluidly coupled to the side stream;

determining a concentration of a first gas within the gas mixture using the concentration sensor; and

adjusting an adjustable control valve within the flow path to control the flow of a second gas of the plurality of gases in accordance with the determined concentration of the first gas within the gas mixture.

Assignments (2)
SECURITY INTEREST Recorded Sep 29, 2025
From: ICHOR SYSTEMS, INC.; IMG ALTAIR, LLC
To: BANK OF AMERICA, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 072979/0862 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 4, 2021
From: BARROS, PHILIP RYAN; MULLIGAN, GREG PATRICK; MELCER, CHRIS
To: ICHOR SYSTEMS, INC.
Reel/Frame 057074/0146 →
Continuity (4)
Continuation 15899365 · Feb 19, 2018
Continuation PCTUS2016047441 · Aug 17, 2016
Provisional Application 62206267 · Aug 17, 2015
Related Publication 20210366735A1 · Nov 25, 2021