Batch processing oven for magnetic anneal
A batch processing oven includes a processing chamber, a magnet, and a rack. The processing chamber includes a gas inlet on a first side and a gas outlet on a second side opposite the first side, the gas inlet is configured to direct a hot gas into the processing chamber and the gas outlet is configured to exhaust the convective energy in parallel with the radiative energy from the walls. The magnet is arranged such that its north pole will be formed on the first side of the processing chamber and its south pole will be formed on the second side of the processing chamber. The rack is configured to be positioned between the first and second ends of the processing chamber and is configured to support a plurality of vertically spaced-apart substrates.
1. A batch processing oven, comprising:
a processing chamber, the processing chamber having a gas inlet configured to direct a gas into the processing chamber and a gas outlet configured to exhaust the gas from the processing chamber, wherein the gas inlet is positioned on a first side of the processing chamber and the gas outlet is positioned on a second side of the processing chamber, substantially opposite the first side, and wherein the gas inlet includes multiple inlet tubes fluidly connected to a source of a single gas and extending in a lengthwise direction of the processing chamber along an internal wall of the processing chamber, the multiple inlet tubes being arranged circumferentially to form a partial arc around the internal wall and the multiple inlet tubes are adjustable in a circumferential direction of the processing chamber;
a magnet configured to have a north pole and a south pole, wherein the north pole is positioned on the first side of the processing chamber and the south pole is positioned on the second side of the processing chamber such that a magnetic field between the north and south poles of the magnet is in a same direction as gas flow between the gas inlet and the gas outlet; and
a rack configured to be positioned between the first and second sides of the processing chamber, wherein rack is configured to support a plurality of vertically spaced-apart substrates.
2. The oven of claim 1 , wherein the rack is configured to support the plurality of substrates and a plurality of panels in a stacked manner such that (a) one or more substrates of the plurality of substrates are positioned between a pair of adjacent panels of the plurality panels, and (b) vertical gaps separate each substrate of the plurality of substrates from an adjacent substrate or panel on either side of the substrate.
3. The oven of claim 2 , wherein the vertical gaps that separate each substrate of the plurality of substrates from an adjacent substrate or panel is between 2 mm and 50 mm.
4. The oven of claim 1 , wherein the processing chamber has a substantially cylindrical shape and the first and second sides of the processing chamber are diametrically opposite sides of the processing chamber.
5. The oven of claim 1 , wherein the gas inlet includes between 6-20 inlet tubes.
6. The oven of claim 5 , wherein the multiple inlet tubes of the gas inlet are adjustable in the circumferential direction such that a spacing between adjacent inlet tubes in the circumferential direction changes.
7. The oven of claim 5 , wherein the multiple inlet tubes of the gas inlet is adjustable in the lengthwise direction.
8. The oven of claim 5 , wherein each inlet tube of the multiple inlet tubes includes a plurality of inlet ports spaced apart from each other in the lengthwise direction.
9. The oven of claim 8 , wherein a size of at least one inlet port of the plurality of inlet ports is adjustable.
10. The oven of claim 8 , wherein a location of at least one inlet port of the plurality of inlet ports is adjustable in the lengthwise direction.
11. The oven of claim 5 , wherein the gas outlet includes multiple outlet tubes extending in the lengthwise direction along the internal wall of the processing chamber, the multiple outlet tubes being arranged circumferentially to form a partial arc around the internal wall, and wherein each outlet tube of the multiple outlet tubes includes a plurality of outlet ports spaced apart from each other in the lengthwise direction.
12. The oven of claim 11 , wherein the multiple outlet tubes of the gas outlet are adjustable in at least one of the circumferential direction of the processing chamber or the lengthwise direction.
13. The oven of claim 11 , wherein at least one of a size or a location in the lengthwise direction of at least one outlet port of the plurality of outlet ports is adjustable.
14. The oven of claim 1 , wherein the processing chamber includes one or more radiative heaters positioned on an external wall of the processing chamber.
15. The oven of claim 1 , wherein the magnet is a permanent magnet.
16. The oven of claim 1 , wherein the magnet is an electromagnet.
17. The oven of claim 1 , wherein the north pole and the south pole of the magnet are positioned outside the processing chamber and proximate to the chamber walls.
18. The oven of claim 1 , wherein the rack includes a plurality of thermocouples, and the oven further includes a control system configured to control operation of the processing chamber using signals from the plurality of thermocouples as feedback.
19. The oven of claim 1 , wherein the processing chamber has a chamber opening at a bottom side of the processing chamber, and the rack is configured to be elevated into the processing chamber through the chamber opening.
20. The oven of claim 1 , wherein the multiple inlet tubes of the gas inlet are adjustable in the circumferential direction such that the multiple inlet tubes are collectively rotated in the processing chamber.