IP Library Granted Patent US 11,927,549
Granted Patent B2
US 11,927,549 · App. 17/470,183 · Granted Mar 12, 2024

Shielding strategy for mitigation of stray field for permanent magnet array

Inventors: Qian Zhang (San Jose, CA); Wayne Chiwoei Lo (Campbell, CA); Joseph Maurino (Milpitas, CA); Tomas Plettner (Milpitas, CA)
Assignee: KLA CORPORATION
G01N23/20008H01F7/0273H05K9/0075G01N2223/052G01N2223/20G01N2223/30
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Quick Facts
Patent No.
US 11,927,549
App. No.
17/470,183
Granted
Mar 12, 2024
Kind
B2
Abstract

The present disclosure provides an inspection system and a method of stray field mitigation. The system includes an array of electron beam columns, a first permanent magnet array, and a plurality of shielding plates. The array of electron beam columns each includes an electron source configured to emit electrons toward a stage. The first permanent magnet array is configured to condense the electrons from each electron source into an array of electron beams. The first permanent magnet array is arranged at a first end of the array of electron beam columns. The plurality of shielding plates extend across the array electron beam columns downstream of the first permanent magnet array in a direction of electron emission. The array of electron beams pass through a plurality of apertures in each of the plurality of shielding plates, which reduces stray magnetic field in a radial direction of the array of electron beams.

Claims (45)

1. An inspection system comprising:

an array of electron beam columns, each comprising an electron source configured to emit electrons toward a stage;

a first permanent magnet array configured to condense the electrons from each electron source into an array of electron beams, wherein the first permanent magnet array is arranged at a first end of the array of electron beam columns; and

a plurality of shielding plates extending across the array of electron beam columns downstream of the first permanent magnet array in a direction of electron emission;

wherein the plurality of shielding plates each comprise a plurality of apertures and have a thickness between 1 μm and 1 mm, and the array of electron beams pass through the plurality of apertures; and

whereby the plurality of shielding plates reduce stray magnetic field in a radial direction of the array of electron beams.

2. The inspection system of claim 1 , further comprising:

a second permanent magnet array configured to focus the array of electron beams toward a target on the stage, wherein the second permanent magnet array is arranged at a second end of the array of electron beam columns.

3. The inspection system of claim 2 , wherein the plurality of shielding plates comprises:

a first shielding plate arranged proximate to the first permanent magnet array; and

a second shielding plate arranged proximate to the second permanent magnet array.

4. The inspection system of claim 3 , further comprising:

a detector configured to detect electrons reflected from the target, wherein the detector is arranged between the first permanent magnet array and the second permanent magnet array; and

wherein the plurality of shielding plates further comprises:

a third shielding plate arranged proximate to the detector.

5. The inspection system of claim 4 , wherein the plurality of shielding plates further comprises:

a fourth shielding plate arranged proximate to the detector, opposite to the third shielding plate.

6. The inspection system of claim 5 , wherein the plurality of shielding plates further comprises:

at least one supplemental shielding plate arranged between the first shielding plate and the second shielding plate.

7. The inspection system of claim 1 , wherein the plurality of shielding plates comprises at least seven shielding plates.

8. The inspection system of claim 1 , wherein at least one of the plurality of shielding plates is arranged where the stray magnetic field is at a highest magnitude in the radial direction of the array of electron beams.

9. The inspection system of claim 1 , wherein the thickness of each of the plurality of shielding plates is at least 120 μm.

10. The inspection system of claim 1 , wherein the plurality of shielding plates are comprised of a magnetic nickel-iron alloy.

11. A method of stray field mitigation applied to a multi-column inspection system including an array of electron beam columns, each electron beam column comprising an electron beam source configured to emit electrons toward a stage, the method comprising:

directing the electrons from each electron source through a first permanent magnet array to condense the electrons into an array of electron beams, wherein the first permanent magnet array is arranged at a first end of the array of electron beam columns; and

directing the array of electron beams through a plurality of shielding plates extending across the array of electron beam columns downstream of the first permanent magnet array;

wherein the plurality of shielding plates each comprise a plurality of apertures and have a thickness between 1 μm and 1 mm, and the array of electron beams pass through the plurality of apertures; and

whereby the plurality of shielding plates reduce stray magnetic field in a radial direction of the array of electron beams.

12. The method of claim 11 , further comprising:

directing the array of electron beams through a second permanent magnet array to focus the array of electron beams toward a target on the stage, wherein the second permanent magnet array is arranged at a second end of the array of electron beam columns, downstream of the plurality of shielding plates.

13. The method of claim 12 , wherein directing the array of electron beams through a plurality of shielding plates comprises:

directing the array of electron beams through a first shielding plate arranged proximate to the first permanent magnet array; and

directing the array of electron beams through a second shielding plate arranged proximate to the second permanent magnet array.

14. The method of claim 13 , further comprising:

directing the array of electron beams through a detector configured to detect electrons reflected from the target, wherein the detector is arranged between the first permanent magnet array and the second permanent magnet array; and

wherein directing the array of electron beams through a plurality of shielding plates further comprises:

directing the array of electron beams through a third shielding plate arranged proximate to the detector.

15. The method of claim 14 , wherein directing the array of electron beams through a plurality of shielding plates further comprises:

directing the array of electron beams through a fourth shielding plate arranged proximate to the detector, opposite to the third shielding plate.

16. The method of claim 15 , wherein directing the array of electron beams through a plurality of shielding plates further comprises:

directing the array of electron beams through at least one supplemental shielding plate arranged between the first shielding plate and the second shielding plate.

17. The method of claim 11 , wherein the plurality of shielding plates comprises at least seven shielding plates.

18. The method of claim 11 , wherein at least one of the plurality of shielding plates is arranged where the stray magnetic field is at a highest magnitude in the radial direction of the array of electron beams.

19. The method of claim 11 , wherein the thickness of each of the plurality of shielding plates is at least 120 μm.

20. The method of claim 11 , wherein the plurality of shielding plates are comprised of a magnetic nickel-iron alloy.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2024
From: ZHANG, QIAN; LO, WAYNE CHIWOEI; MAURINO, JOSEPH; PLETTNER, TOMAS
To: KLA CORPORATION
Reel/Frame 066281/0540 →
Continuity (1)
Related Publication 20230076175A1 · Mar 9, 2023