IP Library Granted Patent US 11,605,806
Granted Patent B2
US 11,605,806 · App. 17/475,567 · Granted Mar 14, 2023

Sacrificial substrates for silicon-carbon composite materials

Inventors: Ian Russell Browne (Orange, CA); Rahul R. Kamath (Mission Viejo, CA); Monika Chhorng (Irvine, CA); Benjamin Yong Park (Mission Viejo, CA)
Assignee: ENEVATE CORPORATION
H01M4/0471H01M4/133H01M4/134
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Quick Facts
Patent No.
US 11,605,806
App. No.
17/475,567
Granted
Mar 14, 2023
Kind
B2
Abstract

Methods of forming a composite material film can include providing a layer comprising a carbon precursor and silicon particles on a sacrificial substrate. The methods can also include pyrolysing the carbon precursor to convert the precursor into one or more types of carbon phases to form the composite material film, whereby the sacrificial substrate has a char yield of about 10% or less.

Claims (42)

1. A method comprising:

forming a multilayer film comprising a substrate layer and a mixture layer, wherein the mixture layer comprises a carbon precursor and silicon particles;

sectioning the multilayer film into multilayer film pieces;

stacking a plurality of the multilayer film pieces to form a stack of multilayer film pieces; and

pyrolysing the stack of multilayer film pieces;

wherein pyrolysing converts the mixture layer of each multilayer film piece in the stack to a composite material film piece; and

wherein the substrate layer of each multilayer film piece in the stack has a char yield of about 10% or less after pyrolysing.

2. The method of claim 1 , comprising:

applying a slurry comprising the carbon precursor, silicon particles, and a solvent to the substrate layer; and

drying the slurry to remove a portion of the slurry and form the mixture layer on the substrate layer.

3. The method of claim 2 , wherein the mixture layer comprises from about 10% to about 30% of the solvent.

4. The method of claim 1 , comprising forming the mixture layer by removing a portion of a solvent from a slurry comprising the carbon precursor and the silicon particles.

5. The method of claim 4 , wherein the mixture layer comprises from about 10% to about 30% of the solvent.

6. The method of claim 1 , comprising attaching a composite material film piece from the stack to a current collector.

7. The method of claim 1 , comprising laminating a composite material film piece the stack to a current collector.

8. The method of claim 1 , further comprising:

grounding a composite material film piece from the stack into a powder; and

depositing the powder on a current collector.

9. The method of claim 1 , comprising forming a battery with an anode, a cathode, and an electrolyte, wherein the anode comprises a composite material film piece from the stack.

10. The method of claim 1 , comprising forming a battery with an anode, a cathode, and an electrolyte, wherein the cathode comprises a composite material film piece from the stack.

11. A method comprising:

forming a first film comprising a first substrate layer and a first mixture layer, wherein the first mixture layer comprises a first carbon precursor and first silicon particles;

positioning the first film and a sacrificial layer between a first holder and a second holder with the first substrate layer positioned between the first mixture layer and the first holder and the sacrificial layer positioned between the first mixture layer and the second holder; and

pyrolysing the first film and the sacrificial layer;

wherein pyrolysing converts the first mixture layer of the first film to a first composite material film; and

wherein the first substrate layer of the first film and the sacrificial layer each have a char yield of about 10% or less after pyrolysing.

12. The method of claim 11 , comprising:

positioning a second film between the sacrificial layer and the first film;

wherein the second film comprises a second substrate layer and a second mixture layer;

wherein the second mixture layer comprises a second carbon precursor and second silicon particles;

wherein pyrolysing converts the second mixture layer of the second film to a second composite material film; and

wherein the second substrate layer of the second film has a char yield of about 10% or less after pyrolysing.

13. The method of claim 11 , comprising:

applying a first slurry comprising the first carbon precursor, the first silicon particles, and a first solvent to the first substrate layer; and

drying the first slurry to remove a portion of the first slurry and form the first mixture layer on the first substrate layer.

14. The method of claim 13 , wherein the first mixture layer comprises from about 10% to about 30% of the first solvent.

15. The method of claim 11 , comprising forming the first mixture layer by removing a portion of a first solvent from a first slurry comprising the first carbon precursor and the first silicon particles.

16. The method of claim 15 , wherein the first mixture layer comprises from about 10% to about 30% of the first solvent.

17. The method of claim 11 , comprising attaching the first composite material film to a current collector.

18. The method of claim 11 , comprising laminating the first composite material film to a current collector.

19. The method of claim 11 , comprising forming a battery with an anode, a cathode, and an electrolyte, wherein the anode comprises the first composite material film.

20. The method of claim 11 , comprising forming a battery with an anode, a cathode, and an electrolyte, wherein the cathode comprises the first composite material film.

Assignments (2)
SECURITY INTEREST Recorded Mar 10, 2026
From: ENEVATE CORPORATION
To: MCANDREWS, HELD & MALLOY LTD.
Reel/Frame 075093/0935 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2021
From: BROWNE, IAN RUSSELL; KAMATH, RAHUL R.; CHHORNG, MONIKA; PARK, BENJAMIN YONG
To: ENEVATE CORPORATION
Reel/Frame 057486/0244 →
Continuity (2)
Continuation 16430288 · Jun 3, 2019
Related Publication 20220006067A1 · Jan 6, 2022