IP Library Granted Patent US 11,630,257
Granted Patent B2
US 11,630,257 · App. 17/451,366 · Granted Apr 18, 2023

Multi-waveguide light field display

Inventors: Frank Y. Xu (Austin, TX); Michael Nevin Miller (Austin, TX); Kang Luo (Austin, TX); Vikramjit Singh (Pflugerville, TX); Michael Klug (Austin, TX)
Assignee: Molecular Imprints, Inc.
G02B6/0038G02B6/0065G02B6/0076G02B1/11G02B27/4205G02B27/4272
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Quick Facts
Patent No.
US 11,630,257
App. No.
17/451,366
Granted
Apr 18, 2023
Kind
B2
Abstract

A multi-waveguide optical structure, including multiple waveguides stacked to intercept light passing sequentially through each waveguide, each waveguide associated with a differing color and a differing depth of plane, each waveguide including: a first adhesive layer, a substrate having a first index of refraction, and a patterned layer positioned such that the first adhesive layer is between the patterned layer and the substrate, the first adhesive layer providing adhesion between the patterned layer and the substrate, the patterned layer having a second index of refraction less than the first index of refraction, the patterned layer defining a diffraction grating, wherein a field of view associated with the waveguide is based on the first and the second indices of refraction.

Claims (67)

1. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate;

positioning a first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction; and

applying a second adhesive layer to the substrate such that the substrate is between the first adhesive layer and the second adhesive layer; and

arranging the plurality of waveguides to yield the waveguide stack.

2. The method of claim 1 , wherein the second adhesive layer is applied using vapor deposition.

3. The method of claim 1 , wherein forming each of the waveguides further comprises positioning an additional patterned layer on the second adhesive layer such that the second adhesive layer is between the substrate and the additional patterned layer.

4. The method of claim 3 , wherein the additional patterned layer has a third index of refraction that is less than the first index of refraction.

5. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate;

positioning a first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction;

positioning an anti-reflective layer on the substrate; and

applying a second adhesive layer such that the anti-reflective layer is positioned between the substrate and the second adhesive layer; and

arranging the plurality of waveguides to yield the waveguide stack.

6. The method of claim 5 , where forming each of the waveguides further comprises positioning an additional patterned layer on the second adhesive layer such that the second adhesive layer is between the anti-reflective layer and the additional patterned layer.

7. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate; and

positioning a first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction;

arranging the plurality of waveguides to yield the waveguide stack; and

securing each of the waveguides in the waveguide stack to a waveguide support.

8. The method of claim 7 , wherein securing each of the waveguides in the waveguide stack to a waveguide support comprises positioning the waveguide support against the first adhesive layer of each of the waveguides in the waveguide stack.

9. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate; and

positioning a first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction; and

arranging the plurality of waveguides to yield the waveguide stack, wherein the plurality of waveguides are arranged in the waveguide stack such that the waveguides are separated from one another by air.

10. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate;

positioning a first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction; and

etching a portion of the substrate; and

arranging the plurality of waveguides to yield the waveguide stack.

11. The method of claim 1 , further comprising forming the first patterned layer using imprint lithography.

12. The method of claim 1 , wherein forming the first patterned layer comprises:

obtaining a polymer layer; and

forming a plurality of diffraction gratings on the polymer layer.

13. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate;

forming a first patterned layer using imprint lithography, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction, and wherein forming the first patterned layer comprises:

obtaining a polymer layer, and

forming a plurality of diffraction gratings on the polymer layer, wherein the diffraction gratings have a critical dimension of 100 nanometers; and

positioning the first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate; and

arranging the plurality of waveguides to yield the waveguide stack.

14. A method of forming a waveguide stack, the method comprising:

forming a plurality of waveguides, wherein forming each of the waveguides comprises:

obtaining a substrate having a first index of refraction;

applying a first adhesive layer onto the substrate;

forming a first patterned layer using imprint lithography, wherein the first patterned layer has a second index of refraction that is less than the first index of refraction, and wherein forming the first patterned layer comprises:

obtaining a polymer layer, wherein the polymer layer comprises acrylic polymer, and

forming a plurality of diffraction gratings on the polymer layer;

positioning the first patterned layer on the first adhesive layer such that the first adhesive layer is between the first patterned layer and the substrate; and

arranging the plurality of waveguides to yield the waveguide stack.

15. The method of claim 1 , wherein the substrate comprises at least one of glass or sapphire.

16. The method of claim 1 , wherein the first index of refraction is at least 1.7.

17. The method of claim 16 , the second index of refraction is approximately 1.5.

18. The method of claim 1 , further comprising arranging the waveguide stack and a light source such that the waveguide stack intercepts light emitted by the light source.

19. A multi-waveguide optical structure comprising the waveguide stack produced by the method of claim 1 .

Assignments (4)
SECURITY INTEREST Recorded Oct 28, 2025
From: MAGIC LEAP, INC.; MENTOR ACQUISITION ONE, LLC; MOLECULAR IMPRINTS, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073388/0027 →
SECURITY INTEREST Recorded Oct 15, 2025
From: MAGIC LEAP, INC.; MENTOR ACQUISITION ONE, LLC; MOLECULAR IMPRINTS, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073109/0238 →
SECURITY INTEREST Recorded May 24, 2022
From: MOLECULAR IMPRINTS, INC.; MENTOR ACQUISITION ONE, LLC; MAGIC LEAP, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 060338/0665 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 19, 2021
From: XU, FRANK Y.; MILLER, MICHAEL NEVIN; LUO, KANG; SINGH, VIKRAMJIT; KLUG, MICHAEL
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 057836/0577 →
Continuity (4)
Continuation 16599782 · Oct 11, 2019
Continuation 15705838 · Sep 15, 2017
Provisional Application 62428193 · Nov 30, 2016
Related Publication 20220035091A1 · Feb 3, 2022