Vacuum chamber arrangement for charged particle beam generator
The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.
1. An electron-optical module of an electron-optical apparatus, the electron-optical module comprising:
a vacuum chamber;
a high voltage shielding arrangement located within the vacuum chamber; and
an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement,
wherein the electron-optical module is configured to be removable from the electron-optical apparatus.
2. The electron-optical module of claim 1 , further comprising a magnetic shield arrangement, wherein the aperture array is within the magnetic shield arrangement.
3. The electron-optical module of claim 2 , further comprising a cooling arrangement configured to remove heat generated by the electron-optical module, the cooling arrangement being within the magnetic shielding arrangement.
4. The electron-optical module of claim 1 , further comprising a cooling arrangement configured to remove heat generated in the electron-optical module, the cooling arrangement being around the high voltage shielding arrangement.
5. The electron-optical module of claim 4 , wherein the cooling arrangement comprises one or more cooling channels configured for a flow of a cooling liquid.
6. The electron-optical module of claim 1 , further comprising a pump.
7. The electron-optical module of claim 6 , wherein the pump is outside the high voltage shielding arrangement.
8. The electron-optical module of claim 2 , further comprising a pump outside the high voltage shielding arrangement and within the magnetic shielding arrangement.
9. The electron optical module of claim 4 , further comprising a pump outside the high voltage shielding arrangement and within the cooling arrangement.
10. An electron-optical apparatus comprising the electron-optical module of claim 1 , wherein the electron-optical apparatus and the electron-optical module are configured for the electron-optical module to be removable from the electron optical apparatus.
11. The electron-optical apparatus of claim 10 , further comprising a carrier frame configured to enable removal and insertion of the electron-optical module.
12. The electron-optical module of claim 11 , further comprising another vacuum chamber, wherein the carrier frame is located within the another vacuum chamber.
13. The electron-optical apparatus of claim 10 , wherein the electron-optical apparatus is an inspection apparatus.
14. An electron-optical apparatus comprising an electron-optical module, wherein the electron-optical apparatus and the electron-optical module are configured for the electron-optical module to be removable from the electron-optical apparatus, the electron-optical module comprising:
a vacuum chamber;
a high voltage shielding arrangement located within the vacuum chamber;
an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement; and
a cooling arrangement configured to remove heat from the electron-optical module and being around the high voltage shielding arrangement.
15. The electron-optical apparatus of claim 14 , wherein the electron-optical module further comprises a magnetic shield arrangement comprising one or more walls, wherein the aperture array is within the magnetic shield arrangement.
16. The electron-optical apparatus of claim 14 , wherein the electron-optical module further comprises a pump outside the high voltage shielding arrangement.
17. The electron-optical apparatus of claim 16 , wherein the cooling arrangement is configured to surround the pump and/or the high voltage shielding arrangement.
18. The electron-optical apparatus of claim 16 , wherein the pump is configured to regulate a pressure of a space within the high voltage shielding arrangement, wherein the pump is outside the high voltage shielding arrangement.
19. The electron-optical apparatus of claim 14 , wherein the electron-optical apparatus is configured for inspecting a substrate and the electron-optical module further comprises:
an electron source configured to generate the electron beam to be projected onto the substate; and
another vacuum chamber for accommodating components of the electron-optical module, wherein the high voltage shielding arrangement is configured to shield components outside the high voltage shielding arrangement from high voltages that are present within the high shielding arrangement and the aperture array is configured to form the plurality of beamlets from the electron beam.
20. The electron-optical apparatus of claim 14 , wherein the electron-optical module and the electron optical apparatus are configured so that the electron-optical module is removable from the electron-optical apparatus.