Sensor with droplet retaining structure
This disclosure describes methods and devices that assist in forming biosensors. Specifically, features that align solutions containing molecules to be immobilized on biosensors. A retaining structure may be disposed at least partially around a target surface of a substrate. A resonating structure may be disposed on the target surface. A droplet of functionalized material may be disposed on the resonating structure and the target surface, which may be auto-aligned and retained by the retaining structure on the target surface to consistently cover the resonating structure.
1. A method of forming a sensor with a droplet retaining structure comprising:
forming a retaining structure at least partially around a target surface of a substrate, the retaining structure having a height extending in a direction orthogonal to the target surface and a width extending in a direction parallel to the target surface;
disposing a resonating structure on the target surface of the substrate;
wherein the retaining structure is formed before disposing the resonating structure on the target surface, or the retaining structure is formed during formation of the resonating structure; and
disposing a droplet of functionalized material on the resonating structure and the target surface,
wherein a portion of the target surface between the resonating structure and the retaining structure has a width that allows for full coverage of the resonating structure with the droplet of functionalized material such that the droplet of functionalized material auto-aligns with the resonating structure and is prevented from moving.
2. The method of claim 1 , wherein forming the retaining structure comprises etching a channel into the substrate.
3. The method of claim 1 , wherein forming the retaining structure comprises disposing a wall on the substrate.
4. The method of claim 3 , wherein the wall comprises a hydrophobic material.
5. The method of claim 1 , further comprising disposing an oxide layer on the resonating structure.
6. The method of claim 1 , further comprising disposing an insulating structure on the resonating structure configured to couple to functionalized material in the droplet.
7. The method of claim 6 , wherein the insulating structure comprises silane.
8. The method according to claim 1 , wherein the resonating structure comprises a top electrode and the retaining structure is formed before the top electrode of the resonating structure is formed.
9. The method according to claim 1 , wherein the droplet of functionalized material is disposed on the target surface after the retaining structure is formed.
10. The method according to claim 1 , wherein one or more of the steps may be carried out by a controller comprising a central processing unit (CPU), computer, logic array, or other device capable of directing data coming into or out of the controller.
11. A method of forming a sensor with a droplet retaining structure comprising:
forming a retaining structure at least partially around a target surface of a substrate, the retaining structure having a height extending in a direction orthogonal to the target surface and a width extending in a direction parallel to the target surface;
disposing a resonating structure on the target surface of the substrate
disposing an insulating layer on the resonating structure; and
disposing a droplet of functionalized material on the resonating structure and the target surface,
wherein a portion of the target surface between the resonating structure and the retaining structure has a width that allows for full coverage of the resonating structure with the droplet of functionalized material such that the droplet of functionalized material auto-aligns with the resonating structure and is prevented from moving, and
wherein the insulating layer is configured to couple to the functionalized material in the droplet.
12. The method of claim 11 , wherein forming the retaining structure comprises etching a channel into the substrate.
13. The method according to claim 12 , wherein the etching forms the sidewalls of the retaining structure.
14. The method according to claim 13 , wherein the sidewalls are 60-degree sidewalls.
15. The method of claim 11 , wherein forming the retaining structure comprises disposing a wall on the substrate.
16. The method of claim 15 , wherein the wall comprises a hydrophobic material.
17. The method according to claim 11 , wherein the retaining structure is formed during formation of the resonating structure.
18. The method according to claim 11 , wherein the resonating structure comprises a top electrode and the retaining structure is formed before the top electrode of the resonating structure is formed.