Alcohol containing low-water cleansing composition
A low-water cleansing composition is provided that includes 5.0 wt. % to less than 40 wt. % of one or more C 1 -C 8 alcohol, at least 10.0 wt. % of a mixture of two or more surfactants, at least 0.05 wt. % of a pH adjuster; and water, the concentrations being based on a total weight of the low-water cleansing composition.
1. A low-water cleansing composition comprising:
from greater than 10 wt. % to less than 40 wt. % of one or more C 1 -C 8 alcohols;
two or more surfactants, the surfactants comprising from greater than 10 wt. % to 25 wt. % of one or more primary surfactants and from 2 wt. % to 20 wt. % of one or more secondary surfactants, the wt. % being based on the total weight of the low-water cleansing composition;
from 0.01 wt. % to 1 wt. % of one or more pH adjusting agents; and
water,
wherein the low-water cleansing composition comprises at least 7% active surfactant.
2. The low-water cleansing composition of claim 1 , wherein the composition comprises greater than 12 wt. % of the primary surfactants and greater than 5 wt. % of the secondary surfactants, the wt. % being based on the total weight of the low-water cleansing composition.
3. The low-water cleansing composition of claim 1 , wherein the one or more primary surfactants consist of anionic surfactants and the one or more secondary surfactants consist of amphoteric surfactants.
4. The low-water cleansing composition of claim 1 , wherein the composition comprises at least 10% active surfactant.
5. The low-water cleansing composition of claim 1 , wherein the composition is a non-antimicrobial cleansing composition.
6. The low-water cleansing composition of claim 1 , wherein the composition comprises two or more C 1 -C 8 alcohols.
7. The low-water, cleansing composition of claim 3 , wherein the anionic surfactants are selected from the group consisting of sodium alkyl sulfate, sodium dodecyl sulfate, sodium dodecylbenzene sulfonate, sodium laurate, sodium laureth sulfate, sodium lauryl sarcosinate, potassium lauryl sulfate, ammonium lauryl sulfate, ammonium laureth sulfate, ammonium xylene sulfonate, magnesium laureth sulfate, sodium myreth sulfate, sodium nonanoyloxybenzenesulfonate, carboxylates, sulphated esters, sulphated alkanolamides, alkylphenols, or combinations thereof.
8. The low-water, cleansing composition of claim 3 , wherein the amphoteric surfactants consist of zwitterionic surfactants selected from the group consisting of betaines, sultaines, amphoacetates, amphodiacetates, or combinations thereof.
9. The low-water, cleansing composition of claim 1 , wherein the composition is in the form of a foamable solution.
10. The low-water, cleansing composition of claim 9 , wherein the foamable solution generates a foam volume that is at least 30% greater than the foam volume of an otherwise identical low-water cleansing composition that does not include the claimed concentration of alcohol.
11. The low-water, cleansing composition of claim 1 , wherein the composition is devoid of parabens, phthalates, and auxiliary antimicrobial or antibacterial ingredients.
12. The low-water, cleansing composition of claim 1 , wherein the composition further comprises one or more thickening agents.
13. A method of cleansing a surface comprising:
applying a low-water cleansing composition to a surface, wherein the composition comprises:
from greater than 10 wt. % to less than 40 wt. % of one or more C 1 -C 8 alcohols;
two or more surfactants, the surfactants comprising from greater than 10 wt. % to 25 wt. % of one or more primary surfactants and from 2 wt. % to 20 wt. % of one or more secondary surfactants, the wt. % being based on a total weight of the low-water cleansing composition;
one or more thickening agents; and
water,
wherein the low-water cleansing composition comprises at least 7% active surfactant.
14. The method of claim 13 , wherein the composition comprises at least 10% active surfactant.
15. A low-water cleansing composition comprising:
from greater than 12 wt. % to less than 40 wt. % of one or more C 1 -C 8 alcohols;
greater than 15 wt. % of a mixture of two or more surfactants, wherein the mixture of surfactants comprises one or more anionic surfactants and one or more amphoteric surfactants, the wt. % being based on a total weight of the low-water cleansing composition;
from 0.01 wt. % to 1 wt. % of one or more pH adjusting agents; and
water,
wherein the low-water cleansing composition comprises greater than 7% active surfactant.
16. The low-water cleansing composition of claim 15 , wherein the composition comprises at least 10% active surfactant.
17. The low-water cleansing composition of claim 15 , wherein the composition is a non-antimicrobial cleansing composition.
18. The low-water cleansing composition of claim 15 , wherein the composition comprises two or more C 1 -C 8 alcohols.
19. The low-water, cleansing composition of claim 15 , wherein the anionic surfactants are selected from the group consisting of sodium alkyl sulfate, sodium dodecyl sulfate, sodium dodecylbenzene sulfonate, sodium laurate, sodium laureth sulfate, sodium lauryl sarcosinate, potassium lauryl sulfate, ammonium lauryl sulfate, ammonium laureth sulfate, ammonium xylene sulfonate, magnesium laureth sulfate, sodium myreth sulfate, sodium nonanoyloxybenzenesulfonate, carboxylates, sulphated esters, sulphated alkanolamides, alkylphenols, or combinations thereof.
20. The low-water, cleansing composition of claim 15 , wherein the amphoteric surfactants consist of zwitterionic surfactants selected from the group consisting of betaines, sultaines, amphoacetates, amphodiacetates, or combinations thereof.