Optical filter and corresponding manufacturing method
An optical filter includes a carrier layer made of a first material. A periodic grating of posts is disposed on the carrier layer in a periodic pattern configured by characteristic dimensions. The posts are made of a second material. A layer made of a third material encompasses the periodic grating of posts and covers the carrier layer. The third material has a refractive index that is different from a refractive index of the second material. Characteristic dimensions of the periodic grating of posts are smaller than an interfering wavelength and are configured to selectively reflect light at the interfering wavelength on the periodic grating of posts.
1. An optical filter, including:
a carrier layer made of a first material;
a periodic grating of posts disposed on the carrier layer in a periodic pattern configured by characteristic dimensions, the periodic grating of posts made of a second material having a first refractive index; and
a layer made of a third material encompassing the periodic grating of posts and covering the carrier layer, the third material having a second refractive index that is different from the first refractive index of the second material;
wherein characteristic dimensions of the periodic grating of posts are smaller than an interfering wavelength and configured such that the periodic grating of posts selectively reflects the light at the interfering wavelength; and
further including a first face of said layer made of the third material covered by a stack of anti-reflective layers, wherein the stack of anti-reflective layers is configured to correct an initial angle of incidence of incident light rays on the side of the first face of the optical filter, relative to a normal of the first face of the optical filter, such that an angle of incidence of incident light rays on the periodic grating is closer to the normal than the initial angle of incidence.
2. The optical filter according to claim 1 , wherein the first material, the second material, and the third material are selected such that the optical filter is transparent to light, except at the interfering wavelength, having a wavelength comprised in a wavelength range comprising the interfering wavelength.
3. The optical filter according to claim 1 , wherein the periodic grating of posts is disposed on the carrier layer in a periodic arrangement comprising a unit cell of posts repeated with a fixed period, and wherein the characteristic dimensions further comprise said fixed period.
4. The optical filter according to claim 1 , wherein the interfering wavelength is an infrared wavelength defined by a standard for automotive applications of detecting and estimating distance using light.
5. The optical filter according to claim 1 , wherein the first material, the second material, and the third material are dielectric or semiconductor materials.
6. The optical filter according to claim 1 , wherein the first material is silicon nitride, the second material is silicon nitride and the third material is silicon oxide.
7. The optical filter according to claim 1 , wherein the first material is silicon nitride, the second material is silicon oxide and the third material is one of amorphous silicon or polycrystalline silicon.
8. An electronic device, comprising:
an optical filter according to claim 1 ;
a light-sensitive electronic chip; and
a housing;
wherein the optical filter is integrated into the housing and located facing the light-sensitive electronic chip so as to filter the light received by the light-sensitive electronic chip.
9. A vehicle, comprising: an electronic device according to claim 8 .
10. A method of manufacturing an optical filter, comprising:
forming a carrier layer made of a first material;
forming a layer made of a second material on the carrier layer;
etching, in the layer made of the second material, a periodic grating of posts having a periodic pattern configured by characteristic dimensions; and
forming a layer made of a third material, on the carrier layer, encompassing the periodic grating of posts;
wherein characteristic dimensions of the periodic grating of posts are smaller than an interfering wavelength and configured so that the periodic grating of posts selectively reflects light at the interfering wavelength; and
forming a stack of anti-reflective layers on a first face of the layer made of the third material configured to correct an initial angle of incidence of incident light rays on the side of the first face of the optical filter, relative to a normal of the first face of the optical filter, such that an angle of incidence of incident light rays on the periodic grating is closer to the normal than the initial angle of incidence.
11. The method according to claim 10 , wherein the first material, second material, and third material are selected such that the optical filter is transparent to light, except at the interfering wavelength, having a wavelength comprised in a wavelength range comprising the interfering wavelength.
12. The method according to claim 10 , wherein etching comprises forming posts of the periodic grating of posts to have a cylindrical shape with a diameter and a height, and wherein the characteristic dimensions comprise the diameter and the height.
13. The method according to claim 10 , wherein etching comprises forming posts of the periodic grating of posts to be disposed in a periodic arrangement comprising a unit cell of posts repeated with a fixed period, and wherein the characteristic dimensions comprise said fixed period.
14. The method according to claim 10 , wherein the interfering wavelength is an infrared wavelength defined by a standard for automotive applications of detecting and estimating distance using light.
15. The method according to claim 10 , wherein the first material, the second material, and the third material are dielectric or semiconductor materials.
16. The method according to claim 10 , wherein the first material is silicon nitride, the second material is silicon nitride and the third material is silicon oxide.
17. The method according to claim 10 , wherein the first material is silicon nitride, the second material is silicon oxide and the third material is amorphous silicon or polycrystalline silicon.