IP Library Granted Patent US 11,660,258
Granted Patent B2
US 11,660,258 · App. 17/507,862 · Granted May 30, 2023

Alcohol containing non-antimicrobial cleansing composition

Inventors: Amanda Jo Copeland (Seville, OH); Venkatesan Padyachi (Kendall Park, NJ); James Bingham (Akron, OH); Nick Ciavarella (Seven Hills, OH); Kayla Elise Ivey (Cuyahoga Falls, OH); Carey Jaros (Shaker Heights, OH); Daniel Willis (Clinton, OH); Jessica Rae Tittl (Akron, OH); Srini Venkatesh (Hudson, OH)
Assignee: GOJO Industries, Inc.
A61K8/34A61K8/046A61K8/345A61K8/365A61K8/44A61K8/442A61K8/463A61Q17/005A61Q19/10A61K2800/30A61K2800/34A61K2800/48A61K2800/596A61K2800/75A61K2800/805
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Quick Facts
Patent No.
US 11,660,258
App. No.
17/507,862
Granted
May 30, 2023
Kind
B2
Abstract

A non-antimicrobial cleansing composition is disclosed comprising from about 10.0 wt. % to less than about 40 wt. % of one or more C 1 -C 8 alcohols; about 0.5 wt. % to about 10.0 wt. % of at least one primary surfactant; 0 wt. % to about 10.0 wt. % of at least one secondary surfactant, with the primary and secondary surfactants having an HLB value greater than 8; a pH adjusting agent; and water. The composition does not achieve a microbial kill level greater than 2.0 log.

Claims (43)

1. A cleansing composition comprising:

from 15 wt. % to 25 wt. % of one or more C 1 -C 8 alcohols;

from 0.5 wt. % to 10 wt. % of at least one primary surfactant comprising an anionic surfactant;

from 0.5 wt. % to 10 wt. % of at least one secondary surfactant, wherein the at least one secondary surfactant comprises an amphoteric surfactant, the concentrations being based on the total weight of the cleansing composition;

from 0.01 wt. % to 1.0 wt. % of a pH adjusting agent; and

water,

wherein the cleansing composition is a non-antimicrobial cleansing composition and does not achieve a microbial kill level greater than 2.0 log,

wherein the composition is devoid of surfactants comprising sulfate salts with amine-containing counter ions, and

wherein the cleansing composition contains less than 10 wt. % of total surfactants.

2. The cleansing composition of claim 1 , wherein the composition does not achieve a microbial kill level greater than 1.5 log.

3. The cleansing composition of claim 1 , wherein the one or more C 1 -C 8 alcohols are selected from the group consisting of methanol, ethanol, isopropanol, butanol, pentanol, hexanol, and isomers and mixtures thereof.

4. The cleansing composition of claim 1 , wherein the one or more C 1 -C 8 alcohols comprise ethanol, isopropanol, or combinations thereof.

5. The cleansing composition of claim 1 , wherein the composition is a single-phase solution.

6. The cleansing composition of claim 1 , wherein the at least one primary surfactant comprises sodium laureth sulfate.

7. The cleansing composition of claim 1 , wherein the at least one secondary surfactant comprises one or more of cocamidopropyl betaine, cocamidopropyl hydroxyl sultaine, lauramidopropyl hydroxyl sultaine, lauramine oxide, myristamine oxide, disodium lauroamphodiacetate, disodium cocoamphodiacetate, sodium lauroamphoacetate, sodium cocoamphoacetate, disodium cocoamphodipropionate, disodium lauroamphodipropionate, and combinations thereof.

8. The cleansing composition of claim 1 , wherein the composition removes at least 98% of pathogens from a surface.

9. The non-antimicrobial cleansing composition of claim 1 , further comprising: from 0.01 wt. % to 5 wt. % of one or more humectants, based on the total weight of the composition, wherein the one or more humectants are selected from the group consisting of propylene glycol, hexylene glycol, 1,4-dihydroxyhexane, 1,2,6-hexanetriol, sorbitol, butylene glycol, caprylyl glycol, methyl propane diol, dipropylene glycol, triethylene glycol, glycerin, polyethylene glycol, ethoxydiglycol, polyethylene sorbitol, and combinations thereof.

10. A method of cleansing a surface comprising:

applying the non-antimicrobial cleansing composition of claim 1 to the surface.

11. The non-antimicrobial cleansing composition of claim 1 , wherein the composition, when applied to a surface contaminated with C. difficile spores, achieves at least a 94% reduction in C. difficile spores.

12. A cleansing composition comprising:

from greater than 10 wt. % to less than 40 wt. % of one or more C 1 -C 8 alcohols;

from 0.5 wt. % to less than 5 wt. % of at least one primary surfactant comprising an anionic surfactant; and

from 0.5 wt. % to less than 5 wt. % of at least one secondary surfactant, wherein the at least one secondary surfactant comprises an amphoteric surfactant, the concentrations being based on the total weight of the cleansing composition,

wherein the cleansing composition is a non-antimicrobial cleansing composition and does not achieve a microbial kill level greater than 2.0 log,

wherein the composition is devoid of surfactants comprising sulfate salts with amine-containing counter ions, and wherein the composition contains from 0.01 wt. % to 1.0 wt. % of a pH adjusting agent.

13. The cleansing composition of claim 12 , wherein the at least one primary surfactant comprises sodium laureth sulfate.

14. The cleansing composition of claim 12 , wherein the at least one secondary surfactant comprises one or more of cocamidopropyl betaine, cocamidopropyl hydroxyl sultaine, lauramidopropyl hydroxyl sultaine, lauramine oxide, myristamine oxide, disodium lauroamphodiacetate, disodium cocoamphodiacetate, sodium lauroamphoacetate, sodium cocoamphoacetate, disodium cocoamphodipropionate, disodium lauroamphodipropionate, and combinations thereof.

15. A method of cleansing a surface comprising:

applying the non-antimicrobial cleansing composition of claim 12 to the surface.

16. The cleansing composition of claim 12 , wherein:

the anionic surfactants comprise sodium laureth sulfate; and

the amphoteric surfactants consist of zwitterionic surfactants selected from the group consisting of betaines, sultaines, amphoacetates, amphodiacetates, or combinations thereof.

17. A cleansing composition comprising:

from greater than 10 wt. % to less than 40 wt. % of one or more C 1 -C 8 alcohols;

from 0.5 wt. % to less than 10 wt. % of a mixture of two or more surfactants, wherein the mixture of surfactants comprises:

one or more anionic surfactants; and

one or more amphoteric surfactants,

wherein the concentrations are based on the total weight of the cleansing composition, and

wherein the composition is devoid of surfactants comprising sulfate salts with amine-containing counter ions, and wherein the composition contains from 0.01 wt. % to 1.0 wt. % of a pH adjusting agent.

18. The cleansing composition of claim 17 , wherein the composition is a non-antimicrobial cleansing composition.

19. The cleansing composition of claim 17 , wherein the amphoteric surfactants consist of zwitterionic surfactants selected from the group consisting of betaines, sultaines, amphoacetates, amphodiacetates, or combinations thereof.

20. The cleansing composition of claim 17 , wherein the one or more anionic surfactants comprise sodium laureth sulfate.

Assignments (5)
RELEASE OF SECURITY INTEREST IN PATENT COLLATERAL, RECORDED ON OCTOBER 27, 2023 AT REEL 065382 FRAME 0587 Recorded Apr 22, 2026
From: SILVER POINT FINANCE, LLC, AS COLLATERAL AGENT
To: GOJO INDUSTRIES, INC.
Reel/Frame 075435/0852 →
RELEASE OF SECURITY INTEREST Recorded Apr 7, 2026
From: PNC BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: GOJO INDUSTRIES, INC.
Reel/Frame 074903/0480 →
SECURITY INTEREST Recorded Oct 27, 2023
From: GOJO INDUSTRIES, INC.
To: SILVER POINT FINANCE, LLC, AS COLLATERAL AGENT
Reel/Frame 065382/0587 →
SECURITY INTEREST Recorded Oct 26, 2023
From: GOJO INDUSTRIES, INC.
To: PNC BANK, NATIONAL ASSOCIATION
Reel/Frame 065369/0253 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2021
From: COPELAND, AMANDA JO; PADYACHI, VENKATESAN; BINGHAM, JAMES; CIAVARELLA, NICK E.; IVEY, KAYLA ELISE; JAROS, CAREY; WILLIS, DANIEL; TITTL, JESSICA RAE; VENKATESH, SRINI
To: GOJO INDUSTRIES, INC.
Reel/Frame 058125/0288 →
Continuity (5)
Continuation 15968082 · May 1, 2018
Provisional Application 62492622 · May 1, 2017
Provisional Application 62555986 · Sep 8, 2017
Provisional Application 62609487 · Dec 22, 2017
Related Publication 20220062137A1 · Mar 3, 2022
Cited By (1)
US 12,408,663