STABLE LIPID BILAYERS ON NANOPORE ARRAYS
The invention is directed to methods of making stable lipid bilayers supported by a solid state nanopore array. Exemplary methods include the steps of masking a first layer on a planar support to form dry etch zones; dry etching the dry etch zones to form an array of apertures extending into but not through the first layer; masking a second side of the planar support body to form an etch region aligned with the array of apertures; wet etching the etch region to expose a surface of the first layer; dry etching the exposed surface of the first layer to a depth overlapping the apertures so that apertures of the array provide fluid communication across the first layer; and disposing a lipid bilayer on a surface of the first layer on a side opposite the planar support which encompasses the array of apertures.
1 . A method of making a supported lipid bilayer comprising:
disposing a first layer of known thickness on a first side of a planar support body;
masking the first layer to form an array of dry etch zones;
dry etching the dry etch zones to form an array of apertures extending into but not through the first layer;
masking a second side of the planar support body to form an etch region aligned with the array of apertures;
wet etching the etch region on the second side of the planar support body to expose a surface of the first layer;
dry etching the exposed surface of the first layer to a depth overlapping the apertures so that apertures of the array provide fluid communication across the first layer; and
disposing a lipid bilayer on a surface of the first layer on a side opposite the planar support body which encompasses the array of apertures.
2 . The method of claim 1 wherein said first is silicon nitride or silicon oxide and wherein said planar support body comprises silicon.
3 . The method of claim 2 wherein an impedance across said array after said deposition of said lipid bilayer is at least 1 Giga-ohm for at least 4 hours and wherein said array comprises from 9 to 10,000 apertures each having a cross-sectional area of from 3 to 1.2×10 4 nm 2 and spaced regularly within an area less than 2 cm 2 .
4 . A method of making a supported lipid bilayer comprising:
disposing a silicon nitride layer of known thickness on a first side of a planar body of silicon;
masking the silicon nitride layer to form an array of dry etch zones;
dry etching the dry etch zones to form an array of apertures extending into but not through the silicon nitride layer;
masking a second side of the planar body of silicon to form an etch region aligned with the array of apertures;
wet etching the etch region on the second side of the planar body of silicon to expose a surface of the silicon nitride layer;
dry etching the exposed surface of the silicon nitride layer to a depth overlapping the apertures so that apertures of the array provide fluid communication across the silicon nitride layer;
disposing a lipid bilayer on a surface of the silicon nitride layer on a side opposite the planar body of silicon which encompasses the array of apertures.
5 . The method of claim 4 further including a step of washing said surface of silicon nitride prior to said step of disposing said lipid bilayer.
6 . The method of claim 4 wherein an impedance across said array after said deposition of said lipid bilayer is at least 1 Giga-ohm for at least 4 hours and wherein said array comprises from 9 to 10,000 apertures each having a cross-sectional area of from 3 to 1.2×10 4 nm 2 and spaced regularly within an area less than 2 cm 2 .
7 . A method of making a nanopore array having a metal surface, the method comprising the steps of:
disposing a first layer of known thickness on a first side of a planar support body, the first layer comprising a plurality of sub-layers including a metal sub-layer having an outer surface opposite of the planar support body;
masking the first layer to form an array of dry etch zones;
dry etching the dry etch zones to form an array of apertures extending into but not through the first layer;
masking a second side of the planar support body to form an etch region aligned with the array of apertures;
wet etching the etch region on the second side of the planar support body to expose a surface of the first layer; and
dry etching the exposed surface of the first layer to a depth overlapping the apertures so that apertures of the array provide fluid communication across the first layer to produce a nanopore array having a metal surface.
8 . The method of claim 7 wherein said first layer comprises a sub-layer of silicon nitride on said planar support body and a sub-layer of aluminum on the sub-layer of silicon nitride.
9 . The method of claim 8 wherein said planar support body comprises silicon.
10 . The method of claim 9 further comprising a step of disposing a lipid bilayer on a surface of said first layer on a side opposite said planar support body which encompasses said array of apertures.
11 . The method of claim 10 wherein an impedance across said array after said deposition of said lipid bilayer is at least 1 Giga-ohm for at least 4 hours and wherein said array comprises from 9 to 10,000 apertures each having a cross-sectional area of from 3 to 1.2×10 4 nm 2 and spaced regularly within an area less than 2 cm 2 .
12 . The method of claim 10 further including a step of washing said surface of silicon nitride prior to said step of disposing said lipid bilayer.